HK1253386A1 - 用於將利用uv輻射輻照的液體介質施加到基板上的裝置 - Google Patents

用於將利用uv輻射輻照的液體介質施加到基板上的裝置

Info

Publication number
HK1253386A1
HK1253386A1 HK18112683.7A HK18112683A HK1253386A1 HK 1253386 A1 HK1253386 A1 HK 1253386A1 HK 18112683 A HK18112683 A HK 18112683A HK 1253386 A1 HK1253386 A1 HK 1253386A1
Authority
HK
Hong Kong
Prior art keywords
radiation
exposed
applying
substrate
liquid medium
Prior art date
Application number
HK18112683.7A
Other languages
English (en)
Inventor
Jörg Duda
Uwe Dietze
Original Assignee
Suess Microtec Photomask Equipment Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suess Microtec Photomask Equipment Gmbh & Co Kg filed Critical Suess Microtec Photomask Equipment Gmbh & Co Kg
Publication of HK1253386A1 publication Critical patent/HK1253386A1/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK18112683.7A 2015-08-27 2018-10-04 用於將利用uv輻射輻照的液體介質施加到基板上的裝置 HK1253386A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102015011177.9A DE102015011177B4 (de) 2015-08-27 2015-08-27 Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat

Publications (1)

Publication Number Publication Date
HK1253386A1 true HK1253386A1 (zh) 2019-06-14

Family

ID=56853598

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18112683.7A HK1253386A1 (zh) 2015-08-27 2018-10-04 用於將利用uv輻射輻照的液體介質施加到基板上的裝置

Country Status (10)

Country Link
US (1) US10843235B2 (zh)
EP (1) EP3174646B1 (zh)
JP (1) JP6800955B2 (zh)
KR (1) KR102125772B1 (zh)
CN (1) CN108348964B (zh)
DE (1) DE102015011177B4 (zh)
HK (1) HK1253386A1 (zh)
RU (1) RU2680059C1 (zh)
TW (1) TWI700549B (zh)
WO (1) WO2017032804A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11798799B2 (en) * 2021-08-09 2023-10-24 Applied Materials, Inc. Ultraviolet and ozone clean system

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61194830A (ja) * 1985-02-25 1986-08-29 Dainippon Screen Mfg Co Ltd 基板の有機物除去装置
US4767932A (en) * 1986-09-26 1988-08-30 Ultraviolet Purification System, Inc. Ultraviolet purification device
JP2892476B2 (ja) * 1990-09-14 1999-05-17 東京エレクトロン株式会社 帯状液体ノズル及び液処理装置及び液処理方法
JP4088810B2 (ja) * 1998-09-01 2008-05-21 リアライズ・アドバンストテクノロジ株式会社 基板洗浄装置及び基板洗浄方法
US20050229946A1 (en) * 1998-11-12 2005-10-20 Dainippon Screen Mfg. Co., Ltd. Substrate treating method and apparatus
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置
DE10130999A1 (de) * 2000-06-29 2002-04-18 D M S Co Multifunktions-Reinigungsmodul einer Herstellungseinrichtung für Flachbildschirme und Reinigungsgerät mit Verwendung desselben
TWI251506B (en) * 2000-11-01 2006-03-21 Shinetsu Eng Co Ltd Excimer UV photo reactor
US6626997B2 (en) * 2001-05-17 2003-09-30 Nathan P. Shapiro Continuous processing chamber
JP3869306B2 (ja) * 2001-08-28 2007-01-17 東京エレクトロン株式会社 現像処理方法および現像液塗布装置
US20040104049A1 (en) 2002-12-02 2004-06-03 Robert Federighi Apparatus and method for forming a support column in soil
JP2004241726A (ja) * 2003-02-07 2004-08-26 Sharp Corp レジスト処理方法およびレジスト処理装置
JP3776092B2 (ja) * 2003-03-25 2006-05-17 株式会社ルネサステクノロジ エッチング装置、エッチング方法および半導体装置の製造方法
US7255747B2 (en) * 2004-12-22 2007-08-14 Sokudo Co., Ltd. Coat/develop module with independent stations
JP2007188823A (ja) * 2006-01-16 2007-07-26 Sumitomo Precision Prod Co Ltd 処理ガス吐出装置及びこれを備えた表面処理装置
JP5019156B2 (ja) * 2006-08-21 2012-09-05 ウシオ電機株式会社 エキシマランプ装置
JP2008068155A (ja) * 2006-09-12 2008-03-27 Ushio Inc エキシマ光照射装置
JP2008108997A (ja) * 2006-10-27 2008-05-08 Shibuya Kogyo Co Ltd 洗浄装置
DE102009058962B4 (de) * 2009-11-03 2012-12-27 Suss Microtec Photomask Equipment Gmbh & Co. Kg Verfahren und Vorrichtung zum Behandeln von Substraten
WO2014153570A2 (en) * 2013-03-15 2014-09-25 Transtar Group, Ltd New and improved system for processing various chemicals and materials
WO2015075922A1 (ja) * 2013-11-22 2015-05-28 野村マイクロ・サイエンス株式会社 紫外線透過性基板の洗浄装置及び洗浄方法

Also Published As

Publication number Publication date
US10843235B2 (en) 2020-11-24
EP3174646B1 (de) 2018-02-28
JP2018528471A (ja) 2018-09-27
TWI700549B (zh) 2020-08-01
DE102015011177A1 (de) 2017-03-02
CN108348964B (zh) 2021-07-27
TW201725446A (zh) 2017-07-16
RU2680059C1 (ru) 2019-02-14
KR20180048791A (ko) 2018-05-10
EP3174646A1 (de) 2017-06-07
CN108348964A (zh) 2018-07-31
WO2017032804A1 (de) 2017-03-02
KR102125772B1 (ko) 2020-07-08
US20180236501A1 (en) 2018-08-23
JP6800955B2 (ja) 2020-12-16
DE102015011177B4 (de) 2017-09-14

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