GB739654A - Light sensitive material for the photomechanical production of printing plates - Google Patents

Light sensitive material for the photomechanical production of printing plates

Info

Publication number
GB739654A
GB739654A GB6398/54A GB639854A GB739654A GB 739654 A GB739654 A GB 739654A GB 6398/54 A GB6398/54 A GB 6398/54A GB 639854 A GB639854 A GB 639854A GB 739654 A GB739654 A GB 739654A
Authority
GB
United Kingdom
Prior art keywords
diazide
hydrogen
naphthoquinone
sensitive material
light sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB6398/54A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB739654A publication Critical patent/GB739654A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Abstract

Compounds of formul <FORM:0739654/IV (b)/1> or <FORM:0739654/IV (b)/2> where D is the naphthoquinone-(1 : 2)-diazide residue, X is hydrogen or a hydroxyl group, R is hydrogen, OR1, NR2R3 or a substituted or unsubstituted alkyl, aryl or heterocyclic residue, R1 is alkyl or aryl R2 is hydrogen or phenyl, R3 is phenyl are made by condensing naphthoquinone - (1,2) - diazide-(2) - 4 - sulphonic acid chloride or the corresponding 5-sulphonic acid chloride with phenol components corresponding to the above phenolic residues in dioxane solution in the presence of sodium carbonate or bicarbonate at room temperature, precipitating with dilute hydrochloric acid, filtering and washing and drying the precipitate. In example (1) 2,3,4-trihydroxy - benzophenone - naphthoquinone-(1,2) - diazide - (2) - 5 - sulphonic ester is so made. Twenty-eight similar compounds are listed. The radical R may contain chlorine. Specification 725,773 is referred to.
GB6398/54A 1953-03-11 1954-03-04 Light sensitive material for the photomechanical production of printing plates Expired GB739654A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE739654X 1953-03-11

Publications (1)

Publication Number Publication Date
GB739654A true GB739654A (en) 1955-11-02

Family

ID=6643093

Family Applications (1)

Application Number Title Priority Date Filing Date
GB6398/54A Expired GB739654A (en) 1953-03-11 1954-03-04 Light sensitive material for the photomechanical production of printing plates

Country Status (3)

Country Link
BE (1) BE526866A (en)
GB (1) GB739654A (en)
NL (2) NL88160C (en)

