GB788975A - Improvements in or relating to photo-reproduction - Google Patents
Improvements in or relating to photo-reproductionInfo
- Publication number
- GB788975A GB788975A GB5075/56A GB507556A GB788975A GB 788975 A GB788975 A GB 788975A GB 5075/56 A GB5075/56 A GB 5075/56A GB 507556 A GB507556 A GB 507556A GB 788975 A GB788975 A GB 788975A
- Authority
- GB
- United Kingdom
- Prior art keywords
- acid
- benzidine
- hydroxy
- bis
- sulphonyl chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002253 acid Substances 0.000 abstract 11
- 238000009833 condensation Methods 0.000 abstract 10
- 230000005494 condensation Effects 0.000 abstract 10
- 238000006193 diazotization reaction Methods 0.000 abstract 6
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 abstract 4
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 3
- LZXITNDWMFEOCD-UHFFFAOYSA-N ethyl 6-chlorosulfonyl-2-hydroxy-4-nitronaphthalene-1-carboxylate Chemical compound C(=O)(OCC)C1=C(C=C(C2=CC(=CC=C12)S(=O)(=O)Cl)[N+](=O)[O-])O LZXITNDWMFEOCD-UHFFFAOYSA-N 0.000 abstract 3
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 abstract 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 2
- CLRSZXHOSMKUIB-UHFFFAOYSA-M benzenediazonium chloride Chemical compound [Cl-].N#[N+]C1=CC=CC=C1 CLRSZXHOSMKUIB-UHFFFAOYSA-M 0.000 abstract 2
- 125000001309 chloro group Chemical group Cl* 0.000 abstract 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 2
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 abstract 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 1
- COZWQPZDKVIVFS-UHFFFAOYSA-N 2-chloro-5-nitrobenzenesulfonyl chloride Chemical compound [O-][N+](=O)C1=CC=C(Cl)C(S(Cl)(=O)=O)=C1 COZWQPZDKVIVFS-UHFFFAOYSA-N 0.000 abstract 1
- QUEKGYQTRJVEQC-UHFFFAOYSA-N 2516-96-3 Chemical compound OC(=O)C1=CC([N+]([O-])=O)=CC=C1Cl QUEKGYQTRJVEQC-UHFFFAOYSA-N 0.000 abstract 1
- JCUYNPHEESTECG-UHFFFAOYSA-N 3-amino-6-(4-aminophenyl)benzene-1,2-disulfonic acid Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C(S(O)(=O)=O)=C1S(O)(=O)=O JCUYNPHEESTECG-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- CYCTXNIOKAYMGM-UHFFFAOYSA-N 5-acetamido-8-nitronaphthalene-2-sulfonic acid Chemical compound [N+](=O)([O-])C1=CC=C(C2=CC=C(C=C12)S(=O)(=O)O)NC(C)=O CYCTXNIOKAYMGM-UHFFFAOYSA-N 0.000 abstract 1
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 abstract 1
- ZYSOYLBBCYWEMB-UHFFFAOYSA-N 7-aminonaphthalen-1-ol Chemical compound C1=CC=C(O)C2=CC(N)=CC=C21 ZYSOYLBBCYWEMB-UHFFFAOYSA-N 0.000 abstract 1
- 239000007868 Raney catalyst Substances 0.000 abstract 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 abstract 1
- 229910000564 Raney nickel Inorganic materials 0.000 abstract 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 abstract 1
- 125000003368 amide group Chemical group 0.000 abstract 1
- 239000000987 azo dye Substances 0.000 abstract 1
- 239000004305 biphenyl Substances 0.000 abstract 1
- 235000010290 biphenyl Nutrition 0.000 abstract 1
- 239000004202 carbamide Substances 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 150000001733 carboxylic acid esters Chemical class 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- IWGHUHODFMVOFA-UHFFFAOYSA-N ethyl 2-carbonochloridoyl-3-hydroxynaphthalene-1-carboxylate Chemical compound C(=O)(OCC)C1=C(C(=CC2=CC=CC=C12)O)C(=O)Cl IWGHUHODFMVOFA-UHFFFAOYSA-N 0.000 abstract 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 abstract 1
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- FTQWRYSLUYAIRQ-UHFFFAOYSA-N n-[(octadecanoylamino)methyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCNC(=O)CCCCCCCCCCCCCCCCC FTQWRYSLUYAIRQ-UHFFFAOYSA-N 0.000 abstract 1
- 150000002791 naphthoquinones Chemical class 0.000 abstract 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 239000001632 sodium acetate Substances 0.000 abstract 1
