HK1182146A1 - 成膜方法和成膜裝置 - Google Patents

成膜方法和成膜裝置

Info

Publication number
HK1182146A1
HK1182146A1 HK13109527.8A HK13109527A HK1182146A1 HK 1182146 A1 HK1182146 A1 HK 1182146A1 HK 13109527 A HK13109527 A HK 13109527A HK 1182146 A1 HK1182146 A1 HK 1182146A1
Authority
HK
Hong Kong
Prior art keywords
film formation
formation method
formation apparatus
film
formation
Prior art date
Application number
HK13109527.8A
Other languages
English (en)
Inventor
鹽野郎
林達也
姜友松
長江亦周
宫内充祐
佐守真悟
Original Assignee
株式會社新柯隆
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社新柯隆 filed Critical 株式會社新柯隆
Publication of HK1182146A1 publication Critical patent/HK1182146A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
HK13109527.8A 2011-09-30 2013-08-15 成膜方法和成膜裝置 HK1182146A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2011/072586 WO2013046440A1 (ja) 2011-09-30 2011-09-30 成膜方法及び成膜装置
PCT/JP2012/069714 WO2013046918A1 (ja) 2011-09-30 2012-08-02 成膜方法及び成膜装置

Publications (1)

Publication Number Publication Date
HK1182146A1 true HK1182146A1 (zh) 2013-11-22

Family

ID=46060762

Family Applications (2)

Application Number Title Priority Date Filing Date
HK13109036.2A HK1181823A1 (zh) 2011-09-30 2013-08-02 成膜方法及成膜裝置
HK13109527.8A HK1182146A1 (zh) 2011-09-30 2013-08-15 成膜方法和成膜裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK13109036.2A HK1181823A1 (zh) 2011-09-30 2013-08-02 成膜方法及成膜裝置

Country Status (8)

Country Link
US (1) US20140205762A1 (zh)
EP (1) EP2762604B1 (zh)
JP (1) JP4906014B1 (zh)
KR (1) KR101312752B1 (zh)
CN (2) CN103140598B (zh)
HK (2) HK1181823A1 (zh)
TW (2) TWI412617B (zh)
WO (2) WO2013046440A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010026887A1 (ja) * 2008-09-05 2010-03-11 株式会社シンクロン 成膜方法及び撥油性基材
KR101959975B1 (ko) * 2012-07-10 2019-07-16 삼성디스플레이 주식회사 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치
EP2975155A1 (en) * 2014-07-15 2016-01-20 Essilor International (Compagnie Generale D'optique) A process for physical vapor deposition of a material layer on surfaces of a plurality of substrates
WO2016107689A1 (en) * 2014-12-31 2016-07-07 Essilor International (Compagnie Générale d'Optique) Systems and methods with improved thermal evaporation of optical coatings onto ophthalmic lens substrates
JP6445959B2 (ja) * 2015-12-16 2018-12-26 株式会社オプトラン 成膜装置および成膜方法
CN209065995U (zh) * 2018-10-15 2019-07-05 株式会社新柯隆 成膜装置
CN110230034B (zh) * 2019-05-20 2024-04-16 江苏光腾光学有限公司 光学镀膜多角度伞架及包含该伞架的镀膜机
CN110643954B (zh) * 2019-10-21 2024-03-01 上海新柯隆真空设备制造有限公司 镀膜设备、离子源、以及栅极结构
US20220380889A1 (en) * 2021-06-01 2022-12-01 Ascentool, Inc. Versatile Vacuum Deposition Sources and System thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL134255A0 (en) * 2000-01-27 2001-04-30 V I P Vacuum Ion Plasma Techno System and method for deposition of coatings on a substrate
JP2005232534A (ja) * 2004-02-19 2005-09-02 Akira Yamada フッ化物膜の成膜方法
JP2006022368A (ja) * 2004-07-07 2006-01-26 Shinko Seiki Co Ltd 表面処理装置および表面処理方法
JP2006233275A (ja) * 2005-02-24 2006-09-07 Japan Science & Technology Agency 薄膜形成装置
JPWO2010018639A1 (ja) * 2008-08-15 2012-01-26 株式会社シンクロン 蒸着装置及び薄膜デバイスの製造方法
WO2010026887A1 (ja) * 2008-09-05 2010-03-11 株式会社シンクロン 成膜方法及び撥油性基材
JP4688230B2 (ja) * 2008-10-09 2011-05-25 株式会社シンクロン 成膜方法
JP4823293B2 (ja) * 2008-10-31 2011-11-24 株式会社シンクロン 成膜方法及び成膜装置
JP2010242174A (ja) * 2009-04-07 2010-10-28 Canon Inc 薄膜形成方法
JP2012032690A (ja) * 2010-08-02 2012-02-16 Seiko Epson Corp 光学物品およびその製造方法

Also Published As

Publication number Publication date
CN103154298B (zh) 2016-10-05
CN103154298A (zh) 2013-06-12
TW201313933A (zh) 2013-04-01
HK1181823A1 (zh) 2013-11-15
CN103140598A (zh) 2013-06-05
US20140205762A1 (en) 2014-07-24
TWI604075B (zh) 2017-11-01
TWI412617B (zh) 2013-10-21
EP2762604A1 (en) 2014-08-06
CN103140598B (zh) 2014-03-26
TW201315826A (zh) 2013-04-16
WO2013046440A1 (ja) 2013-04-04
EP2762604A4 (en) 2015-08-26
EP2762604B1 (en) 2020-04-01
JP4906014B1 (ja) 2012-03-28
JPWO2013046440A1 (ja) 2015-03-26
KR101312752B1 (ko) 2013-09-27
WO2013046918A1 (ja) 2013-04-04
KR20130084967A (ko) 2013-07-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210807