HK1070745A1 - Method for mass production of a plurality of magnetic sensors - Google Patents

Method for mass production of a plurality of magnetic sensors

Info

Publication number
HK1070745A1
HK1070745A1 HK05103389A HK05103389A HK1070745A1 HK 1070745 A1 HK1070745 A1 HK 1070745A1 HK 05103389 A HK05103389 A HK 05103389A HK 05103389 A HK05103389 A HK 05103389A HK 1070745 A1 HK1070745 A1 HK 1070745A1
Authority
HK
Hong Kong
Prior art keywords
mass production
magnetic sensors
sensors
magnetic
mass
Prior art date
Application number
HK05103389A
Other languages
English (en)
Inventor
Piguet Dominique
Vincent Franck
Original Assignee
Asulab Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asulab Sa filed Critical Asulab Sa
Publication of HK1070745A1 publication Critical patent/HK1070745A1/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
HK05103389A 2001-06-12 2005-04-20 Method for mass production of a plurality of magnetic sensors HK1070745A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01202262A EP1267427A1 (fr) 2001-06-12 2001-06-12 Procédé de fabrication en grand nombre d'une multiplicité de capteurs magnétiques
PCT/EP2002/005753 WO2002101845A2 (fr) 2001-06-12 2002-05-22 Procede de fabrication en grand nombre d'une multiplicite de capteurs magnetiques

Publications (1)

Publication Number Publication Date
HK1070745A1 true HK1070745A1 (en) 2005-06-24

Family

ID=8180465

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05103389A HK1070745A1 (en) 2001-06-12 2005-04-20 Method for mass production of a plurality of magnetic sensors

Country Status (7)

Country Link
US (1) US6949386B2 (xx)
EP (2) EP1267427A1 (xx)
JP (1) JP4274936B2 (xx)
CN (1) CN100362674C (xx)
DE (1) DE60207560T2 (xx)
HK (1) HK1070745A1 (xx)
WO (1) WO2002101845A2 (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9076717B2 (en) * 2006-12-08 2015-07-07 Infineon Technologies Ag Semiconductor component comprising magnetic field sensor
US8587297B2 (en) * 2007-12-04 2013-11-19 Infineon Technologies Ag Integrated circuit including sensor having injection molded magnetic material
JP2009231806A (ja) * 2008-02-28 2009-10-08 Nidec Sankyo Corp 磁気検出素子および磁気センサ用コアならびにこれらの製造方法
US8106654B2 (en) 2008-05-27 2012-01-31 Infineon Technologies Ag Magnetic sensor integrated circuit device and method
US8058870B2 (en) * 2008-05-30 2011-11-15 Infineon Technologies Ag Methods and systems for magnetic sensing
US8174256B2 (en) 2008-05-30 2012-05-08 Infineon Technologies Ag Methods and systems for magnetic field sensing
US20110187359A1 (en) * 2008-05-30 2011-08-04 Tobias Werth Bias field generation for a magneto sensor
US8610430B2 (en) 2008-05-30 2013-12-17 Infineon Technologies Ag Bias field generation for a magneto sensor
US9874609B2 (en) 2010-09-24 2018-01-23 Infineon Technologies Ag Sensor self-diagnostics using multiple signal paths
US9346441B2 (en) 2010-09-24 2016-05-24 Infineon Technologies Ag Sensor self-diagnostics using multiple signal paths
US10145882B2 (en) 2010-09-24 2018-12-04 Infineon Technologies Ag Sensor self-diagnostics using multiple signal paths
US9638762B2 (en) 2014-02-24 2017-05-02 Infineon Technologies Ag Highly efficient diagnostic methods for monolithic sensor systems
US9577185B1 (en) 2016-04-28 2017-02-21 Texas Instruments Incorporated Fluxgate device with low fluxgate noise
DE102019127776A1 (de) * 2019-08-14 2021-03-04 Vacuumschmelze Gmbh & Co. Kg Amorphes Metallband und Verfahren zum Herstellen eines amorphen Metallbands
DE102023100502A1 (de) * 2023-01-11 2024-07-11 Vacuumschmelze Gmbh & Co. Kg Verfahren zur Nachbearbeitung eines amorphen Bands

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09214017A (ja) * 1996-02-06 1997-08-15 Asahi Kasei Denshi Kk ホール素子
JP3487152B2 (ja) * 1997-12-25 2004-01-13 ソニー株式会社 磁気ヘッド及びその製造方法
US6809515B1 (en) * 1998-07-31 2004-10-26 Spinix Corporation Passive solid-state magnetic field sensors and applications therefor
EP1198718A1 (en) * 1999-04-05 2002-04-24 Spinix Corporation Passive solid-state magnetic field sensors and applications therefor
DE69925573T2 (de) * 1999-05-12 2006-04-27 Asulab S.A. Magnetischer F?hler hergestellt auf einem halbleitenden Substrat
EP1052519B1 (fr) * 1999-05-12 2005-06-01 Asulab S.A. Capteur magnétique réalisé sur un substrat semiconducteur
US6835576B2 (en) * 2000-05-02 2004-12-28 Fuji Electric Co., Ltd. Magnetic thin film, a magnetic component that uses this magnetic thin film, manufacturing methods for the same, and a power conversion device
US6937447B2 (en) * 2001-09-19 2005-08-30 Kabushiki Kaisha Toshiba Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory
JP4487472B2 (ja) * 2002-07-05 2010-06-23 株式会社日立製作所 磁気抵抗効果素子、及びこれを備える磁気ヘッド、磁気記録装置、磁気メモリ
KR100590211B1 (ko) * 2002-11-21 2006-06-15 가부시키가이샤 덴소 자기 임피던스 소자, 그를 이용한 센서 장치 및 그 제조방법

Also Published As

Publication number Publication date
EP1402585A2 (fr) 2004-03-31
WO2002101845A3 (fr) 2003-11-06
JP2005502189A (ja) 2005-01-20
DE60207560T2 (de) 2006-08-03
CN1541424A (zh) 2004-10-27
EP1402585B1 (fr) 2005-11-23
EP1267427A1 (fr) 2002-12-18
WO2002101845A2 (fr) 2002-12-19
CN100362674C (zh) 2008-01-16
US20050124136A1 (en) 2005-06-09
US6949386B2 (en) 2005-09-27
DE60207560D1 (de) 2005-12-29
JP4274936B2 (ja) 2009-06-10

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20120522