HK63397A - Positive-working photoresist composition - Google Patents

Positive-working photoresist composition

Info

Publication number
HK63397A
HK63397A HK63397A HK63397A HK63397A HK 63397 A HK63397 A HK 63397A HK 63397 A HK63397 A HK 63397A HK 63397 A HK63397 A HK 63397A HK 63397 A HK63397 A HK 63397A
Authority
HK
Hong Kong
Prior art keywords
positive
photoresist composition
working photoresist
working
composition
Prior art date
Application number
HK63397A
Other languages
English (en)
Inventor
Ping-Hung Lu
Ralph R Dammel
Nicholas Kiser Eib
Stanley A Ficner
Dinesh N Khanna
Thomas J Kloffenstein Jr
Christopher F Lyons
Marina Plat
M Dalil Rahman
Original Assignee
Hoechst Celanese Corp
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp, Ibm filed Critical Hoechst Celanese Corp
Publication of HK63397A publication Critical patent/HK63397A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK63397A 1992-09-28 1997-05-15 Positive-working photoresist composition HK63397A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US95245192A 1992-09-28 1992-09-28
PCT/US1993/009120 WO1994008275A1 (en) 1992-09-28 1993-09-24 Positive-working photoresist composition

Publications (1)

Publication Number Publication Date
HK63397A true HK63397A (en) 1997-05-23

Family

ID=25492929

Family Applications (1)

Application Number Title Priority Date Filing Date
HK63397A HK63397A (en) 1992-09-28 1997-05-15 Positive-working photoresist composition

Country Status (8)

Country Link
EP (1) EP0662222B1 (xx)
JP (1) JP3312341B2 (xx)
KR (1) KR100303911B1 (xx)
DE (1) DE69307716T2 (xx)
HK (1) HK63397A (xx)
SG (1) SG49669A1 (xx)
TW (1) TW323346B (xx)
WO (1) WO1994008275A1 (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5612164A (en) * 1995-02-09 1997-03-18 Hoechst Celanese Corporation Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
JP4797701B2 (ja) * 2006-03-02 2011-10-19 日立化成工業株式会社 感放射線性組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure
JPS5271224A (en) * 1975-12-11 1977-06-14 Toshiba Corp Positive type light sensitive composition
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
JP2623778B2 (ja) * 1988-10-18 1997-06-25 日本合成ゴム株式会社 感放射線性樹脂組成物

Also Published As

Publication number Publication date
TW323346B (xx) 1997-12-21
EP0662222B1 (en) 1997-01-22
WO1994008275A1 (en) 1994-04-14
KR100303911B1 (ko) 2001-11-22
JP3312341B2 (ja) 2002-08-05
KR950703757A (ko) 1995-09-20
EP0662222A1 (en) 1995-07-12
JPH08502132A (ja) 1996-03-05
SG49669A1 (en) 1998-06-15
DE69307716T2 (de) 1997-06-12
DE69307716D1 (de) 1997-03-06

Similar Documents

Publication Publication Date Title
EP0605089A3 (en) Photoresist composition.
EP0477691A3 (en) Positive-type photoresist composition
EP0591786A3 (en) Photosensitive composition
EP0611998A3 (en) Positive-working radiation-sensitive mixture.
EP0573056A3 (en) Positive working photoresist composition.
DE69301999D1 (de) Photoresist Zusammensetzung
EP0440238A3 (en) Positive photoresist composition
EP0275970A3 (en) Positive-working photoresist composition
EP0522175A4 (en) Photopolymerizable composition
EP0454334A3 (en) Photoresist composition
EP0749044A3 (en) Composition for positive type photoresist
EP0497342A3 (en) Negative photoresist composition
GB8923459D0 (en) Positive-acting photoresist compositions
EP0607899A3 (en) Positive photoresist composition.
DE69423858D1 (de) Positiv-arbeitende Fotolackzusammensetzung
EP0571988A3 (en) Positive working photoresist composition.
EP0570884A3 (en) Positive working resist composition.
SG47137A1 (en) Positive-working resist composition
GB8827542D0 (en) Positive-working photoresist composition
EP0571989A3 (en) Composition forming positive photoresist.
EP0443533A3 (en) Positive photoresist composition
EP0445819A3 (en) Positive type photoresist composition
EP0742488A3 (en) Photoresist composition
IL94353A0 (en) Novolak-containing photoresist composition
GB9319961D0 (en) Photopolymerisable composition

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)