IL120680A0 - An electron beam lithography system - Google Patents

An electron beam lithography system

Info

Publication number
IL120680A0
IL120680A0 IL12068097A IL12068097A IL120680A0 IL 120680 A0 IL120680 A0 IL 120680A0 IL 12068097 A IL12068097 A IL 12068097A IL 12068097 A IL12068097 A IL 12068097A IL 120680 A0 IL120680 A0 IL 120680A0
Authority
IL
Israel
Prior art keywords
electron beam
lithography system
beam lithography
electron
lithography
Prior art date
Application number
IL12068097A
Original Assignee
Elta Electronics Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elta Electronics Ind Ltd filed Critical Elta Electronics Ind Ltd
Priority to IL12068097A priority Critical patent/IL120680A0/en
Publication of IL120680A0 publication Critical patent/IL120680A0/en
Priority to PCT/IL1998/000180 priority patent/WO1998047167A1/en
Priority to AU69331/98A priority patent/AU6933198A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
IL12068097A 1997-04-16 1997-04-16 An electron beam lithography system IL120680A0 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IL12068097A IL120680A0 (en) 1997-04-16 1997-04-16 An electron beam lithography system
PCT/IL1998/000180 WO1998047167A1 (en) 1997-04-16 1998-04-14 An electron beam lithography system
AU69331/98A AU6933198A (en) 1997-04-16 1998-04-14 An electron beam lithography system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL12068097A IL120680A0 (en) 1997-04-16 1997-04-16 An electron beam lithography system

Publications (1)

Publication Number Publication Date
IL120680A0 true IL120680A0 (en) 1997-08-14

Family

ID=11070045

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12068097A IL120680A0 (en) 1997-04-16 1997-04-16 An electron beam lithography system

Country Status (3)

Country Link
AU (1) AU6933198A (en)
IL (1) IL120680A0 (en)
WO (1) WO1998047167A1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5365072A (en) * 1993-08-30 1994-11-15 The United States Of America As Represented By The Secretary Of The Navy Repositionable substrate for microscopes
US5424548A (en) * 1993-09-21 1995-06-13 International Business Machines Corp. Pattern specific calibration for E-beam lithography

Also Published As

Publication number Publication date
AU6933198A (en) 1998-11-11
WO1998047167A1 (en) 1998-10-22

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