GB958685A - Improvements in or relating to palladium plating - Google Patents
Improvements in or relating to palladium platingInfo
- Publication number
- GB958685A GB958685A GB3476460A GB3476460A GB958685A GB 958685 A GB958685 A GB 958685A GB 3476460 A GB3476460 A GB 3476460A GB 3476460 A GB3476460 A GB 3476460A GB 958685 A GB958685 A GB 958685A
- Authority
- GB
- United Kingdom
- Prior art keywords
- nh2so3
- palladium
- ions
- source
- h2pd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Palladium is electrodeposited from a solution of pH 5-9, at a temperature of 10-35 DEG C., containing a source of palladium ions or palladium-containing ions, a source of ammonium ions and a source of sulphamate ions. The palladium may be at least partly provided by a complex palladium compound, e.g. Pd(NH3)2 (NH2SO3)2, Pd(NH3)2SO4, (NH4)2Pd (NH2SO3)2 (NO2)2, (NH4)2Pd(NO2)2 SO4, H2Pd (NH2SO3) (NO2)2 or H2Pd(NO2)2SO4. The bath composition may be in gms./litre Pd (calculated as metal) 4-100, NH4NO2 4-100, NH4NH2SO3 20-160, Ni(NH2SO3)2 0-1, ammonia to give pH 6-8 and working conditions are: temperature 15-35 DEG C., strike voltage 2-4, working voltage 1.3-1.8, current density 2-40 amps./sq.foot, cathode efficiency at 35 DEG C. at least 95% or at 5 amp./sq.foot 34 mgms. of Pd/amp. min. The anodes may be of platinum or palladium and the vessel containing the electrolyte may be made of or lined with glass, "Perspex" (Registered Trade Mark), polyethylene, polyvinyl chloride, or austenitic stainless steel. The preparation of solutions containing Pd(NH3)2 (NH2SO3)2 and (NH4)2Pd(NH4SO3)2 (NO2)2 and Pd(NH3)2 (NH2SO3)2 is described in C1A. Printed circuit boards may be plated in the solution (see Division H1).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3476460A GB958685A (en) | 1960-10-11 | 1960-10-11 | Improvements in or relating to palladium plating |
| US143577A US3235392A (en) | 1960-10-11 | 1961-10-09 | Electroless deposition of palladium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3476460A GB958685A (en) | 1960-10-11 | 1960-10-11 | Improvements in or relating to palladium plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB958685A true GB958685A (en) | 1964-05-21 |
Family
ID=10369673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3476460A Expired GB958685A (en) | 1960-10-11 | 1960-10-11 | Improvements in or relating to palladium plating |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB958685A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3376206A (en) * | 1964-06-30 | 1968-04-02 | Ibm | Electrolyte for the electrodeposition of palladium |
| FR2463823A1 (en) * | 1979-08-20 | 1981-02-27 | Oxy Metal Industries Corp | METHODS AND COMPOSITIONS FOR THE ELECTROLYTIC DEPOSITION OF PALLADIUM USING A SOURCE OF FREE NITRITE IONS |
| US4297177A (en) | 1980-09-19 | 1981-10-27 | American Chemical & Refining Company Incorporated | Method and composition for electrodepositing palladium/nickel alloys |
| DE3706497A1 (en) * | 1986-02-28 | 1987-09-03 | Technic | GALVANIC BATHROOM FOR DEPOSITING PALLADIUM OR ALLOYS THEREOF |
| US4699697A (en) * | 1984-05-24 | 1987-10-13 | Electroplating Engineers Of Japan, Limited | High-purity palladium-nickel alloy plating solution and process |
| US4778574A (en) * | 1987-09-14 | 1988-10-18 | American Chemical & Refining Company, Inc. | Amine-containing bath for electroplating palladium |
-
1960
- 1960-10-11 GB GB3476460A patent/GB958685A/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3376206A (en) * | 1964-06-30 | 1968-04-02 | Ibm | Electrolyte for the electrodeposition of palladium |
| FR2463823A1 (en) * | 1979-08-20 | 1981-02-27 | Oxy Metal Industries Corp | METHODS AND COMPOSITIONS FOR THE ELECTROLYTIC DEPOSITION OF PALLADIUM USING A SOURCE OF FREE NITRITE IONS |
| US4297177A (en) | 1980-09-19 | 1981-10-27 | American Chemical & Refining Company Incorporated | Method and composition for electrodepositing palladium/nickel alloys |
| US4699697A (en) * | 1984-05-24 | 1987-10-13 | Electroplating Engineers Of Japan, Limited | High-purity palladium-nickel alloy plating solution and process |
| DE3706497A1 (en) * | 1986-02-28 | 1987-09-03 | Technic | GALVANIC BATHROOM FOR DEPOSITING PALLADIUM OR ALLOYS THEREOF |
| GB2187204A (en) * | 1986-02-28 | 1987-09-03 | Technic | Electroplating solution for deposition of palladium or alloys thereof |
| GB2187204B (en) * | 1986-02-28 | 1990-11-14 | Technic | Electroplating solution for deposition of palladium or alloys thereof |
| US4778574A (en) * | 1987-09-14 | 1988-10-18 | American Chemical & Refining Company, Inc. | Amine-containing bath for electroplating palladium |
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