HK1244066A1 - Photosensitive coloring resin composition, colored pattern, black matrix, color filter, liquid crystal display device, solid-state imaging element, and method for producing color filter - Google Patents

Photosensitive coloring resin composition, colored pattern, black matrix, color filter, liquid crystal display device, solid-state imaging element, and method for producing color filter

Info

Publication number
HK1244066A1
HK1244066A1 HK18103523.0A HK18103523A HK1244066A1 HK 1244066 A1 HK1244066 A1 HK 1244066A1 HK 18103523 A HK18103523 A HK 18103523A HK 1244066 A1 HK1244066 A1 HK 1244066A1
Authority
HK
Hong Kong
Prior art keywords
color filter
liquid crystal
display device
solid
crystal display
Prior art date
Application number
HK18103523.0A
Other languages
Chinese (zh)
Inventor
大西治
Original Assignee
住友電木株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電木株式會社 filed Critical 住友電木株式會社
Publication of HK1244066A1 publication Critical patent/HK1244066A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
HK18103523.0A 2015-05-29 2018-03-13 Photosensitive coloring resin composition, colored pattern, black matrix, color filter, liquid crystal display device, solid-state imaging element, and method for producing color filter HK1244066A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015110611 2015-05-29
JP2015162910 2015-08-20
PCT/JP2016/064828 WO2016194619A1 (en) 2015-05-29 2016-05-19 Photosensitive coloring resin composition, colored pattern, black matrix, color filter, liquid crystal display device, solid-state imaging element, and method for producing color filter

Publications (1)

Publication Number Publication Date
HK1244066A1 true HK1244066A1 (en) 2018-07-27

Family

ID=57440574

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18103523.0A HK1244066A1 (en) 2015-05-29 2018-03-13 Photosensitive coloring resin composition, colored pattern, black matrix, color filter, liquid crystal display device, solid-state imaging element, and method for producing color filter

Country Status (6)

Country Link
JP (1) JPWO2016194619A1 (en)
KR (1) KR20180012313A (en)
CN (1) CN107615167A (en)
HK (1) HK1244066A1 (en)
TW (1) TW201708376A (en)
WO (1) WO2016194619A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6332583B1 (en) * 2017-01-10 2018-05-30 住友ベークライト株式会社 Negative photosensitive resin composition, resin film and electronic device
KR102614402B1 (en) * 2017-01-10 2023-12-15 스미또모 베이크라이트 가부시키가이샤 Negative photosensitive resin composition, resin film, and electronic device
TWI732111B (en) 2017-03-28 2021-07-01 日商住友電木股份有限公司 Photosensitive compositions, color filter and microlens derived therefrom
WO2019171998A1 (en) * 2018-03-05 2019-09-12 住友化学株式会社 Coloring curable resin composition, color filter and display device
KR20210121169A (en) * 2019-01-31 2021-10-07 스미또모 베이크라이트 가부시키가이샤 Photosensitive resin composition, polymer, pattern, color filter, black matrix, display device and image pickup device
JP7331371B2 (en) * 2019-02-04 2023-08-23 三菱ケミカル株式会社 Photosensitive colored resin composition, cured product, and image display device
JPWO2021060080A1 (en) * 2019-09-26 2021-04-01

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10293402A (en) * 1997-04-21 1998-11-04 Mitsubishi Rayon Co Ltd Photosensitive resin composition, color filter and liquid crystal display device using that, and production of color filter and liquid crystal display device
JP5588503B2 (en) * 2010-04-13 2014-09-10 昭和電工株式会社 Addition copolymer, photosensitive resin composition, and color filter
JP5484173B2 (en) * 2010-04-20 2014-05-07 富士フイルム株式会社 Colored photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device including the same
KR20120035995A (en) * 2010-10-07 2012-04-17 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and liquid crystal display using same
CN104204945B (en) * 2012-03-26 2017-10-03 东丽株式会社 Photosensitive black-colored resin composition and resin black matrix substrate
TWI636330B (en) * 2013-05-29 2018-09-21 Sumitomo Bakelite Co., Ltd. Negative photosensitive resin composition, electronic device and polymer

Also Published As

Publication number Publication date
KR20180012313A (en) 2018-02-05
TW201708376A (en) 2017-03-01
CN107615167A (en) 2018-01-19
WO2016194619A1 (en) 2016-12-08
JPWO2016194619A1 (en) 2018-03-22

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