GB907999A - Improvements in or relating to methods and apparatus for producing electrodes on semi-conductor bodies - Google Patents

Improvements in or relating to methods and apparatus for producing electrodes on semi-conductor bodies

Info

Publication number
GB907999A
GB907999A GB3112760A GB3112760A GB907999A GB 907999 A GB907999 A GB 907999A GB 3112760 A GB3112760 A GB 3112760A GB 3112760 A GB3112760 A GB 3112760A GB 907999 A GB907999 A GB 907999A
Authority
GB
United Kingdom
Prior art keywords
stencil
semi
conductor
frame
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3112760A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens Corp
Original Assignee
Siemens and Halske AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DES64847A external-priority patent/DE1113521B/de
Application filed by Siemens and Halske AG, Siemens Corp filed Critical Siemens and Halske AG
Publication of GB907999A publication Critical patent/GB907999A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
GB3112760A 1959-09-10 1960-09-09 Improvements in or relating to methods and apparatus for producing electrodes on semi-conductor bodies Expired GB907999A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DES64847A DE1113521B (de) 1959-09-10 1959-09-10 Verfahren und Vorrichtung zum Erzeugen zweier dicht nebeneinander-liegender Elektroden an Halbleiterkoerpern
DES84300A DE1222168B (de) 1959-09-10 1963-03-22 Verfahren zum Erzeugen mindestens zweier dicht nebeneinanderliegender Elektroden aufHalbleiterkoerpern

Publications (1)

Publication Number Publication Date
GB907999A true GB907999A (en) 1962-10-10

Family

ID=25995837

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3112760A Expired GB907999A (en) 1959-09-10 1960-09-09 Improvements in or relating to methods and apparatus for producing electrodes on semi-conductor bodies

Country Status (4)

Country Link
CH (1) CH395343A (OSRAM)
DE (1) DE1222168B (OSRAM)
GB (1) GB907999A (OSRAM)
NL (2) NL255702A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170822A (en) * 1985-01-31 1986-08-13 Sharp Kk A method for the production of substrates coated with a uniform dispersion of extremely fine granules

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1113521B (de) * 1959-09-10 1961-09-07 Siemens Ag Verfahren und Vorrichtung zum Erzeugen zweier dicht nebeneinander-liegender Elektroden an Halbleiterkoerpern

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170822A (en) * 1985-01-31 1986-08-13 Sharp Kk A method for the production of substrates coated with a uniform dispersion of extremely fine granules
US4654229A (en) * 1985-01-31 1987-03-31 Sharp Kabushiki Kaisha Method for the production of substrates with a uniform dispersion of extremely fine granules
GB2170822B (en) * 1985-01-31 1989-06-07 Sharp Kk A method for the production of substrates having a uniform dispersion of ultra fine granules deposited thereon

Also Published As

Publication number Publication date
NL255702A (OSRAM)
DE1222168B (de) 1966-08-04
NL128994C (OSRAM)
CH395343A (de) 1965-07-15

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