NL88160C - - Google Patents

Info

Publication number
NL88160C
NL88160C NL88160DA NL88160C NL 88160 C NL88160 C NL 88160C NL 88160D A NL88160D A NL 88160DA NL 88160 C NL88160 C NL 88160C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL88160C publication Critical patent/NL88160C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL88160D 1953-03-11 NL88160C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE739654X 1953-03-11

Publications (1)

Publication Number Publication Date
NL88160C true NL88160C (en)

Family

ID=6643093

Family Applications (2)

Application Number Title Priority Date Filing Date
NL88160D NL88160C (en) 1953-03-11
NLAANVRAGE7809251,A NL185407B (en) 1953-03-11 PROCEDURE FOR POLYMERIZING OR COPOLYMERIZING 1-ALKINES AND CATALYST COMPOSITION FOR APPLYING THIS PROCESS.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7809251,A NL185407B (en) 1953-03-11 PROCEDURE FOR POLYMERIZING OR COPOLYMERIZING 1-ALKINES AND CATALYST COMPOSITION FOR APPLYING THIS PROCESS.

Country Status (3)

Country Link
BE (1) BE526866A (en)
GB (1) GB739654A (en)
NL (2) NL185407B (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL129161C (en) * 1959-01-14
NL130027C (en) * 1959-01-15
NL129162C (en) * 1959-01-17
NL130248C (en) * 1959-01-21
DE1114705C2 (en) * 1959-04-16 1962-04-12 Kalle Ag Photosensitive layers for the photomechanical production of printing forms
NL130471C (en) * 1959-08-05
NL255348A (en) * 1959-08-29
NL255517A (en) * 1959-09-04
DE3043967A1 (en) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON O-NAPHTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3100856A1 (en) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON O-NAPTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPYING MATERIAL MADE THEREOF
EP0164083B1 (en) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positively acting light-sensitive coating solution
DE3445276A1 (en) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt RADIATION-SENSITIVE MIXTURE, LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF AND METHOD FOR PRODUCING A FLAT PRINTING FORM
DE3718416A1 (en) * 1987-06-02 1988-12-15 Hoechst Ag LIGHT SENSITIVE MIXTURE BASED ON 1,2-NAPHTHOCHINONDIAZIDES, RECORDING MATERIAL MADE THEREOF AND THEIR USE
DE3729034A1 (en) * 1987-08-31 1989-03-09 Hoechst Ag LIGHT SENSITIVE MIXTURE BASED ON 1,2-NAPHTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPY MATERIAL PRODUCED THEREOF
DE3820699A1 (en) * 1988-06-18 1989-12-21 Hoechst Ag RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL MANUFACTURED THEREOF
DE3940911A1 (en) * 1989-12-12 1991-06-13 Hoechst Ag PROCESS FOR PRODUCING NEGATIVE COPIES
DE4002397A1 (en) * 1990-01-27 1991-08-01 Hoechst Ag Positive photosensitive mixt. contg. hydroxy-aralkyl acrylate polymer - and sensitiser, useful in printing plate mfr. and as photoresist
DE4003025A1 (en) * 1990-02-02 1991-08-08 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREOF AND METHOD FOR THE PRODUCTION OF RELIEF RECORDS
DE4004719A1 (en) * 1990-02-15 1991-08-22 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-RECESSED RECORDING MATERIAL PRODUCED HEREOF AND METHOD FOR PRODUCING CROSS-REFERENCES
DE4137325A1 (en) * 1991-11-13 1993-05-19 Hoechst Ag LIGHT-SENSITIVE MIXTURE BASED ON O-NAPHTHOCHINONDIAZIDES AND LIGHT-SENSITIVE MATERIAL PRODUCED THEREOF
DE4335425A1 (en) * 1993-10-18 1995-04-20 Hoechst Ag Matted, radiation-sensitive recording material
DE602006009919D1 (en) 2006-08-03 2009-12-03 Agfa Graphics Nv Lithographic printing plate support
DE602007006822D1 (en) 2007-11-30 2010-07-08 Agfa Graphics Nv Process for treating a lithographic printing plate
ES2430562T3 (en) 2008-03-04 2013-11-21 Agfa Graphics N.V. Method for manufacturing a support of a lithographic printing plate
EP2106924B1 (en) 2008-03-31 2011-06-29 Agfa Graphics N.V. A method for treating a lithographic printing plate
ES2655798T3 (en) 2014-12-08 2018-02-21 Agfa Nv System to reduce ablation waste
CN108780282A (en) 2016-03-16 2018-11-09 爱克发有限公司 Process the equipment and correlation method of lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Also Published As

Publication number Publication date
NL185407B (en)
GB739654A (en) 1955-11-02
BE526866A (en)

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