GB971770A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- GB971770A GB971770A GB44959/62A GB4495962A GB971770A GB 971770 A GB971770 A GB 971770A GB 44959/62 A GB44959/62 A GB 44959/62A GB 4495962 A GB4495962 A GB 4495962A GB 971770 A GB971770 A GB 971770A
- Authority
- GB
- United Kingdom
- Prior art keywords
- anode
- plasma
- electrode
- control member
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/10—Duoplasmatrons ; Duopigatrons
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
971,770. Ion sources. HIGH VOLTAGE ENGINEERING CORPORATION. Nov. 28, 1962 [Dee. 11, 1961; June 18, 1962], No. 44959/62. Heading H1D. In an unoplasmatron ion source with filamentary electron-emitting cathode 8, Fig. 2, and intermediate electrode 9 disposed within a gas-supplied ionization chamber 36 of which the end wall is constituted by a small-apertured anode 11 and with, beyond the ionization chamber, an evacuated beam forming chamber containing an extractor electrode 15 and a focusing electrode 16, a relatively large apertured plasma control member 12 is provided between the anode 11 and extractor electrode 12 in order to permit expansion of the plasma and so secure a smaller divergence of the ion beam entering the lens 15, 16. It is therefore possible to obtain larger beam currents while restricting gas flow through the anode aperture. A magnet coil 7 shapes the discharge between filament 8 and anode 11. In another embodiment, Fig. 4, the plasma control member 35 is an extension of the anode and provides a drift space for the expansion of the plasma. A grid 37 may be provided to establish the plasma boundary.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15820661A | 1961-12-11 | 1961-12-11 | |
US205168A US3265918A (en) | 1961-12-11 | 1962-06-18 | Ion source having plasma control means |
Publications (1)
Publication Number | Publication Date |
---|---|
GB971770A true GB971770A (en) | 1964-10-07 |
Family
ID=26854835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB44959/62A Expired GB971770A (en) | 1961-12-11 | 1962-11-28 | Ion source |
Country Status (5)
Country | Link |
---|---|
US (1) | US3265918A (en) |
CH (1) | CH403995A (en) |
DE (1) | DE1233955B (en) |
GB (1) | GB971770A (en) |
NL (1) | NL285354A (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3458743A (en) * | 1966-12-19 | 1969-07-29 | Radiation Dynamics | Positive ion source for use with a duoplasmatron |
DE1648588B1 (en) * | 1967-09-07 | 1971-02-25 | Leybold Heraeus Gmbh & Co Kg | VACUUM MEASURING SYSTEM WITH A BOTTLE CONNECTOR |
FR2061809A5 (en) * | 1969-04-04 | 1971-06-25 | Commissariat Energie Atomique | |
FR2156978A5 (en) * | 1971-10-13 | 1973-06-01 | Anvar | |
US3924134A (en) * | 1974-11-29 | 1975-12-02 | Ibm | Double chamber ion source |
US4020384A (en) * | 1975-08-25 | 1977-04-26 | The Raymond Lee Organization, Inc. | Linear particle accelerator |
US4103202A (en) * | 1976-12-03 | 1978-07-25 | Klykon, Inc. | Ion projector head |
US7838850B2 (en) * | 1999-12-13 | 2010-11-23 | Semequip, Inc. | External cathode ion source |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2975277A (en) * | 1955-05-10 | 1961-03-14 | Vakutronik Veb | Ion source |
DE1001429B (en) * | 1955-06-27 | 1957-01-24 | Siemens Ag | Ion source |
DE1059581B (en) * | 1956-03-28 | 1959-06-18 | Siemens Ag | Plasma source for charged particles |
DE1014671B (en) * | 1956-04-24 | 1957-08-29 | Siemens Ag | Device for generating multiply charged ions in an arc discharge source |
FR1209092A (en) * | 1958-05-03 | 1960-02-29 | Commissariat Energie Atomique | New ion source |
FR1262136A (en) * | 1960-06-20 | 1961-05-26 | Vakutronik Veb | Source of ions and electrons, especially for van de graaff generators |
-
0
- NL NL285354D patent/NL285354A/xx unknown
-
1962
- 1962-06-18 US US205168A patent/US3265918A/en not_active Expired - Lifetime
- 1962-11-22 DE DEH47471A patent/DE1233955B/en active Pending
- 1962-11-28 GB GB44959/62A patent/GB971770A/en not_active Expired
- 1962-12-04 CH CH1421062A patent/CH403995A/en unknown
Also Published As
Publication number | Publication date |
---|---|
DE1233955B (en) | 1967-02-09 |
CH403995A (en) | 1965-12-15 |
US3265918A (en) | 1966-08-09 |
NL285354A (en) |
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