GB739654A - Light sensitive material for the photomechanical production of printing plates - Google Patents
Light sensitive material for the photomechanical production of printing platesInfo
- Publication number
- GB739654A GB739654A GB6398/54A GB639854A GB739654A GB 739654 A GB739654 A GB 739654A GB 6398/54 A GB6398/54 A GB 6398/54A GB 639854 A GB639854 A GB 639854A GB 739654 A GB739654 A GB 739654A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazide
- hydrogen
- naphthoquinone
- sensitive material
- light sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000001257 hydrogen Substances 0.000 abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 abstract 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 238000001914 filtration Methods 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 230000001376 precipitating effect Effects 0.000 abstract 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-M sodium bicarbonate Substances [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 abstract 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 abstract 1
- 235000017557 sodium bicarbonate Nutrition 0.000 abstract 1
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE739654X | 1953-03-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB739654A true GB739654A (en) | 1955-11-02 |
Family
ID=6643093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB6398/54A Expired GB739654A (en) | 1953-03-11 | 1954-03-04 | Light sensitive material for the photomechanical production of printing plates |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE526866A (enrdf_load_stackoverflow) |
| GB (1) | GB739654A (enrdf_load_stackoverflow) |
| NL (2) | NL185407B (enrdf_load_stackoverflow) |
Cited By (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3061430A (en) * | 1959-01-14 | 1962-10-30 | Azoplate Corp | Photographic process for making printing plates and light sensitive naphthoquinone therefor |
| US3102809A (en) * | 1959-08-05 | 1963-09-03 | Azoplate Corp | Naphthoquinone-(1,2)-diozides and printing plates made therewith |
| US3130049A (en) * | 1959-04-16 | 1964-04-21 | Azoplate Corp | Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings |
| US3130047A (en) * | 1959-01-15 | 1964-04-21 | Azoplate Corp | Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layers |
| US3130048A (en) * | 1959-01-17 | 1964-04-21 | Azoplate Corp | Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layrs |
| US3148983A (en) * | 1959-08-29 | 1964-09-15 | Azoplate Corp | Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith |
| US3184310A (en) * | 1959-01-21 | 1965-05-18 | Azoplate Corp | Reproduction layers for printing plates |
| US3201239A (en) * | 1959-09-04 | 1965-08-17 | Azoplate Corp | Etchable reproduction coatings on metal supports |
| US4407926A (en) * | 1980-11-21 | 1983-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom |
| US4628020A (en) * | 1981-01-14 | 1986-12-09 | Hoechst Aktiengesellschaft | Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound |
| US4717640A (en) * | 1984-12-12 | 1988-01-05 | Hoechst Aktiengesellschaft | Light-sensitive mixture, recording material prepared therefrom and process for use thereof |
| US4764450A (en) * | 1984-06-07 | 1988-08-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent |
| US5068163A (en) * | 1988-06-18 | 1991-11-26 | Hoechst Aktiengesellschaft | Radiation-sensitive positive working composition and copying material |
| US5143815A (en) * | 1987-08-31 | 1992-09-01 | Hoechst Aktiengesellschaft | Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture |
| US5225310A (en) * | 1987-06-02 | 1993-07-06 | Hoechst Aktiengesellschaft | Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound |
| US5227281A (en) * | 1989-12-12 | 1993-07-13 | Hoechst Aktiengesellschaft | Process for producing negative copies |
| US5275908A (en) * | 1990-01-27 | 1994-01-04 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof |
| US5368975A (en) * | 1990-02-15 | 1994-11-29 | Hoechst Aktiengesellschaft | Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility |
| US5376496A (en) * | 1990-02-02 | 1994-12-27 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder |
| US5413899A (en) * | 1991-11-13 | 1995-05-09 | Hoechst Aktiengesellschaft | Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters |
| US5576137A (en) * | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
| EP2065211A1 (en) | 2007-11-30 | 2009-06-03 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376A1 (en) | 2008-03-04 | 2009-09-09 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| EP2106924A1 (en) | 2008-03-31 | 2009-10-07 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| US8419923B2 (en) | 2006-08-03 | 2013-04-16 | Agfa Graphics Nv | Lithographic printing plate support |
