HK1048309A1 - 多氟化環氧化物和有關聚合物以及製備方法 - Google Patents

多氟化環氧化物和有關聚合物以及製備方法

Info

Publication number
HK1048309A1
HK1048309A1 HK03100218.3A HK03100218A HK1048309A1 HK 1048309 A1 HK1048309 A1 HK 1048309A1 HK 03100218 A HK03100218 A HK 03100218A HK 1048309 A1 HK1048309 A1 HK 1048309A1
Authority
HK
Hong Kong
Prior art keywords
processes
associated polymers
polyfluorinated
epoxides
polyfluorinated epoxides
Prior art date
Application number
HK03100218.3A
Other languages
English (en)
Inventor
Alexandrovich Petrov Viacheslav
Edward Feiring Andrew
Feldman Jerald
Original Assignee
納幕爾杜邦公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 納幕爾杜邦公司 filed Critical 納幕爾杜邦公司
Publication of HK1048309A1 publication Critical patent/HK1048309A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D301/00—Preparation of oxiranes
    • C07D301/02—Synthesis of the oxirane ring
    • C07D301/24—Synthesis of the oxirane ring by splitting off HAL—Y from compounds containing the radical HAL—C—C—OY
    • C07D301/26—Y being hydrogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/08—Compounds containing oxirane rings with hydrocarbon radicals, substituted by halogen atoms, nitro radicals or nitroso radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F16/14—Monomers containing only one unsaturated aliphatic radical
    • C08F16/26—Monomers containing oxygen atoms in addition to the ether oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyethers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
HK03100218.3A 1999-05-04 2003-01-08 多氟化環氧化物和有關聚合物以及製備方法 HK1048309A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13245399P 1999-05-04 1999-05-04
PCT/US2000/011746 WO2000066575A2 (en) 1999-05-04 2000-05-01 Polyfluorinated epoxides and associated polymers and processes

Publications (1)

Publication Number Publication Date
HK1048309A1 true HK1048309A1 (zh) 2003-03-28

Family

ID=22454124

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03100218.3A HK1048309A1 (zh) 1999-05-04 2003-01-08 多氟化環氧化物和有關聚合物以及製備方法

Country Status (11)

Country Link
US (1) US6653419B1 (zh)
EP (1) EP1177184B1 (zh)
JP (1) JP4570788B2 (zh)
KR (1) KR100634941B1 (zh)
CN (1) CN1224620C (zh)
AU (1) AU4811800A (zh)
DE (1) DE60013270T2 (zh)
HK (1) HK1048309A1 (zh)
IL (1) IL145654A0 (zh)
TW (1) TW593425B (zh)
WO (1) WO2000066575A2 (zh)

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EP1481285A1 (en) 2002-03-01 2004-12-01 E.I. Du Pont De Nemours And Company Fluorinated copolymers for microlithography
TWI344966B (en) * 2003-03-10 2011-07-11 Maruzen Petrochem Co Ltd Novel thiol compound, copolymer and method for producing the copolymer
US7834113B2 (en) 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
US7696292B2 (en) 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
US7408013B2 (en) 2003-09-23 2008-08-05 Commonwealth Scientific And Industrial Research Organization Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
US7507522B2 (en) * 2004-05-20 2009-03-24 E. I. Dupont De Nemours And Company Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
WO2006099380A2 (en) * 2005-03-11 2006-09-21 E.I. Dupont De Nemours And Company Photoimageable, thermosettable fluorinated resists
JP4617207B2 (ja) * 2005-06-03 2011-01-19 丸善石油化学株式会社 半導体リソグラフィー用共重合体、組成物及びチオール化合物
WO2008021291A2 (en) 2006-08-14 2008-02-21 E. I. Du Pont De Nemours And Company Fluorinated polymers for use in immersion lithography
US7557225B2 (en) * 2006-12-06 2009-07-07 E.I. Du Pont De Nemours And Company Process for preparing hexafluoroisobutene epoxide
US20080248418A1 (en) * 2007-04-04 2008-10-09 William Brown Farnham Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom
WO2009096265A1 (ja) * 2008-01-30 2009-08-06 Daikin Industries, Ltd. 含フッ素エポキシドの製造方法
JP2010106118A (ja) * 2008-10-29 2010-05-13 Sumitomo Chemical Co Ltd 重合体及びフォトレジスト組成物
EP2365955B1 (en) 2008-11-14 2014-12-31 Heartlink Limited Aryl di-substituted propenone compounds
KR101247830B1 (ko) * 2009-09-15 2013-03-26 도오꾜오까고오교 가부시끼가이샤 보호막 형성용 재료 및 포토레지스트 패턴 형성 방법
KR200449666Y1 (ko) * 2010-01-26 2010-07-29 최은혁 낚시 꿰미
EP2688973A1 (en) * 2011-03-25 2014-01-29 3M Innovative Properties Company Fluorinated oxiranes as heat transfer fluids
JP5472217B2 (ja) 2011-06-29 2014-04-16 信越化学工業株式会社 ２，２−ビス（フルオロアルキル）オキシラン類を用いた光酸発生剤の製造方法
KR101469126B1 (ko) * 2013-06-21 2014-12-04 한양대학교 에리카산학협력단 에폭사이드 화합물의 제조 방법 및 아지리딘 화합물의 제조 방법
JP2015214497A (ja) * 2014-05-08 2015-12-03 国立大学法人山形大学 新規多官能グリシド酸エステル化合物及びその製法ならびにそれを用いたポリマー
EP3455322B1 (en) * 2016-05-09 2021-03-03 3M Innovative Properties Company Hydrofluoroolefins and methods of using same
US20210139441A1 (en) * 2017-03-10 2021-05-13 The Chemours Company Fc, Llc Uses of fluorinated epoxides and novel mixtures thereof
US20200010439A1 (en) * 2017-03-10 2020-01-09 The Chemours Company Fc, Llc Processes for preparing partially fluorinated epoxides and perfluorinated epoxides and compositions related thereto
KR101974859B1 (ko) 2017-03-20 2019-05-03 (주) 프리폴 플루오르 에폭사이드를 이용한 코팅용 불소수지 및 이의 제조방법
GB201706721D0 (en) * 2017-04-27 2017-06-14 Mexichem Fluor Sa De Cv Methods
CN115087686A (zh) * 2020-02-07 2022-09-20 中央硝子株式会社 固化性组合物、固化物、电子器件、显示装置、光学部件、聚合物、感光性组合物、图案及化合物

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WO2000067072A1 (en) * 1999-05-04 2000-11-09 E.I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography

Also Published As

Publication number Publication date
DE60013270D1 (de) 2004-09-30
KR100634941B1 (ko) 2006-10-17
JP4570788B2 (ja) 2010-10-27
IL145654A0 (en) 2002-06-30
EP1177184B1 (en) 2004-08-25
KR20020012205A (ko) 2002-02-15
CN1364165A (zh) 2002-08-14
EP1177184A2 (en) 2002-02-06
JP2002543247A (ja) 2002-12-17
AU4811800A (en) 2000-11-17
WO2000066575A3 (en) 2001-03-22
CN1224620C (zh) 2005-10-26
DE60013270T2 (de) 2005-09-22
US6653419B1 (en) 2003-11-25
WO2000066575A2 (en) 2000-11-09
TW593425B (en) 2004-06-21

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