HK1060652A1 - Bridges for microelectromechanical structures - Google Patents

Bridges for microelectromechanical structures

Info

Publication number
HK1060652A1
HK1060652A1 HK04103519A HK04103519A HK1060652A1 HK 1060652 A1 HK1060652 A1 HK 1060652A1 HK 04103519 A HK04103519 A HK 04103519A HK 04103519 A HK04103519 A HK 04103519A HK 1060652 A1 HK1060652 A1 HK 1060652A1
Authority
HK
Hong Kong
Prior art keywords
bridges
microelectromechanical structures
microelectromechanical
structures
Prior art date
Application number
HK04103519A
Other languages
English (en)
Inventor
Ma Qing
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of HK1060652A1 publication Critical patent/HK1060652A1/xx

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0006Interconnects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5221Crossover interconnections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Micromachines (AREA)
  • Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
HK04103519A 2002-06-19 2004-05-18 Bridges for microelectromechanical structures HK1060652A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/174,935 US6812810B2 (en) 2002-06-19 2002-06-19 Bridges for microelectromechanical structures

Publications (1)

Publication Number Publication Date
HK1060652A1 true HK1060652A1 (en) 2004-08-13

Family

ID=27662625

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04103519A HK1060652A1 (en) 2002-06-19 2004-05-18 Bridges for microelectromechanical structures

Country Status (12)

Country Link
US (1) US6812810B2 (de)
EP (1) EP1375417A3 (de)
JP (1) JP2004047993A (de)
KR (1) KR100492382B1 (de)
CN (1) CN1251960C (de)
AU (1) AU2003243482A1 (de)
DE (1) DE10326555B4 (de)
GB (2) GB2392011B (de)
HK (1) HK1060652A1 (de)
MY (1) MY134508A (de)
TW (1) TW574133B (de)
WO (1) WO2004000718A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6812810B2 (en) * 2002-06-19 2004-11-02 Intel Corporation Bridges for microelectromechanical structures
JP4310633B2 (ja) * 2003-12-15 2009-08-12 日本電気株式会社 高周波スイッチ
US7321275B2 (en) * 2005-06-23 2008-01-22 Intel Corporation Ultra-low voltage capable zipper switch
US7602261B2 (en) * 2005-12-22 2009-10-13 Intel Corporation Micro-electromechanical system (MEMS) switch
US7554421B2 (en) * 2006-05-16 2009-06-30 Intel Corporation Micro-electromechanical system (MEMS) trampoline switch/varactor
US7605675B2 (en) * 2006-06-20 2009-10-20 Intel Corporation Electromechanical switch with partially rigidified electrode
US8946873B2 (en) * 2007-08-28 2015-02-03 Micron Technology, Inc. Redistribution structures for microfeature workpieces
KR20100061608A (ko) * 2008-11-29 2010-06-08 한국전자통신연구원 이종 접합 바이폴라 트랜지스터 및 그 형성 방법
JP5476854B2 (ja) * 2009-08-20 2014-04-23 沖電気工業株式会社 コプレーナ線路及びその製造方法
CN111033773B (zh) * 2017-08-31 2023-09-29 谷歌有限责任公司 量子信息处理器件的形成方法
US10431866B2 (en) * 2017-09-15 2019-10-01 International Business Machines Corporation Microfabricated air bridges for planar microwave resonator circuits

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3539705A (en) 1968-05-31 1970-11-10 Westinghouse Electric Corp Microelectronic conductor configurations and method of making the same
US4670297A (en) * 1985-06-21 1987-06-02 Raytheon Company Evaporated thick metal and airbridge interconnects and method of manufacture
US4739519A (en) * 1985-10-31 1988-04-19 Narda Western Operations Coplanar microwave balun, multiplexer and mixer assemblies
JPS6481343A (en) 1987-09-24 1989-03-27 Nec Corp Manufacture of integrated circuit
US4920323A (en) 1988-12-27 1990-04-24 Raytheon Company Miniature circulators for monolithic microwave integrated circuits
JP2856778B2 (ja) * 1989-09-07 1999-02-10 株式会社東芝 半導体装置の配線構造
US5281769A (en) * 1990-11-05 1994-01-25 Nippon Telegraph And Telephone Corporation Dewall plating technique
US5408742A (en) * 1991-10-28 1995-04-25 Martin Marietta Corporation Process for making air bridges for integrated circuits
US5194833A (en) * 1991-11-15 1993-03-16 Motorola, Inc. Airbridge compensated microwave conductors
US5521406A (en) 1994-08-31 1996-05-28 Texas Instruments Incorporated Integrated circuit with improved thermal impedance
US5686743A (en) * 1996-07-10 1997-11-11 Trw Inc. Method of forming airbridged metallization for integrated circuit fabrication
TWI246633B (en) * 1997-12-12 2006-01-01 Applied Materials Inc Method of pattern etching a low k dielectric layen
KR100262506B1 (ko) * 1998-03-04 2000-09-01 김규현 반도체 소자의 제조 방법
MY128644A (en) * 2000-08-31 2007-02-28 Georgia Tech Res Inst Fabrication of semiconductor devices with air gaps for ultra low capacitance interconnections and methods of making same
US6692979B2 (en) * 2001-08-13 2004-02-17 Optoic Technology, Inc. Methods of fabricating optoelectronic IC modules
WO2003019657A2 (en) 2001-08-29 2003-03-06 Koninklijke Philips Electronics N.V. Integrated circuit device with bump bridges and method for making the same
US6812810B2 (en) * 2002-06-19 2004-11-02 Intel Corporation Bridges for microelectromechanical structures

Also Published As

Publication number Publication date
KR100492382B1 (ko) 2005-05-30
TW200400917A (en) 2004-01-16
GB0314179D0 (en) 2003-07-23
CN1472133A (zh) 2004-02-04
GB2392011A (en) 2004-02-18
WO2004000718A3 (en) 2004-07-15
KR20040002553A (ko) 2004-01-07
WO2004000718A2 (en) 2003-12-31
TW574133B (en) 2004-02-01
US6812810B2 (en) 2004-11-02
GB0518966D0 (en) 2005-10-26
JP2004047993A (ja) 2004-02-12
CN1251960C (zh) 2006-04-19
EP1375417A2 (de) 2004-01-02
GB2422720B (en) 2006-12-20
DE10326555A1 (de) 2004-01-22
EP1375417A3 (de) 2004-11-03
AU2003243482A1 (en) 2004-01-06
DE10326555B4 (de) 2009-09-24
MY134508A (en) 2007-12-31
GB2422720A (en) 2006-08-02
US20030234703A1 (en) 2003-12-25
GB2392011B (en) 2006-08-23
AU2003243482A8 (en) 2004-01-06

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20110618