GB9910391D0 - Electron-beam lithography system - Google Patents

Electron-beam lithography system

Info

Publication number
GB9910391D0
GB9910391D0 GBGB9910391.3A GB9910391A GB9910391D0 GB 9910391 D0 GB9910391 D0 GB 9910391D0 GB 9910391 A GB9910391 A GB 9910391A GB 9910391 D0 GB9910391 D0 GB 9910391D0
Authority
GB
United Kingdom
Prior art keywords
electron
lithography system
beam lithography
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB9910391.3A
Other versions
GB2337359A (en
GB2337359B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of GB9910391D0 publication Critical patent/GB9910391D0/en
Publication of GB2337359A publication Critical patent/GB2337359A/en
Application granted granted Critical
Publication of GB2337359B publication Critical patent/GB2337359B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30405—Details
    • H01J2237/30411—Details using digital signal processors [DSP]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB9910391A 1998-05-12 1999-05-05 Electron-beam lithography system Expired - Fee Related GB2337359B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10128795A JPH11329928A (en) 1998-05-12 1998-05-12 Electron beam exposure system

Publications (3)

Publication Number Publication Date
GB9910391D0 true GB9910391D0 (en) 1999-07-07
GB2337359A GB2337359A (en) 1999-11-17
GB2337359B GB2337359B (en) 2000-06-28

Family

ID=14993639

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9910391A Expired - Fee Related GB2337359B (en) 1998-05-12 1999-05-05 Electron-beam lithography system

Country Status (5)

Country Link
JP (1) JPH11329928A (en)
KR (1) KR19990088179A (en)
DE (1) DE19922545A1 (en)
GB (1) GB2337359B (en)
TW (1) TW424264B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021731A (en) * 1998-07-02 2000-01-21 Advantest Corp Charged particle beam aligner
JP3982913B2 (en) * 1998-07-17 2007-09-26 株式会社アドバンテスト Charged particle beam exposure system
KR100528971B1 (en) * 2003-05-02 2005-11-16 한국전자통신연구원 Electron beam lithography system
KR100725372B1 (en) 2006-02-03 2007-06-07 삼성전자주식회사 E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating the photomasks using the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4430571A (en) * 1981-04-16 1984-02-07 Control Data Corporation Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
US4390789A (en) * 1981-05-21 1983-06-28 Control Data Corporation Electron beam array lithography system employing multiple parallel array optics channels and method of operation
US4694178A (en) * 1985-06-28 1987-09-15 Control Data Corporation Multiple channel electron beam optical column lithography system and method of operation
JPS6257215A (en) * 1985-09-06 1987-03-12 Jeol Ltd Charged-particle-beam scribing apparatus
JPS6292434A (en) * 1985-10-18 1987-04-27 Mitsubishi Electric Corp Electron beam exposing apparatus
JPS6298724A (en) * 1985-10-25 1987-05-08 Hitachi Ltd Electron beam patterning device
JPS62147725A (en) * 1985-12-23 1987-07-01 Nippon Telegr & Teleph Corp <Ntt> Charged beam exposure apparatus
JPS6441216A (en) * 1987-08-06 1989-02-13 Sharp Kk Electron beam lithography equipment
JP3400601B2 (en) * 1995-04-06 2003-04-28 富士通株式会社 Charged particle beam exposure method and apparatus
JPH1140469A (en) * 1997-07-16 1999-02-12 Nikon Corp Lithography system and method of control work thereof

Also Published As

Publication number Publication date
TW424264B (en) 2001-03-01
GB2337359A (en) 1999-11-17
DE19922545A1 (en) 1999-11-25
KR19990088179A (en) 1999-12-27
GB2337359B (en) 2000-06-28
JPH11329928A (en) 1999-11-30

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20030505