HK1244066A1 - 着色感光性樹脂組合物、着色圖案或黑矩陣、濾色器、液晶顯示裝置或固體攝像元件和濾色器的製造方法 - Google Patents

着色感光性樹脂組合物、着色圖案或黑矩陣、濾色器、液晶顯示裝置或固體攝像元件和濾色器的製造方法

Info

Publication number
HK1244066A1
HK1244066A1 HK18103523.0A HK18103523A HK1244066A1 HK 1244066 A1 HK1244066 A1 HK 1244066A1 HK 18103523 A HK18103523 A HK 18103523A HK 1244066 A1 HK1244066 A1 HK 1244066A1
Authority
HK
Hong Kong
Prior art keywords
color filter
liquid crystal
display device
solid
crystal display
Prior art date
Application number
HK18103523.0A
Other languages
English (en)
Chinese (zh)
Inventor
大西治
Original Assignee
住友電木株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電木株式會社 filed Critical 住友電木株式會社
Publication of HK1244066A1 publication Critical patent/HK1244066A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Solid State Image Pick-Up Elements (AREA)
HK18103523.0A 2015-05-29 2018-03-13 着色感光性樹脂組合物、着色圖案或黑矩陣、濾色器、液晶顯示裝置或固體攝像元件和濾色器的製造方法 HK1244066A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015110611 2015-05-29
JP2015162910 2015-08-20
PCT/JP2016/064828 WO2016194619A1 (fr) 2015-05-29 2016-05-19 Composition de résine colorante photosensible, motif coloré, matrice noire, filtre de couleur, dispositif d'affichage à cristaux liquides, élément d'imagerie à semi-conducteurs, et procédé de production de filtre de couleur

Publications (1)

Publication Number Publication Date
HK1244066A1 true HK1244066A1 (zh) 2018-07-27

Family

ID=57440574

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18103523.0A HK1244066A1 (zh) 2015-05-29 2018-03-13 着色感光性樹脂組合物、着色圖案或黑矩陣、濾色器、液晶顯示裝置或固體攝像元件和濾色器的製造方法

Country Status (6)

Country Link
JP (1) JPWO2016194619A1 (fr)
KR (1) KR20180012313A (fr)
CN (1) CN107615167A (fr)
HK (1) HK1244066A1 (fr)
TW (1) TW201708376A (fr)
WO (1) WO2016194619A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6332583B1 (ja) * 2017-01-10 2018-05-30 住友ベークライト株式会社 ネガ型感光性樹脂組成物、樹脂膜及び電子装置
WO2018131351A1 (fr) * 2017-01-10 2018-07-19 住友ベークライト株式会社 Composition de résine photosensible négative, film de résine et dispositif électronique
TWI732111B (zh) 2017-03-28 2021-07-01 日商住友電木股份有限公司 感光性組成物、彩色濾光片及由其衍生之微透鏡
WO2019171998A1 (fr) * 2018-03-05 2019-09-12 住友化学株式会社 Composition de résine durcissable colorée, filtre coloré, et dispositif d'affichage
KR20210121169A (ko) * 2019-01-31 2021-10-07 스미또모 베이크라이트 가부시키가이샤 감광성 수지 조성물, 폴리머, 패턴, 컬러 필터, 블랙 매트릭스, 표시 장치 및 촬상 소자
JP7331371B2 (ja) * 2019-02-04 2023-08-23 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、及び画像表示装置
WO2021060080A1 (fr) * 2019-09-26 2021-04-01 住友ベークライト株式会社 Polymère, composition de résine photosensible, film de résine et dispositif électronique
JP2021063933A (ja) * 2019-10-16 2021-04-22 住友ベークライト株式会社 樹脂組成物、感光性樹脂組成物、フィルム、カラーフィルタ、ブラックマトリクス、表示装置および撮像素子

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10293402A (ja) * 1997-04-21 1998-11-04 Mitsubishi Rayon Co Ltd 感光性樹脂組成物、これを用いたカラーフィルター及び液晶表示装置と、カラーフィルターならびに液晶表示装置の製造方法
JP5588503B2 (ja) * 2010-04-13 2014-09-10 昭和電工株式会社 付加共重合体、感光性樹脂組成物及びカラーフィルター
JP5484173B2 (ja) * 2010-04-20 2014-05-07 富士フイルム株式会社 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
KR20120035995A (ko) * 2010-10-07 2012-04-17 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 액정표시장치
KR101998449B1 (ko) * 2012-03-26 2019-07-09 도레이 카부시키가이샤 감광성 흑색 수지 조성물 및 수지 블랙 매트릭스 기판
TWI636330B (zh) * 2013-05-29 2018-09-21 Sumitomo Bakelite Co., Ltd. 負型感光性樹脂組成物、電子裝置及聚合物

Also Published As

Publication number Publication date
KR20180012313A (ko) 2018-02-05
TW201708376A (zh) 2017-03-01
CN107615167A (zh) 2018-01-19
WO2016194619A1 (fr) 2016-12-08
JPWO2016194619A1 (ja) 2018-03-22

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