HK1005623A1 - New(cyclo) aliphatic epoxy compounds - Google Patents
New(cyclo) aliphatic epoxy compoundsInfo
- Publication number
- HK1005623A1 HK1005623A1 HK98104762A HK98104762A HK1005623A1 HK 1005623 A1 HK1005623 A1 HK 1005623A1 HK 98104762 A HK98104762 A HK 98104762A HK 98104762 A HK98104762 A HK 98104762A HK 1005623 A1 HK1005623 A1 HK 1005623A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- cyclo
- new
- epoxy compounds
- aliphatic epoxy
- contain
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/38—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D303/40—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3218—Carbocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Epoxy Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH394392 | 1992-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1005623A1 true HK1005623A1 (en) | 1999-01-15 |
Family
ID=4266828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK98104762A HK1005623A1 (en) | 1992-12-23 | 1998-06-02 | New(cyclo) aliphatic epoxy compounds |
Country Status (11)
Country | Link |
---|---|
US (2) | US5468886A (fr) |
EP (1) | EP0604364B1 (fr) |
JP (1) | JPH06228271A (fr) |
KR (1) | KR100294774B1 (fr) |
AT (1) | ATE163438T1 (fr) |
AU (2) | AU672645B2 (fr) |
CA (1) | CA2112010C (fr) |
DE (1) | DE59308175D1 (fr) |
ES (1) | ES2114601T3 (fr) |
HK (1) | HK1005623A1 (fr) |
TW (1) | TW259797B (fr) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW259797B (fr) * | 1992-12-23 | 1995-10-11 | Ciba Geigy | |
JP3117394B2 (ja) * | 1994-11-29 | 2000-12-11 | 帝人製機株式会社 | 光学的立体造形用樹脂組成物 |
US5639413A (en) * | 1995-03-30 | 1997-06-17 | Crivello; James Vincent | Methods and compositions related to stereolithography |
JPH08277321A (ja) * | 1995-04-05 | 1996-10-22 | Daicel Chem Ind Ltd | 光硬化性樹脂組成物 |
EP0748684B1 (fr) * | 1995-06-14 | 2000-08-30 | United Technologies Corporation | Méthode pour produire un objet solide et de dimensions stables |
ES2144836T3 (es) * | 1996-07-29 | 2000-06-16 | Ciba Sc Holding Ag | Composicion liquida reticulable por radiacion, en especial para estereolitografia. |
US6008266A (en) * | 1996-08-14 | 1999-12-28 | International Business Machines Corporation | Photosensitive reworkable encapsulant |
US7332537B2 (en) * | 1996-09-04 | 2008-02-19 | Z Corporation | Three dimensional printing material system and method |
JP3724893B2 (ja) * | 1996-09-25 | 2005-12-07 | ナブテスコ株式会社 | 光学的立体造形用樹脂組成物 |
JP3626302B2 (ja) * | 1996-12-10 | 2005-03-09 | Jsr株式会社 | 光硬化性樹脂組成物 |
US6124483A (en) * | 1996-12-23 | 2000-09-26 | Sartomer Technology Company | Process for preparing unsaturated esters containing cyclic epoxy group |
US5767150A (en) * | 1997-04-10 | 1998-06-16 | Sartomer Company | Cycloaliphatic epoxide compounds |
EP0887706A1 (fr) * | 1997-06-25 | 1998-12-30 | Wako Pure Chemical Industries Ltd | Composition pour photoréserve contenant un agent réticulant spécifique |
US6235363B1 (en) | 1998-05-06 | 2001-05-22 | Avery Dennison Corporation | Composite construction containing barrier layer |
US6150479A (en) * | 1998-11-23 | 2000-11-21 | Loctite Corporation | Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation |
US6342545B1 (en) | 1998-11-23 | 2002-01-29 | Loctite Corporation | Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation |
US6451948B1 (en) | 1999-08-19 | 2002-09-17 | Loctite Corporation | Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation |
EP1226019B1 (fr) | 1999-11-05 | 2004-03-03 | Z Corporation | Procedes pour impression tridimensionnelle |
WO2001051272A1 (fr) * | 2000-01-14 | 2001-07-19 | Abb Power T & D Company Inc. | Structures epoxydiques transparentes |
US20030200835A1 (en) * | 2002-04-02 | 2003-10-30 | Snecma Services | Diffusion-brazing filler powder for parts made of an alloy based on nickel, cobalt or iron |
US6833231B2 (en) * | 2002-07-31 | 2004-12-21 | 3D Systems, Inc. | Toughened stereolithographic resin compositions |
US7087109B2 (en) * | 2002-09-25 | 2006-08-08 | Z Corporation | Three dimensional printing material system and method |
ATE530331T1 (de) * | 2003-05-21 | 2011-11-15 | Z Corp | Thermoplastisches pulvermaterialsystem für appearance models von 3d-drucksystemen |
