CH471242A - Method for the selective masking of surfaces to be processed - Google Patents
Method for the selective masking of surfaces to be processedInfo
- Publication number
- CH471242A CH471242A CH313168A CH313168A CH471242A CH 471242 A CH471242 A CH 471242A CH 313168 A CH313168 A CH 313168A CH 313168 A CH313168 A CH 313168A CH 471242 A CH471242 A CH 471242A
- Authority
- CH
- Switzerland
- Prior art keywords
- processed
- selective masking
- masking
- selective
- Prior art date
Links
- 230000000873 masking effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
- H01L29/8122—Vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH313168A CH471242A (en) | 1968-03-01 | 1968-03-01 | Method for the selective masking of surfaces to be processed |
FR1600775D FR1600775A (en) | 1968-03-01 | 1968-12-30 | |
JP44012675A JPS4939550B1 (en) | 1968-03-01 | 1969-02-21 | |
DE19691909290 DE1909290A1 (en) | 1968-03-01 | 1969-02-25 | Method for selective masking, in particular for the production of semiconductor components of small dimensions |
GB01127/69A GB1261651A (en) | 1968-03-01 | 1969-03-03 | Method of making semiconductor devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH313168A CH471242A (en) | 1968-03-01 | 1968-03-01 | Method for the selective masking of surfaces to be processed |
Publications (1)
Publication Number | Publication Date |
---|---|
CH471242A true CH471242A (en) | 1969-04-15 |
Family
ID=4249277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH313168A CH471242A (en) | 1968-03-01 | 1968-03-01 | Method for the selective masking of surfaces to be processed |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS4939550B1 (en) |
CH (1) | CH471242A (en) |
DE (1) | DE1909290A1 (en) |
FR (1) | FR1600775A (en) |
GB (1) | GB1261651A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2012003A1 (en) * | 1968-06-28 | 1970-03-13 | Ibm | |
FR2104704A1 (en) * | 1970-08-07 | 1972-04-21 | Thomson Csf |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2127751B (en) * | 1982-10-06 | 1986-04-23 | Plessey Co Plc | Producing narrow features in electrical devices |
CN116936687B (en) * | 2023-09-18 | 2023-12-15 | 金阳(泉州)新能源科技有限公司 | Combined passivation back contact battery and post-texturing method for removing undercut residual mask layer |
-
1968
- 1968-03-01 CH CH313168A patent/CH471242A/en not_active IP Right Cessation
- 1968-12-30 FR FR1600775D patent/FR1600775A/fr not_active Expired
-
1969
- 1969-02-21 JP JP44012675A patent/JPS4939550B1/ja active Pending
- 1969-02-25 DE DE19691909290 patent/DE1909290A1/en not_active Withdrawn
- 1969-03-03 GB GB01127/69A patent/GB1261651A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2012003A1 (en) * | 1968-06-28 | 1970-03-13 | Ibm | |
FR2012004A1 (en) * | 1968-06-28 | 1970-03-13 | Ibm | |
FR2104704A1 (en) * | 1970-08-07 | 1972-04-21 | Thomson Csf |
Also Published As
Publication number | Publication date |
---|---|
FR1600775A (en) | 1970-07-27 |
JPS4939550B1 (en) | 1974-10-26 |
DE1909290A1 (en) | 1969-09-25 |
GB1261651A (en) | 1972-01-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |