GB8326620D0 - Integrated circuits - Google Patents

Integrated circuits

Info

Publication number
GB8326620D0
GB8326620D0 GB838326620A GB8326620A GB8326620D0 GB 8326620 D0 GB8326620 D0 GB 8326620D0 GB 838326620 A GB838326620 A GB 838326620A GB 8326620 A GB8326620 A GB 8326620A GB 8326620 D0 GB8326620 D0 GB 8326620D0
Authority
GB
United Kingdom
Prior art keywords
integrated circuits
circuits
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB838326620A
Other versions
GB2127751B (en
GB2127751A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plessey Co Ltd
Original Assignee
Plessey Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plessey Co Ltd filed Critical Plessey Co Ltd
Priority to GB08326620A priority Critical patent/GB2127751B/en
Publication of GB8326620D0 publication Critical patent/GB8326620D0/en
Publication of GB2127751A publication Critical patent/GB2127751A/en
Application granted granted Critical
Publication of GB2127751B publication Critical patent/GB2127751B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
GB08326620A 1982-10-06 1983-10-05 Producing narrow features in electrical devices Expired GB2127751B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08326620A GB2127751B (en) 1982-10-06 1983-10-05 Producing narrow features in electrical devices

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8228615 1982-10-06
GB08326620A GB2127751B (en) 1982-10-06 1983-10-05 Producing narrow features in electrical devices

Publications (3)

Publication Number Publication Date
GB8326620D0 true GB8326620D0 (en) 1983-11-09
GB2127751A GB2127751A (en) 1984-04-18
GB2127751B GB2127751B (en) 1986-04-23

Family

ID=26284056

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08326620A Expired GB2127751B (en) 1982-10-06 1983-10-05 Producing narrow features in electrical devices

Country Status (1)

Country Link
GB (1) GB2127751B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4236609A1 (en) * 1992-10-29 1994-05-05 Siemens Ag Method for forming a structure in the surface of a substrate - with an auxiliary structure laterally bounding an initial masking structure, followed by selective removal of masking structure using the auxiliary structure as an etching mask
US7498119B2 (en) 2006-01-20 2009-03-03 Palo Alto Research Center Incorporated Process for forming a feature by undercutting a printed mask
US7365022B2 (en) 2006-01-20 2008-04-29 Palo Alto Research Center Incorporated Additive printed mask process and structures produced thereby

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1154015A (en) * 1966-08-22 1969-06-04 Photo Engravers Res Inst Inc Etching of Printed Circuit Components
CH476398A (en) * 1968-03-01 1969-07-31 Ibm Process for producing fine etched patterns
CH471242A (en) * 1968-03-01 1969-04-15 Ibm Method for the selective masking of surfaces to be processed
IT1041193B (en) * 1975-08-08 1980-01-10 Selenia Ind Elettroniche IMPROVEMENTS IN PROCEDURES FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES

Also Published As

Publication number Publication date
GB2127751B (en) 1986-04-23
GB2127751A (en) 1984-04-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee