HK1180398A1 - Manufacturing method of dust-proof film assembly for lithography - Google Patents

Manufacturing method of dust-proof film assembly for lithography

Info

Publication number
HK1180398A1
HK1180398A1 HK13107440.6A HK13107440A HK1180398A1 HK 1180398 A1 HK1180398 A1 HK 1180398A1 HK 13107440 A HK13107440 A HK 13107440A HK 1180398 A1 HK1180398 A1 HK 1180398A1
Authority
HK
Hong Kong
Prior art keywords
lithography
dust
manufacturing
film assembly
proof film
Prior art date
Application number
HK13107440.6A
Other languages
English (en)
Chinese (zh)
Inventor
永田愛彥
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1180398A1 publication Critical patent/HK1180398A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
HK13107440.6A 2011-09-09 2013-06-25 Manufacturing method of dust-proof film assembly for lithography HK1180398A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011197019A JP2013057861A (ja) 2011-09-09 2011-09-09 リソグラフィ用ペリクルおよびその製造方法

Publications (1)

Publication Number Publication Date
HK1180398A1 true HK1180398A1 (en) 2013-10-18

Family

ID=47071045

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13107440.6A HK1180398A1 (en) 2011-09-09 2013-06-25 Manufacturing method of dust-proof film assembly for lithography

Country Status (7)

Country Link
US (1) US8956788B2 (ko)
EP (1) EP2568336B1 (ko)
JP (1) JP2013057861A (ko)
KR (1) KR101924361B1 (ko)
CN (1) CN102998898B (ko)
HK (1) HK1180398A1 (ko)
TW (1) TWI515509B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105659163B (zh) 2013-10-23 2020-02-07 日本轻金属株式会社 光罩护膜框及其制造方法
DE102013222200A1 (de) * 2013-10-31 2015-08-27 Osram Opto Semiconductors Gmbh Elektronisches Bauelement und Verfahren zum Herstellen eines elektronischen Bauelements
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Ｅｕｖ用ペリクル
JP6371904B2 (ja) 2015-04-27 2018-08-08 三井化学株式会社 ペリクルの製造方法およびペリクル付フォトマスクの製造方法
JP6478283B2 (ja) * 2015-12-24 2019-03-06 信越化学工業株式会社 Ｅｕｖ露光用ペリクル
US10775694B1 (en) * 2019-04-30 2020-09-15 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
JPS6083032A (ja) 1983-10-13 1985-05-11 Asahi Chem Ind Co Ltd 光透過性に優れたフオトマスク用防塵カバ−
US4861402A (en) 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
JPH0922111A (ja) * 1995-07-05 1997-01-21 Shin Etsu Chem Co Ltd ペリクル
US6252010B1 (en) * 1997-10-29 2001-06-26 Hitachi Chemical Company, Ltd. Siloxane-modified polyamideimide resin composition, adhesive film, adhesive sheet and semiconductor device
US6451441B1 (en) * 1999-03-30 2002-09-17 Kyocera Corporation Film with metal foil
JP2003121994A (ja) * 2001-10-17 2003-04-23 Mitsui Chemicals Inc ペリクルおよびペリクル付きマスクの製造方法
KR100505283B1 (ko) * 2001-10-31 2005-08-03 미쓰이 가가쿠 가부시키가이샤 펠리클 및 펠리클 부착 마스크의 제조 방법
JP3667728B2 (ja) * 2001-10-31 2005-07-06 三井化学株式会社 ペリクルおよびペリクル付きマスクの製造方法
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP2005070120A (ja) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル
JP5134418B2 (ja) * 2008-04-01 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
JP5252984B2 (ja) * 2008-05-01 2013-07-31 信越化学工業株式会社 半導体リソグラフィー用ペリクルおよびその製造方法
JP2011013611A (ja) * 2009-07-06 2011-01-20 Shin-Etsu Chemical Co Ltd ペリクル
JP2011076042A (ja) * 2009-10-02 2011-04-14 Shin-Etsu Chemical Co Ltd ペリクル
JP4951051B2 (ja) * 2009-10-30 2012-06-13 信越化学工業株式会社 ペリクルフレーム及びペリクル
JP2011164255A (ja) * 2010-02-08 2011-08-25 Shin-Etsu Chemical Co Ltd リソグラフィー用ペリクル
JP2011253176A (ja) * 2010-05-07 2011-12-15 Shin Etsu Chem Co Ltd ペリクル用粘着剤
JP5478463B2 (ja) * 2010-11-17 2014-04-23 信越化学工業株式会社 リソグラフィー用ペリクル

Also Published As

Publication number Publication date
US20130065164A1 (en) 2013-03-14
EP2568336B1 (en) 2020-07-01
TWI515509B (zh) 2016-01-01
KR101924361B1 (ko) 2018-12-03
KR20130028659A (ko) 2013-03-19
EP2568336A3 (en) 2014-12-10
CN102998898B (zh) 2015-06-03
TW201324030A (zh) 2013-06-16
CN102998898A (zh) 2013-03-27
JP2013057861A (ja) 2013-03-28
US8956788B2 (en) 2015-02-17
EP2568336A2 (en) 2013-03-13

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230908