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3061430A (en) * 1959-01-14 1962-10-30 Azoplate Corp Photographic process for making printing plates and light sensitive naphthoquinone therefor
US3102809A (en) * 1959-08-05 1963-09-03 Azoplate Corp Naphthoquinone-(1,2)-diozides and printing plates made therewith
US3130048A (en) * 1959-01-17 1964-04-21 Azoplate Corp Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layrs
US3130049A (en) * 1959-04-16 1964-04-21 Azoplate Corp Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings
US3130047A (en) * 1959-01-15 1964-04-21 Azoplate Corp Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layers
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
US3184310A (en) * 1959-01-21 1965-05-18 Azoplate Corp Reproduction layers for printing plates
US3201239A (en) * 1959-09-04 1965-08-17 Azoplate Corp Etchable reproduction coatings on metal supports
US4407926A (en) * 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
US4628020A (en) * 1981-01-14 1986-12-09 Hoechst Aktiengesellschaft Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound
US4717640A (en) * 1984-12-12 1988-01-05 Hoechst Aktiengesellschaft Light-sensitive mixture, recording material prepared therefrom and process for use thereof
US4764450A (en) * 1984-06-07 1988-08-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent
US5068163A (en) * 1988-06-18 1991-11-26 Hoechst Aktiengesellschaft Radiation-sensitive positive working composition and copying material
US5143815A (en) * 1987-08-31 1992-09-01 Hoechst Aktiengesellschaft Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
US5225310A (en) * 1987-06-02 1993-07-06 Hoechst Aktiengesellschaft Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound
US5227281A (en) * 1989-12-12 1993-07-13 Hoechst Aktiengesellschaft Process for producing negative copies
US5275908A (en) * 1990-01-27 1994-01-04 Hoechst Aktiengesellschaft Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5368975A (en) * 1990-02-15 1994-11-29 Hoechst Aktiengesellschaft Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
US5376496A (en) * 1990-02-02 1994-12-27 Hoechst Aktiengesellschaft Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
US5413899A (en) * 1991-11-13 1995-05-09 Hoechst Aktiengesellschaft Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
US5576137A (en) * 1993-10-18 1996-11-19 Agfa-Gevaert Ag Matted, radiation-sensitive recording material and printing plate
EP2065211A1 (en) 2007-11-30 2009-06-03 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376A1 (en) 2008-03-04 2009-09-09 Agfa Graphics N.V. A method for making a lithographic printing plate support
EP2106924A1 (en) 2008-03-31 2009-10-07 Agfa Graphics N.V. A method for treating a lithographic printing plate
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP3032334A1 (en) 2014-12-08 2016-06-15 Agfa Graphics Nv A system for reducing ablation debris
WO2017157572A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Apparatus for processing a lithographic printing plate and corresponding method
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3061430A (en) * 1959-01-14 1962-10-30 Azoplate Corp Photographic process for making printing plates and light sensitive naphthoquinone therefor
US3130047A (en) * 1959-01-15 1964-04-21 Azoplate Corp Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layers
US3130048A (en) * 1959-01-17 1964-04-21 Azoplate Corp Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layrs
US3184310A (en) * 1959-01-21 1965-05-18 Azoplate Corp Reproduction layers for printing plates
US3188210A (en) * 1959-01-21 1965-06-08 Azoplate Corp Naphthoquinone (1, 2)-diazide-sulfonic acid derivatives and process of producing printing plates therefrom
US3130049A (en) * 1959-04-16 1964-04-21 Azoplate Corp Process for preparing printing plates comprising naphthoquinone diazides reproduction coatings
US3102809A (en) * 1959-08-05 1963-09-03 Azoplate Corp Naphthoquinone-(1,2)-diozides and printing plates made therewith
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
US3201239A (en) * 1959-09-04 1965-08-17 Azoplate Corp Etchable reproduction coatings on metal supports
US4407926A (en) * 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
US4628020A (en) * 1981-01-14 1986-12-09 Hoechst Aktiengesellschaft Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound
US4764450A (en) * 1984-06-07 1988-08-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent
US4717640A (en) * 1984-12-12 1988-01-05 Hoechst Aktiengesellschaft Light-sensitive mixture, recording material prepared therefrom and process for use thereof
US5225310A (en) * 1987-06-02 1993-07-06 Hoechst Aktiengesellschaft Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound
US5143815A (en) * 1987-08-31 1992-09-01 Hoechst Aktiengesellschaft Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
US5068163A (en) * 1988-06-18 1991-11-26 Hoechst Aktiengesellschaft Radiation-sensitive positive working composition and copying material
US5227281A (en) * 1989-12-12 1993-07-13 Hoechst Aktiengesellschaft Process for producing negative copies
US5275908A (en) * 1990-01-27 1994-01-04 Hoechst Aktiengesellschaft Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5376496A (en) * 1990-02-02 1994-12-27 Hoechst Aktiengesellschaft Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
US5368975A (en) * 1990-02-15 1994-11-29 Hoechst Aktiengesellschaft Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
US5413899A (en) * 1991-11-13 1995-05-09 Hoechst Aktiengesellschaft Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
US5576137A (en) * 1993-10-18 1996-11-19 Agfa-Gevaert Ag Matted, radiation-sensitive recording material and printing plate
US8419923B2 (en) 2006-08-03 2013-04-16 Agfa Graphics Nv Lithographic printing plate support
EP2065211A1 (en) 2007-11-30 2009-06-03 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP2098376A1 (en) 2008-03-04 2009-09-09 Agfa Graphics N.V. A method for making a lithographic printing plate support
EP2106924A1 (en) 2008-03-31 2009-10-07 Agfa Graphics N.V. A method for treating a lithographic printing plate
EP3032334A1 (en) 2014-12-08 2016-06-15 Agfa Graphics Nv A system for reducing ablation debris
WO2017157572A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Apparatus for processing a lithographic printing plate and corresponding method
WO2017157571A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method and apparatus for processing a lithographic printing plate
WO2017157575A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method and apparatus for processing a lithographic printing plate
WO2017157576A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
WO2017157579A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
WO2017157578A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
WO2020074258A1 (en) 2018-10-08 2020-04-16 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Also Published As

Publication number Publication date
NL185407B (en)
BE526866A (en)
NL88160C (en)

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