HK1056645A1 - Reactor for simultaneously coating both sides of spectacle glasses - Google Patents

Reactor for simultaneously coating both sides of spectacle glasses

Info

Publication number
HK1056645A1
HK1056645A1 HK03108775A HK03108775A HK1056645A1 HK 1056645 A1 HK1056645 A1 HK 1056645A1 HK 03108775 A HK03108775 A HK 03108775A HK 03108775 A HK03108775 A HK 03108775A HK 1056645 A1 HK1056645 A1 HK 1056645A1
Authority
HK
Hong Kong
Prior art keywords
sides
reactor
simultaneously coating
spectacle glasses
coating
Prior art date
Application number
HK03108775A
Other languages
English (en)
Inventor
Lars Bewig
Thomasz Kuepper
Original Assignee
Schott Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Ag filed Critical Schott Ag
Publication of HK1056645A1 publication Critical patent/HK1056645A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
  • Plasma Technology (AREA)
  • Eyeglasses (AREA)
  • Photovoltaic Devices (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Vapour Deposition (AREA)
HK03108775A 2001-12-13 2003-12-02 Reactor for simultaneously coating both sides of spectacle glasses HK1056645A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10161469A DE10161469A1 (de) 2001-12-13 2001-12-13 Volumenoptimierter Reaktor zur beidseitig gleichzeitigen Beschichtung von Brillengläsern

Publications (1)

Publication Number Publication Date
HK1056645A1 true HK1056645A1 (en) 2004-02-20

Family

ID=7709199

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03108775A HK1056645A1 (en) 2001-12-13 2003-12-02 Reactor for simultaneously coating both sides of spectacle glasses

Country Status (7)

Country Link
US (1) US7533628B2 (xx)
EP (1) EP1320118B1 (xx)
JP (1) JP3943010B2 (xx)
AT (1) ATE349771T1 (xx)
CA (1) CA2414390A1 (xx)
DE (2) DE10161469A1 (xx)
HK (1) HK1056645A1 (xx)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004030344B4 (de) * 2004-06-18 2012-12-06 Carl Zeiss Vorrichtung zum Beschichten optischer Gläser mittels plasmaunterstützter chemischer Dampfabscheidung (CVD)
EP1917842B1 (en) * 2005-08-26 2015-03-11 FUJIFILM Manufacturing Europe B.V. Method and arrangement for generating and controlling a discharge plasma
JP2009538989A (ja) * 2006-05-30 2009-11-12 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． パルス化大気圧グロー放電を使用する堆積の方法及び装置
EP2032738A1 (en) * 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
DE102006045704A1 (de) * 2006-09-27 2008-04-03 Osram Opto Semiconductors Gmbh Optisches Element und optoelektronisches Bauelement mit solch einem optischen Element
US8338307B2 (en) * 2007-02-13 2012-12-25 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
WO2009031886A2 (en) * 2007-09-07 2009-03-12 Fujifilm Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
US20090159104A1 (en) * 2007-12-19 2009-06-25 Judy Huang Method and apparatus for chamber cleaning by in-situ plasma excitation
JP5597551B2 (ja) * 2008-02-01 2014-10-01 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． 移動基材のプラズマ表面処理の装置、方法および当該方法の使用
JP5473946B2 (ja) * 2008-02-08 2014-04-16 フジフィルム マニュファクチュアリング ヨーロッパ ビー．ヴィ． Ｗｖｔｒバリア性を改善した多層スタック構造体の製造方法
FI20115073A0 (fi) 2011-01-26 2011-01-26 Beneq Oy Laitteisto, menetelmä ja reaktiokammio

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3830249A1 (de) * 1988-09-06 1990-03-15 Schott Glaswerke Plasmaverfahren zum beschichten ebener substrate
ATE181969T1 (de) * 1994-03-29 1999-07-15 Schott Glas Pcvd-verfahren und vorrichtung zur beschichtung von gewölbten substraten
DE4414083C2 (de) * 1994-04-22 2000-01-20 Leybold Ag Vorrichtung zum Herstellen dünner Schichten auf Kunststoff-Substraten und zum Ätzen solcher Substrate
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
JP3225855B2 (ja) * 1996-06-06 2001-11-05 株式会社島津製作所 薄膜形成装置
JP3944946B2 (ja) * 1997-04-25 2007-07-18 株式会社島津製作所 薄膜形成装置

Also Published As

Publication number Publication date
JP3943010B2 (ja) 2007-07-11
ATE349771T1 (de) 2007-01-15
EP1320118A2 (de) 2003-06-18
US7533628B2 (en) 2009-05-19
EP1320118A3 (de) 2005-03-30
US20030148041A1 (en) 2003-08-07
DE10161469A1 (de) 2003-07-03
EP1320118B1 (de) 2006-12-27
JP2003239075A (ja) 2003-08-27
CA2414390A1 (en) 2003-06-13
DE50209069D1 (de) 2007-02-08

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Legal Events

Date Code Title Description
CHPA Change of a particular in the register (except of change of ownership)
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20121127