JP2008540710A (ja) * | 2005-05-04 | 2008-11-20 | サイテック サーフェース スペシャリティーズ、エス.エイ. | 放射線硬化性メタクリレートポリエステル |
US20070241482A1 (en) * | 2006-04-06 | 2007-10-18 | Z Corporation | Production of three-dimensional objects by use of electromagnetic radiation |
EP2089215B1 (fr) | 2006-12-08 | 2015-02-18 | 3D Systems Incorporated | Système de matériaux d'impression tridimensionnelle |
EP2109528B1 (fr) | 2007-01-10 | 2017-03-15 | 3D Systems Incorporated | Système de matériau d'impression tridimensionnel avec une couleur, une performance de l'article et une facilité d'utilisation améliorées et procédé utilisant ce système |
US7968626B2 (en) | 2007-02-22 | 2011-06-28 | Z Corporation | Three dimensional printing material system and method using plasticizer-assisted sintering |
CN104086748B (zh) * | 2014-06-27 | 2017-04-05 | 京东方科技集团股份有限公司 | 改性环氧丙烯酸酯、光阻组合物及其制备方法和透明光阻 |
KR101853387B1 (ko) * | 2015-03-27 | 2018-04-30 | 동우 화인켐 주식회사 | 플렉서블 디스플레이용 하드코팅 필름 |
KR102622843B1 (ko) * | 2016-02-15 | 2024-01-11 | 삼성디스플레이 주식회사 | 플렉서블 표시장치 및 그것의 하드 코팅 고분자 제조방법 |
JP6618186B2 (ja) * | 2016-05-12 | 2019-12-11 | 日本化薬株式会社 | 樹脂組成物および電子部品用接着剤 |
CN108196428B (zh) * | 2018-01-29 | 2020-03-31 | 深圳市华星光电技术有限公司 | 一种光刻胶组合物及彩色滤光片 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB788531A (en) * | 1954-03-25 | 1958-01-02 | Union Carbide Corp | Diepoxides and process of producing the same |
US4100141A (en) * | 1976-07-02 | 1978-07-11 | Loctite (Ireland) Limited | Stabilized adhesive and curing compositions |
US4565859A (en) * | 1984-01-30 | 1986-01-21 | Daicel Chemical Industries, Ltd. | Polyether compounds, epoxy resins, epoxy resin compositions, and processes for production thereof |
US4816496A (en) * | 1984-06-26 | 1989-03-28 | Kabushiki Kaisha Toshiba | Photocurable composition |
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4929402A (en) * | 1984-08-08 | 1990-05-29 | 3D Systems, Inc. | Method for production of three-dimensional objects by stereolithography |
DE3709230A1 (de) * | 1987-03-20 | 1988-10-06 | Desitin Arzneimittel Gmbh | Neues calciumsalz der valproinsaeure |
ATE161860T1 (de) * | 1988-02-19 | 1998-01-15 | Asahi Denka Kogyo Kk | Kunststoffzusammensetzung für optisches modellieren |
DE59105849D1 (de) * | 1990-09-24 | 1995-08-03 | Siemens Ag | Vernetzte Epoxidharze mit nichtlinear-optischen Eigenschaften. |
JP2899832B2 (ja) * | 1990-11-14 | 1999-06-02 | 日本ペイント株式会社 | 新規熱硬化性樹脂組成物 |
JP3142610B2 (ja) * | 1991-09-25 | 2001-03-07 | 株式会社日本触媒 | 不飽和エステル化合物の製造方法 |
TW259797B (fr) * | 1992-12-23 | 1995-10-11 | Ciba Geigy |
-
1993
- 1993-12-04 TW TW082110262A patent/TW259797B/zh active
- 1993-12-13 ES ES93810871T patent/ES2114601T3/es not_active Expired - Lifetime
- 1993-12-13 DE DE59308175T patent/DE59308175D1/de not_active Expired - Fee Related
- 1993-12-13 AT AT93810871T patent/ATE163438T1/de not_active IP Right Cessation
- 1993-12-13 EP EP93810871A patent/EP0604364B1/fr not_active Expired - Lifetime
- 1993-12-20 US US08/169,938 patent/US5468886A/en not_active Expired - Lifetime
- 1993-12-20 JP JP5344818A patent/JPH06228271A/ja active Pending
- 1993-12-21 CA CA002112010A patent/CA2112010C/fr not_active Expired - Fee Related
- 1993-12-22 AU AU52639/93A patent/AU672645B2/en not_active Ceased
- 1993-12-22 KR KR1019930029452A patent/KR100294774B1/ko not_active IP Right Cessation
-
1995
- 1995-08-21 US US08/517,888 patent/US5599651A/en not_active Expired - Fee Related
-
1997
- 1997-01-09 AU AU10090/97A patent/AU683002B2/en not_active Ceased
-
1998
- 1998-06-02 HK HK98104762A patent/HK1005623A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW259797B (fr) | 1995-10-11 |
AU683002B2 (en) | 1997-10-23 |
US5468886A (en) | 1995-11-21 |
EP0604364B1 (fr) | 1998-02-25 |
KR940014373A (ko) | 1994-07-18 |
EP0604364A3 (fr) | 1995-01-04 |
ES2114601T3 (es) | 1998-06-01 |
AU5263993A (en) | 1994-07-07 |
CA2112010C (fr) | 2000-03-07 |
DE59308175D1 (de) | 1998-04-02 |
EP0604364A2 (fr) | 1994-06-29 |
JPH06228271A (ja) | 1994-08-16 |
US5599651A (en) | 1997-02-04 |
ATE163438T1 (de) | 1998-03-15 |
KR100294774B1 (ko) | 2001-09-17 |
AU1009097A (en) | 1997-03-06 |
CA2112010A1 (fr) | 1994-06-24 |
AU672645B2 (en) | 1996-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20031213 |
|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |