HK1169456A1 - Method for coating micromechanical parts with high tribological performances for application in mechanical systems - Google Patents
Method for coating micromechanical parts with high tribological performances for application in mechanical systemsInfo
- Publication number
- HK1169456A1 HK1169456A1 HK12110099.5A HK12110099A HK1169456A1 HK 1169456 A1 HK1169456 A1 HK 1169456A1 HK 12110099 A HK12110099 A HK 12110099A HK 1169456 A1 HK1169456 A1 HK 1169456A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- application
- mechanical systems
- micromechanical parts
- high tribological
- tribological performances
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/279—Diamond only control of diamond crystallography
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/271—Diamond only using hot filaments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B13/00—Gearwork
- G04B13/02—Wheels; Pinions; Spindles; Pivots
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B15/00—Escapements
- G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Combustion & Propulsion (AREA)
- Chemical Vapour Deposition (AREA)
- Micromachines (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09160548 | 2009-05-18 | ||
PCT/EP2010/056835 WO2010133607A2 (en) | 2009-05-18 | 2010-05-18 | Method for coating micromechanical parts with high tribological performances for application in mechanical systems |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1169456A1 true HK1169456A1 (en) | 2013-01-25 |
Family
ID=42797512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK12110099.5A HK1169456A1 (en) | 2009-05-18 | 2012-10-12 | Method for coating micromechanical parts with high tribological performances for application in mechanical systems |
Country Status (7)
Country | Link |
---|---|
US (1) | US8770827B2 (xx) |
EP (1) | EP2432917B1 (xx) |
JP (1) | JP5647232B2 (xx) |
KR (1) | KR20120011050A (xx) |
CN (1) | CN102421936B (xx) |
HK (1) | HK1169456A1 (xx) |
WO (1) | WO2010133607A2 (xx) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9958830B2 (en) * | 2011-07-21 | 2018-05-01 | The Swatch Group Research And Development Ltd | Functional micromechanical assembly |
EP2631721A1 (fr) | 2012-02-23 | 2013-08-28 | Richemont International S.A. | Composants horlogers en titane revêtus de diamant |
EP2832899A1 (fr) * | 2013-08-02 | 2015-02-04 | The Swatch Group Research and Development Ltd. | Revêtement de diamant et procédé de dépôt d'un tel revêtement |
EP2942147B1 (fr) | 2014-05-08 | 2018-11-21 | Nivarox-FAR S.A. | Mécanisme d'échappement d'horlogerie sans lubrification |
EP3175303B1 (fr) * | 2014-08-01 | 2019-01-02 | Cartier International AG | Composant horloger avec une surface comportant de la fibroïne de soie |
EP3002637B1 (fr) | 2014-09-29 | 2018-11-28 | Richemont International S.A. | Système horloger avec des propriétés tribologiques améliorées |
AU2015364280A1 (en) | 2014-12-18 | 2017-07-06 | Windgap Medical, Inc. | Method and compositions for dissolving or solubilizing therapeutic agents |
JP6533286B2 (ja) * | 2015-04-27 | 2019-06-19 | 京セラ株式会社 | 被覆部材 |
EP3171229A1 (fr) * | 2015-11-19 | 2017-05-24 | Nivarox-FAR S.A. | Composant d' horlogerie |
EP3171230B1 (fr) * | 2015-11-19 | 2019-02-27 | Nivarox-FAR S.A. | Composant d'horlogerie a tribologie amelioree |
EP3407143A1 (fr) * | 2017-05-24 | 2018-11-28 | Rolex Sa | Dispositif de liaison mécanique |
US11829107B2 (en) * | 2018-02-07 | 2023-11-28 | Patek Philippe Sa Geneve | Micro-mechanical timepiece part |
JP7234023B2 (ja) * | 2018-06-15 | 2023-03-07 | キヤノン株式会社 | 定着装置及び画像形成装置 |
