HK1045860B - 提高在基體上薄膜沉積工藝的產率的方法 - Google Patents

提高在基體上薄膜沉積工藝的產率的方法

Info

Publication number
HK1045860B
HK1045860B HK02107068.0A HK02107068A HK1045860B HK 1045860 B HK1045860 B HK 1045860B HK 02107068 A HK02107068 A HK 02107068A HK 1045860 B HK1045860 B HK 1045860B
Authority
HK
Hong Kong
Prior art keywords
deposition
yield
processes
substrate
increasing
Prior art date
Application number
HK02107068.0A
Other languages
English (en)
Chinese (zh)
Other versions
HK1045860A1 (en
Inventor
A‧康特
F‧馬嘉
M‧莫拉加
Original Assignee
工程吸氣公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IT1999MI000744A external-priority patent/IT1312248B1/it
Application filed by 工程吸氣公司 filed Critical 工程吸氣公司
Publication of HK1045860A1 publication Critical patent/HK1045860A1/xx
Publication of HK1045860B publication Critical patent/HK1045860B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
HK02107068.0A 1999-04-12 2002-09-26 提高在基體上薄膜沉積工藝的產率的方法 HK1045860B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT1999MI000744A IT1312248B1 (it) 1999-04-12 1999-04-12 Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
PCT/IT2000/000136 WO2000061832A1 (en) 1999-04-12 2000-04-11 Method and getter devices for use in deposition of thin layers

Publications (2)

Publication Number Publication Date
HK1045860A1 HK1045860A1 (en) 2002-12-13
HK1045860B true HK1045860B (zh) 2006-09-15

Family

ID=34308071

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02107068.0A HK1045860B (zh) 1999-04-12 2002-09-26 提高在基體上薄膜沉積工藝的產率的方法

Country Status (6)

Country Link
KR (1) KR100469527B1 (ko)
HK (1) HK1045860B (ko)
MX (1) MXPA01010337A (ko)
MY (1) MY123684A (ko)
RU (1) RU2240377C2 (ko)
TW (1) TWI232889B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2523718C2 (ru) * 2012-11-20 2014-07-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Нанокомпозитная газопоглощающая структура и способ ее получения

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5685963A (en) * 1994-10-31 1997-11-11 Saes Pure Gas, Inc. In situ getter pump system and method

Also Published As

Publication number Publication date
HK1045860A1 (en) 2002-12-13
MY123684A (en) 2006-05-31
KR20010113796A (ko) 2001-12-28
RU2240377C2 (ru) 2004-11-20
MXPA01010337A (es) 2002-03-27
KR100469527B1 (ko) 2005-02-02
TWI232889B (en) 2005-05-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20110411