GB774424A - Electrodeposition of copper - Google Patents

Electrodeposition of copper

Info

Publication number
GB774424A
GB774424A GB29285/54A GB2928554A GB774424A GB 774424 A GB774424 A GB 774424A GB 29285/54 A GB29285/54 A GB 29285/54A GB 2928554 A GB2928554 A GB 2928554A GB 774424 A GB774424 A GB 774424A
Authority
GB
United Kingdom
Prior art keywords
copper
grams
amino
pyrophosphate
radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB29285/54A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Primerica Inc
Original Assignee
Metal and Thermit Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metal and Thermit Corp filed Critical Metal and Thermit Corp
Publication of GB774424A publication Critical patent/GB774424A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

774,424. Electrodeposition of copper. METAL & THERMIT CORPORATION. Oct. 11, 1954 [Oct. 14, 1953], No. 29285/54. Class 41. An aqueous pyrophosphate copper electroplating bath is characterized by the addition thereto of 2-mercaptobenzimidazole or its substituted- or unsubstituted-alkyl or -amino derivatives. Preferably the bath contains per litre 7.5 to 45 grams of bivalent copper, pyrophosphate in an amount ranging from that necessary to convert the copper to the complex radical Cu(P 2 O 7 ) 2 <SP>6E</SP> to that which saturates the solution, 5 to 20 grams of nitrate radical, 1 to 3 grams of ammonia, and 0.0005 to 0.5 gram of 2-mercaptobenzimidazole or its substituted or unsubstituted amino derivatives, together with 15 to 30 grams of oxalate radical, either as the acid or its alkali metal or ammonium salt, and plating is effected with a cathode current density of 2 to 75 amps/sq. ft. with the bath at 70‹ to 160‹ F. and pH 7.5 to 9.5. The copper may be added as copper pyrophosphate, sulphate, or acetate; the pyrophosphate may be added as any of the sodium or potassium salts; the nitric may be added as nitric acid or sodium or potassium nitrate ; and the ammonia may be supplied as a gas or in aqueous solution. Suitable derivatives of 2-mercaptobenzimidazole are those having one or more groups such as 4- butyl, 4- or 5-amino, substituted amino radicals such as sulphanilamido p-toluene sulphanilamido and acylamido in which the acyl group has up to 10 carbon atoms, and alkylol and carboxyalkyl radicals having up to 6 carbon atoms, e.g. 6-sulphanilamido, 5-propionamido, 4-amino 7-acetamido, N: N-dihydroxymethyl, 5 - carboxymethyl. Instead of the oxalate radical, 5 to 15 grams of citrate, 5 to 20 grams of tartrate, or carbonate radicals may be used. Thick level platings, e.g. more than “ inch thick, may be produced. Specifications 509,650 and 597,407 are referred to.
GB29285/54A 1953-10-14 1954-10-11 Electrodeposition of copper Expired GB774424A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US774424XA 1953-10-14 1953-10-14

Publications (1)

Publication Number Publication Date
GB774424A true GB774424A (en) 1957-05-08

Family

ID=22138071

Family Applications (1)

Application Number Title Priority Date Filing Date
GB29285/54A Expired GB774424A (en) 1953-10-14 1954-10-11 Electrodeposition of copper

Country Status (3)

Country Link
DE (1) DE1017001B (en)
FR (1) FR1110033A (en)
GB (1) GB774424A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111254464A (en) * 2020-01-17 2020-06-09 广东嘉元科技股份有限公司 Preparation method of ultrathin electrolytic copper foil for high-tensile-strength lithium ion battery

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2489538A (en) * 1941-05-24 1949-11-29 Gen Motors Corp Electrodeposition of copper
US2495668A (en) * 1946-12-21 1950-01-24 Harshaw Chem Corp Electrodeposition of copper
US2609339A (en) * 1948-11-02 1952-09-02 United Chromium Inc Bright copper plating from cyanide baths

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111254464A (en) * 2020-01-17 2020-06-09 广东嘉元科技股份有限公司 Preparation method of ultrathin electrolytic copper foil for high-tensile-strength lithium ion battery

Also Published As

Publication number Publication date
FR1110033A (en) 1956-02-06
DE1017001B (en) 1957-10-03

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