- 235000017281 sodium acetate Nutrition 0.000 abstract 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
- 239000001117 sulphuric acid Substances 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
- 150000003672 ureas Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0223—Iminoquinonediazides; Para-quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B35/00—Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
- C09B35/02—Disazo dyes
- C09B35/039—Disazo dyes characterised by the tetrazo component
- C09B35/08—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl
- C09B35/10—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl from two coupling components of the same type
- C09B35/16—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl from two coupling components of the same type from hydroxy-amines
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK25006A DE1003576B (de) | 1955-02-25 | 1955-02-25 | Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern |
US56609356A | 1956-02-17 | 1956-02-17 | |
US725803A US2994608A (en) | 1955-02-25 | 1958-04-02 | Reproduction material |
Publications (1)
Publication Number | Publication Date |
---|---|
GB788975A true GB788975A (en) | 1958-01-08 |
Family
ID=32397430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5075/56A Expired GB788975A (en) | 1955-02-25 | 1956-02-17 | Improvements in or relating to photo-reproduction |
Country Status (4)
Country | Link |
---|---|
US (2) | US2994608A (en, 2012) |
FR (1) | FR1147132A (en, 2012) |
GB (1) | GB788975A (en, 2012) |
NL (2) | NL94867C (en, 2012) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3050387A (en) * | 1957-08-01 | 1962-08-21 | Azoplate Corp | Light-sensitive material |
CN116333711A (zh) * | 2023-05-30 | 2023-06-27 | 新疆科力新技术发展股份有限公司 | 新型降凝剂及其制备方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL130926C (en, 2012) * | 1959-09-04 | |||
NL259610A (en, 2012) * | 1959-12-30 | |||
NL272474A (en, 2012) * | 1960-12-13 | 1900-01-01 | ||
NL138044C (en, 2012) * | 1961-07-28 | |||
JPS5025332B1 (en, 2012) * | 1967-02-22 | 1975-08-22 | ||
US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
DE3222684A1 (de) * | 1981-06-19 | 1983-05-05 | Sericol Group Ltd., London | Lichtempfindliche zubereitung und deren verwendung |
US5554481A (en) * | 1993-09-20 | 1996-09-10 | Fuji Photo Film Co., Ltd. | Positive working photoresist composition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE706028C (de) * | 1937-10-10 | 1941-05-16 | Staehle Komm Ges G | Vorrichtung zum Herstellen von Schachtelteilen mit Bodenpraegung aus Platten von Polymerisierten Vinylabkoemmlingen |
BE510151A (en, 2012) * | 1949-07-23 | |||
US2754209A (en) * | 1952-06-10 | 1956-07-10 | Azoplate Corp | Light-sensitive para quinone diazides for making printing plates |
-
0
- NL NL204620D patent/NL204620A/xx unknown
- NL NL94867D patent/NL94867C/xx active
-
1956
- 1956-02-17 GB GB5075/56A patent/GB788975A/en not_active Expired
- 1956-02-25 FR FR1147132D patent/FR1147132A/fr not_active Expired
-
1958
- 1958-04-02 US US725803A patent/US2994608A/en not_active Expired - Lifetime
- 1958-04-02 US US725801A patent/US2995442A/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3050387A (en) * | 1957-08-01 | 1962-08-21 | Azoplate Corp | Light-sensitive material |
CN116333711A (zh) * | 2023-05-30 | 2023-06-27 | 新疆科力新技术发展股份有限公司 | 新型降凝剂及其制备方法 |
CN116333711B (zh) * | 2023-05-30 | 2023-08-11 | 新疆科力新技术发展股份有限公司 | 降凝剂及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
NL94867C (en, 2012) | |
US2994608A (en) | 1961-08-01 |
NL204620A (en, 2012) | |
US2995442A (en) | 1961-08-08 |
FR1147132A (fr) | 1957-11-19 |
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