KR102652149B1 (ko) * | 2018-07-02 | 2024-03-27 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 다이아몬드 피복 공구 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2930658B2 (ja) * | 1990-05-11 | 1999-08-03 | 株式会社豊田中央研究所 | ダイヤモンドの被覆方法 |
US5308661A (en) | 1993-03-03 | 1994-05-03 | The Regents Of The University Of California | Pretreatment process for forming a smooth surface diamond film on a carbon-coated substrate |
AT399726B (de) | 1993-08-25 | 1995-07-25 | Bertel Erminald Dr | Einrichtung zur aufbringung diamantartiger kohlenstoffschichten auf ein substrat |
FR2731715B1 (fr) | 1995-03-17 | 1997-05-16 | Suisse Electronique Microtech | Piece de micro-mecanique et procede de realisation |
US6066399A (en) | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
JP2001337474A (ja) * | 2000-05-25 | 2001-12-07 | Canon Inc | 光受容部材の製造方法、光受容部材、及び電子写真装置 |
EE200100451A (et) | 2000-08-26 | 2002-04-15 | Plasmotec Gmbh & Co. Kg | Teemantkihiga kõvasulamlõikeriist ja meetod sellevalmistamiseks |
WO2002031891A1 (en) * | 2000-10-09 | 2002-04-18 | The University Of Chicago | Electrode and electron emission applications for n-type doped nanocrystalline materials |
EP1233314A1 (de) | 2001-02-15 | 2002-08-21 | DAMASKO, Konrad | Uhrwerk |
DE10317889B4 (de) | 2003-04-17 | 2008-10-30 | GFD-Gesellschaft für Diamantprodukte mbH | Mikromechanisches Bauteil und Verfahren zu seiner Herstellung |
US20050074636A1 (en) * | 2003-10-03 | 2005-04-07 | Fuji Photo Film Co., Ltd. | Magnetic recording medium and method for producing the same |
JP4380377B2 (ja) * | 2004-03-18 | 2009-12-09 | トヨタ自動車株式会社 | カーボン系膜形成方法 |
US20050227079A1 (en) * | 2004-04-13 | 2005-10-13 | Ravi Kramadhati V | Manufacture of porous diamond films |
JP2006022895A (ja) * | 2004-07-08 | 2006-01-26 | Nissan Motor Co Ltd | 高強度歯車及びその製造方法 |
EP1904901B2 (fr) | 2005-06-28 | 2013-07-10 | ETA SA Manufacture Horlogère Suisse | Piece de micro-mecanique renforcee |
CN100465334C (zh) * | 2005-07-07 | 2009-03-04 | 上海交通大学 | 金刚石薄膜涂层轴承支撑器的制备方法 |
JP4876464B2 (ja) * | 2005-07-19 | 2012-02-15 | 株式会社豊田中央研究所 | 低摩擦摺動部材 |
US20070269646A1 (en) * | 2006-05-18 | 2007-11-22 | Haverty Michael G | Bond termination of pores in a porous diamond dielectric material |
WO2008081904A1 (ja) * | 2006-12-27 | 2008-07-10 | Hitachi Chemical Co., Ltd. | 凹版及びこれを用いた導体層パターン付き基材 |
JP5120924B2 (ja) * | 2007-05-25 | 2013-01-16 | トヨタ自動車株式会社 | アモルファスカーボン膜の製造方法 |
SG155080A1 (en) * | 2008-02-25 | 2009-09-30 | Cal Comp Technology Pte Ltd | Surface coating for hard disk drive cavity |
JP4551957B2 (ja) * | 2008-12-12 | 2010-09-29 | 株式会社東芝 | 磁気記録媒体の製造方法 |
-
2010
- 2010-05-18 JP JP2012511266A patent/JP5647232B2/ja not_active Expired - Fee Related
- 2010-05-18 KR KR1020117027694A patent/KR20120011050A/ko active Application Filing
- 2010-05-18 CN CN201080020732.7A patent/CN102421936B/zh not_active Expired - Fee Related
- 2010-05-18 US US13/319,446 patent/US8770827B2/en not_active Expired - Fee Related
- 2010-05-18 EP EP10723017.9A patent/EP2432917B1/en active Active
- 2010-05-18 WO PCT/EP2010/056835 patent/WO2010133607A2/en active Application Filing
-
2012
- 2012-10-12 HK HK12110099.5A patent/HK1169456A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP5647232B2 (ja) | 2014-12-24 |
US20120051192A1 (en) | 2012-03-01 |
JP2012530187A (ja) | 2012-11-29 |
KR20120011050A (ko) | 2012-02-06 |
WO2010133607A3 (en) | 2011-01-20 |
CN102421936A (zh) | 2012-04-18 |
US8770827B2 (en) | 2014-07-08 |
WO2010133607A2 (en) | 2010-11-25 |
CN102421936B (zh) | 2014-10-22 |
EP2432917B1 (en) | 2018-10-17 |
EP2432917A2 (en) | 2012-03-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20190518 |