| EP3032334A1 (en) | 2014-12-08 | 2016-06-15 | Agfa Graphics Nv | A system for reducing ablation debris |
| WO2017157576A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
-
0
- BE BE526866D patent/BE526866A/xx unknown
- NL NL88160D patent/NL88160C/xx active
- NL NLAANVRAGE7809251,A patent/NL185407B/xx unknown
-
1954
- 1954-03-04 GB GB6398/54A patent/GB739654A/en not_active Expired
Cited By (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3061430A (en) * | 1959-01-14 | 1962-10-30 | Azoplate Corp | Photographic process for making printing plates and light sensitive naphthoquinone therefor |
| US3130047A (en) * | 1959-01-15 | 1964-04-21 | Azoplate Corp | Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layers |
| US3130048A (en) * | 1959-01-17 | 1964-04-21 | Azoplate Corp | Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layrs |
| US3184310A (en) * | 1959-01-21 | 1965-05-18 | Azoplate Corp | Reproduction layers for printing plates |
| US3188210A (en) * | 1959-01-21 | 1965-06-08 | Azoplate Corp | Naphthoquinone (1, 2)-diazide-sulfonic acid derivatives and process of producing printing plates therefrom |
| US3130049A (en) * | 1959-04-16 | 1964-04-21 | Azoplate Corp | Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings |
| US3102809A (en) * | 1959-08-05 | 1963-09-03 | Azoplate Corp | Naphthoquinone-(1,2)-diozides and printing plates made therewith |
| US3148983A (en) * | 1959-08-29 | 1964-09-15 | Azoplate Corp | Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith |
| US3201239A (en) * | 1959-09-04 | 1965-08-17 | Azoplate Corp | Etchable reproduction coatings on metal supports |
| US4407926A (en) * | 1980-11-21 | 1983-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom |
| US4628020A (en) * | 1981-01-14 | 1986-12-09 | Hoechst Aktiengesellschaft | Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound |
| US4764450A (en) * | 1984-06-07 | 1988-08-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent |
| US4717640A (en) * | 1984-12-12 | 1988-01-05 | Hoechst Aktiengesellschaft | Light-sensitive mixture, recording material prepared therefrom and process for use thereof |
| US5225310A (en) * | 1987-06-02 | 1993-07-06 | Hoechst Aktiengesellschaft | Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound |
| US5143815A (en) * | 1987-08-31 | 1992-09-01 | Hoechst Aktiengesellschaft | Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture |
| US5068163A (en) * | 1988-06-18 | 1991-11-26 | Hoechst Aktiengesellschaft | Radiation-sensitive positive working composition and copying material |
| US5227281A (en) * | 1989-12-12 | 1993-07-13 | Hoechst Aktiengesellschaft | Process for producing negative copies |
| US5275908A (en) * | 1990-01-27 | 1994-01-04 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof |
| US5376496A (en) * | 1990-02-02 | 1994-12-27 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder |
| US5368975A (en) * | 1990-02-15 | 1994-11-29 | Hoechst Aktiengesellschaft | Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility |
| US5413899A (en) * | 1991-11-13 | 1995-05-09 | Hoechst Aktiengesellschaft | Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters |
| US5576137A (en) * | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
| US8419923B2 (en) | 2006-08-03 | 2013-04-16 | Agfa Graphics Nv | Lithographic printing plate support |
| EP2065211A1 (en) | 2007-11-30 | 2009-06-03 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376A1 (en) | 2008-03-04 | 2009-09-09 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| EP2106924A1 (en) | 2008-03-31 | 2009-10-07 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP3032334A1 (en) | 2014-12-08 | 2016-06-15 | Agfa Graphics Nv | A system for reducing ablation debris |
| WO2017157576A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157579A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157571A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method and apparatus for processing a lithographic printing plate |
| WO2017157572A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Apparatus for processing a lithographic printing plate and corresponding method |
| WO2017157578A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method for processing a lithographic printing plate |
| WO2017157575A1 (en) | 2016-03-16 | 2017-09-21 | Agfa Graphics Nv | Method and apparatus for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| WO2020074258A1 (en) | 2018-10-08 | 2020-04-16 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Also Published As
| Publication number | Publication date |
|---|---|
| NL88160C (enrdf_load_stackoverflow) | |
| BE526866A (enrdf_load_stackoverflow) | |
| NL185407B (nl) |
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