HK1097053A1 - Pellicle frame - Google Patents

Pellicle frame

Info

Publication number
HK1097053A1
HK1097053A1 HK07103830.1A HK07103830A HK1097053A1 HK 1097053 A1 HK1097053 A1 HK 1097053A1 HK 07103830 A HK07103830 A HK 07103830A HK 1097053 A1 HK1097053 A1 HK 1097053A1
Authority
HK
Hong Kong
Prior art keywords
pellicle frame
pellicle
frame
Prior art date
Application number
HK07103830.1A
Other languages
English (en)
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1097053A1 publication Critical patent/HK1097053A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK07103830.1A 2005-04-25 2007-04-12 Pellicle frame HK1097053A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005126736A JP2006301525A (ja) 2005-04-25 2005-04-25 ペリクルフレーム

Publications (1)

Publication Number Publication Date
HK1097053A1 true HK1097053A1 (en) 2007-06-15

Family

ID=37187287

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07103830.1A HK1097053A1 (en) 2005-04-25 2007-04-12 Pellicle frame

Country Status (6)

Country Link
US (1) US20060240199A1 (xx)
JP (1) JP2006301525A (xx)
KR (1) KR20060112585A (xx)
CN (1) CN1854891B (xx)
HK (1) HK1097053A1 (xx)
TW (1) TWI323385B (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4677632B2 (ja) * 2005-07-08 2011-04-27 レーザーテック株式会社 ペリクルライナー又はペリクルの剥離装置、剥離方法及びパターン基板の製造方法
JP4664859B2 (ja) * 2006-05-02 2011-04-06 信越化学工業株式会社 ペリクル剥離治具
JP4860527B2 (ja) * 2007-03-29 2012-01-25 旭化成イーマテリアルズ株式会社 隙間保持冶具及びマスクからペリクルを取り外す方法
KR101191055B1 (ko) * 2007-07-06 2012-10-15 아사히 가세이 이-매터리얼즈 가부시키가이샤 대형 펠리클 프레임체 및 그 프레임체의 파지 방법
JP5051840B2 (ja) 2007-11-22 2012-10-17 信越化学工業株式会社 ペリクル収納容器内にペリクルを保管する方法
JP5134436B2 (ja) * 2008-05-27 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
JP5512340B2 (ja) * 2010-03-17 2014-06-04 旭化成イーマテリアルズ株式会社 大型ペリクル
JP5722760B2 (ja) * 2011-02-08 2015-05-27 信越化学工業株式会社 ペリクル製造用キット
JP5649134B2 (ja) * 2011-02-08 2015-01-07 信越化学工業株式会社 ペリクルフレーム
JP5663376B2 (ja) * 2011-04-04 2015-02-04 信越化学工業株式会社 ペリクルフレーム、その製造方法、及びペリクル
JP2013195950A (ja) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd ベルクル及びフォトマスク
JP6805495B2 (ja) * 2016-01-08 2020-12-23 大日本印刷株式会社 防塵体の剥離方法、防塵体の剥離装置
JP6706575B2 (ja) * 2016-12-22 2020-06-10 信越化学工業株式会社 ペリクルフレーム及びこれを用いたペリクル
US11183410B2 (en) 2017-04-24 2021-11-23 Photronics, Inc. Pellicle removal tool
TWI670562B (zh) * 2018-06-21 2019-09-01 美商微相科技股份有限公司 光罩保護組件結構

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
JPS6141255U (ja) * 1984-08-20 1986-03-15 株式会社ニコン マスク保護装置
US5344677A (en) * 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
JPH095982A (ja) * 1995-06-17 1997-01-10 Mitsui Petrochem Ind Ltd マスク保護装置の剥離方法
JP2002131892A (ja) * 2000-10-27 2002-05-09 Asahi Kasei Electronics Co Ltd ペリクルの剥離方法及びその装置
JP4172192B2 (ja) * 2002-03-26 2008-10-29 凸版印刷株式会社 ペリクル構造体
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask
JP4286194B2 (ja) * 2004-08-18 2009-06-24 信越化学工業株式会社 ペリクルフレーム、および該フレームを用いたフォトリソグラフィー用ペリクル
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame

Also Published As

Publication number Publication date
TWI323385B (en) 2010-04-11
TW200638166A (en) 2006-11-01
CN1854891B (zh) 2011-09-21
KR20060112585A (ko) 2006-11-01
JP2006301525A (ja) 2006-11-02
US20060240199A1 (en) 2006-10-26
CN1854891A (zh) 2006-11-01

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220228