GB971770A - Ion source - Google Patents

Ion source

Info

Publication number
GB971770A
GB971770A GB44959/62A GB4495962A GB971770A GB 971770 A GB971770 A GB 971770A GB 44959/62 A GB44959/62 A GB 44959/62A GB 4495962 A GB4495962 A GB 4495962A GB 971770 A GB971770 A GB 971770A
Authority
GB
United Kingdom
Prior art keywords
anode
plasma
electrode
control member
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB44959/62A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
High Voltage Engineering Corp
Original Assignee
High Voltage Engineering Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by High Voltage Engineering Corp filed Critical High Voltage Engineering Corp
Publication of GB971770A publication Critical patent/GB971770A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/08Ion sources; Ion guns using arc discharge
    • H01J27/10Duoplasmatrons ; Duopigatrons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

971,770. Ion sources. HIGH VOLTAGE ENGINEERING CORPORATION. Nov. 28, 1962 [Dee. 11, 1961; June 18, 1962], No. 44959/62. Heading H1D. In an unoplasmatron ion source with filamentary electron-emitting cathode 8, Fig. 2, and intermediate electrode 9 disposed within a gas-supplied ionization chamber 36 of which the end wall is constituted by a small-apertured anode 11 and with, beyond the ionization chamber, an evacuated beam forming chamber containing an extractor electrode 15 and a focusing electrode 16, a relatively large apertured plasma control member 12 is provided between the anode 11 and extractor electrode 12 in order to permit expansion of the plasma and so secure a smaller divergence of the ion beam entering the lens 15, 16. It is therefore possible to obtain larger beam currents while restricting gas flow through the anode aperture. A magnet coil 7 shapes the discharge between filament 8 and anode 11. In another embodiment, Fig. 4, the plasma control member 35 is an extension of the anode and provides a drift space for the expansion of the plasma. A grid 37 may be provided to establish the plasma boundary.
GB44959/62A 1961-12-11 1962-11-28 Ion source Expired GB971770A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15820661A 1961-12-11 1961-12-11
US205168A US3265918A (en) 1961-12-11 1962-06-18 Ion source having plasma control means

Publications (1)

Publication Number Publication Date
GB971770A true GB971770A (en) 1964-10-07

Family

ID=26854835

Family Applications (1)

Application Number Title Priority Date Filing Date
GB44959/62A Expired GB971770A (en) 1961-12-11 1962-11-28 Ion source

Country Status (5)

Country Link
US (1) US3265918A (en)
CH (1) CH403995A (en)
DE (1) DE1233955B (en)
GB (1) GB971770A (en)
NL (1) NL285354A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458743A (en) * 1966-12-19 1969-07-29 Radiation Dynamics Positive ion source for use with a duoplasmatron
DE1648588B1 (en) * 1967-09-07 1971-02-25 Leybold Heraeus Gmbh & Co Kg VACUUM MEASURING SYSTEM WITH A BOTTLE CONNECTOR
FR2061809A5 (en) * 1969-04-04 1971-06-25 Commissariat Energie Atomique
FR2156978A5 (en) * 1971-10-13 1973-06-01 Anvar
US3924134A (en) * 1974-11-29 1975-12-02 Ibm Double chamber ion source
US4020384A (en) * 1975-08-25 1977-04-26 The Raymond Lee Organization, Inc. Linear particle accelerator
US4103202A (en) * 1976-12-03 1978-07-25 Klykon, Inc. Ion projector head
US7838850B2 (en) * 1999-12-13 2010-11-23 Semequip, Inc. External cathode ion source

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2975277A (en) * 1955-05-10 1961-03-14 Vakutronik Veb Ion source
DE1001429B (en) * 1955-06-27 1957-01-24 Siemens Ag Ion source
DE1059581B (en) * 1956-03-28 1959-06-18 Siemens Ag Plasma source for charged particles
DE1014671B (en) * 1956-04-24 1957-08-29 Siemens Ag Device for generating multiply charged ions in an arc discharge source
FR1209092A (en) * 1958-05-03 1960-02-29 Commissariat Energie Atomique New ion source
FR1262136A (en) * 1960-06-20 1961-05-26 Vakutronik Veb Source of ions and electrons, especially for van de graaff generators

Also Published As

Publication number Publication date
DE1233955B (en) 1967-02-09
CH403995A (en) 1965-12-15
US3265918A (en) 1966-08-09
NL285354A (en)

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