HK1153825A1 - Pellicle container - Google Patents

Pellicle container

Info

Publication number
HK1153825A1
HK1153825A1 HK11107875.2A HK11107875A HK1153825A1 HK 1153825 A1 HK1153825 A1 HK 1153825A1 HK 11107875 A HK11107875 A HK 11107875A HK 1153825 A1 HK1153825 A1 HK 1153825A1
Authority
HK
Hong Kong
Prior art keywords
pellicle container
pellicle
container
Prior art date
Application number
HK11107875.2A
Inventor
Horikoshijun
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1153825A1 publication Critical patent/HK1153825A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
HK11107875.2A 2009-08-06 2011-07-29 Pellicle container HK1153825A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009183033A JP2011034020A (en) 2009-08-06 2009-08-06 Pellicle storage container

Publications (1)

Publication Number Publication Date
HK1153825A1 true HK1153825A1 (en) 2012-04-05

Family

ID=43763126

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11107875.2A HK1153825A1 (en) 2009-08-06 2011-07-29 Pellicle container

Country Status (5)

Country Link
JP (1) JP2011034020A (en)
KR (1) KR20110014951A (en)
CN (1) CN101995764B (en)
HK (1) HK1153825A1 (en)
TW (1) TWI388475B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011095586A (en) * 2009-10-30 2011-05-12 Shin-Etsu Chemical Co Ltd Pellicle and method of manufacturing the same
JP5586560B2 (en) * 2011-10-28 2014-09-10 信越化学工業株式会社 Pellicle container
JP5586559B2 (en) * 2011-10-28 2014-09-10 信越化学工業株式会社 Pellicle container
JP2014009020A (en) * 2012-06-29 2014-01-20 Sekisui Plastics Co Ltd Packaging material and packaging body
JP6382298B2 (en) * 2013-03-27 2018-08-29 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic apparatus
JP5984187B2 (en) * 2013-04-22 2016-09-06 信越化学工業株式会社 Pellicle and photomask assembly
CN103449025A (en) * 2013-09-10 2013-12-18 昆山市巴城镇顺拓工程机械配件厂 Tray fixing clamp for semiconductor component
JP6320309B2 (en) * 2015-01-19 2018-05-09 信越化学工業株式会社 Pellicle storage container
JP2016151633A (en) * 2015-02-17 2016-08-22 信越化学工業株式会社 Pellicle-housing container
JP6275067B2 (en) * 2015-02-24 2018-02-07 信越化学工業株式会社 Pellicle storage container
JP6351178B2 (en) * 2015-07-13 2018-07-04 信越化学工業株式会社 Pellicle storage container and pellicle removal method
KR20220140650A (en) 2015-12-14 2022-10-18 에이에스엠엘 네델란즈 비.브이. A membrane for euv lithography
JP7242299B2 (en) 2015-12-14 2023-03-20 エーエスエムエル ネザーランズ ビー．ブイ． membrane assembly
JP6604651B2 (en) * 2016-02-22 2019-11-13 信越化学工業株式会社 Pellicle storage container
JP6357218B2 (en) * 2016-12-28 2018-07-11 積水化成品工業株式会社 Packing material and package

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3408000B2 (en) * 1994-11-28 2003-05-19 菱電セミコンダクタシステムエンジニアリング株式会社 Pellicle peeling method
JPH0955354A (en) * 1995-08-14 1997-02-25 Shin Etsu Polymer Co Ltd Pellicle housing container
JP3919260B2 (en) * 1996-07-05 2007-05-23 信越ポリマー株式会社 Pellicle storage container
JPH10114389A (en) * 1996-10-07 1998-05-06 Nikon Corp Pellicle container
JPH10114388A (en) * 1996-10-07 1998-05-06 Nikon Corp Pellicle container
JPH10198022A (en) * 1997-01-07 1998-07-31 Shin Etsu Chem Co Ltd Pellicle housing container
JPH1124240A (en) * 1997-07-07 1999-01-29 Shin Etsu Chem Co Ltd Pellicle housing method and pellicle housing container
JPH1149267A (en) * 1997-08-01 1999-02-23 Tenshiyou Denki Kogyo Kk Liquid crystal plate carrying container
JP2003216303A (en) * 2001-11-13 2003-07-31 Alps Electric Co Ltd Input device
JP2003243496A (en) * 2002-02-15 2003-08-29 Dainippon Printing Co Ltd Substrate storage case
JP3868401B2 (en) * 2003-06-25 2007-01-17 株式会社スズセイ Grip part structure of writing instruments
JP4236535B2 (en) * 2003-07-31 2009-03-11 旭化成エレクトロニクス株式会社 Large pellicle storage container
JP4455950B2 (en) * 2004-07-28 2010-04-21 三菱電線工業株式会社 Cleat
JP4391435B2 (en) * 2005-03-22 2009-12-24 信越化学工業株式会社 Pellicle storage container
JP2007065583A (en) * 2005-09-02 2007-03-15 Shin Etsu Chem Co Ltd Method for housing pellicle into pellicle container, method for taking out pellicle from pellicle container, method for transporting and storing pellicle, method for packaging pellicle container housing pellicle, and method for opening pellicle container housing pellicle
JP2007328226A (en) * 2006-06-09 2007-12-20 Shin Etsu Chem Co Ltd Pellicle storage container and method for manufacturing the same
JP4736972B2 (en) * 2006-06-22 2011-07-27 パナソニック株式会社 Multi-directional operation switch
JP2008158116A (en) * 2006-12-22 2008-07-10 Asahi Kasei Electronics Co Ltd Pellicle frame
JP4889510B2 (en) * 2007-01-16 2012-03-07 信越化学工業株式会社 Application method of adhesive to inner surface of pellicle frame
JP5269438B2 (en) * 2007-03-13 2013-08-21 旭化成イーマテリアルズ株式会社 Protective film for large pellicle and storage method for large pellicle
CN101689018B (en) * 2007-07-06 2013-03-20 旭化成电子材料株式会社 Frame of large pellicle and grasping method of frame
JP4930850B2 (en) * 2007-10-04 2012-05-16 Ｎｅｃカシオモバイルコミュニケーションズ株式会社 Waterproof structure and housing of electronic equipment
JP5051840B2 (en) * 2007-11-22 2012-10-17 信越化学工業株式会社 Method for storing a pellicle in a pellicle storage container
JP5133229B2 (en) * 2008-12-05 2013-01-30 信越ポリマー株式会社 Pellicle storage container
JP2011031978A (en) * 2009-08-05 2011-02-17 Shin Etsu Polymer Co Ltd Large-sized precision substrate storage container

Also Published As

Publication number Publication date
CN101995764B (en) 2013-01-23
TW201105555A (en) 2011-02-16
CN101995764A (en) 2011-03-30
TWI388475B (en) 2013-03-11
JP2011034020A (en) 2011-02-17
KR20110014951A (en) 2011-02-14

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210721