GB700156A - Semiconducting crystal rectifier or amplifier and method of manufacturing it - Google Patents
Semiconducting crystal rectifier or amplifier and method of manufacturing itInfo
- Publication number
- GB700156A GB700156A GB16256/52A GB1625652A GB700156A GB 700156 A GB700156 A GB 700156A GB 16256/52 A GB16256/52 A GB 16256/52A GB 1625652 A GB1625652 A GB 1625652A GB 700156 A GB700156 A GB 700156A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- germanium
- die
- silicon
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000428 dust Substances 0.000 abstract 2
- 229910052732 germanium Inorganic materials 0.000 abstract 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 2
- 239000002245 particle Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910003460 diamond Inorganic materials 0.000 abstract 1
- 239000010432 diamond Substances 0.000 abstract 1
- 229910001651 emery Inorganic materials 0.000 abstract 1
- 239000012530 fluid Substances 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
- 230000010355 oscillation Effects 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
Abstract
700,156. Etching. STANDARD TELEPHONES & CABLES, Ltd. June 27, 1952 [July 3, 1951], No. 16256/52. Class 100 (2). [Also in Group XXXVI] The point contacts on a semi-conductor e.g. germanium or silicon, sre located at the ends of grooves which terminate at a pre-determined distance from each other so that the contacts are given the desired spacing. One groove may be a fixed point. Etching.-The germanium or silicon 1, Figs. 5a, 5b, has grooves defined by insulating material 2, and a die 9 shaped to the groove is oscillated normally to the surface 1 by a supersonic generator ; the etching fluid has hard particles, such as carborundum dust, diamond dust or emery powder, suspended in it, so that the oscillations of the die 9 cause the hard particles to impinge against the surface to be etched as well as keeping the etching solution in circulation.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE311394X | 1951-07-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB700156A true GB700156A (en) | 1953-11-25 |
Family
ID=6129531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB16256/52A Expired GB700156A (en) | 1951-07-03 | 1952-06-27 | Semiconducting crystal rectifier or amplifier and method of manufacturing it |
Country Status (3)
Country | Link |
---|---|
BE (1) | BE512585A (en) |
CH (1) | CH311394A (en) |
GB (1) | GB700156A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1027320B (en) * | 1953-12-30 | 1958-04-03 | Ibm Deutschland | Tip transistor, the semiconductor surface of which is partially worn away by a small amount of thickness |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2927220A1 (en) * | 1979-07-05 | 1981-01-15 | Wacker Chemitronic | METHOD FOR STACK ERROR INDUCING SURFACE DESTRUCTION OF SEMICONDUCTOR DISC |
-
0
- BE BE512585D patent/BE512585A/xx unknown
-
1952
- 1952-06-27 GB GB16256/52A patent/GB700156A/en not_active Expired
- 1952-06-28 CH CH311394D patent/CH311394A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1027320B (en) * | 1953-12-30 | 1958-04-03 | Ibm Deutschland | Tip transistor, the semiconductor surface of which is partially worn away by a small amount of thickness |
Also Published As
Publication number | Publication date |
---|---|
CH311394A (en) | 1955-11-30 |
BE512585A (en) |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB945746A (en) | Miniature semiconductor devices and methods of producing same | |
GB1076440A (en) | Isolation of semiconductor devices | |
ES485605A1 (en) | Method of forming openings in masks for the production of semiconductor devices. | |
JPS54110783A (en) | Semiconductor substrate and its manufacture | |
GB852003A (en) | Improvements relating to the production of wafers of semi-conductor material | |
GB988903A (en) | Semiconductor devices and methods of making same | |
GB968105A (en) | Improvements in or relating to semiconductor devices | |
GB1025984A (en) | The production of a silicon body with a pn-junction in it | |
GB1190893A (en) | A Method of Manufacturing a Semiconductor Device and a Semiconductor Device Obtained Thereby | |
GB1096484A (en) | Improvements in or relating to semiconductor circuits | |
GB700156A (en) | Semiconducting crystal rectifier or amplifier and method of manufacturing it | |
GB1487201A (en) | Method of manufacturing semi-conductor devices | |
GB1206371A (en) | The etching of silicon semiconductor wafers and semiconductor devices incorporating such wafers | |
GB1214238A (en) | A process for manufacturing a semiconductor device | |
GB1031043A (en) | Improvements in or relating to semi-conductor devices | |
IE34051B1 (en) | Method for use in subdividing semiconductor wafers | |
GB1246022A (en) | Method of manufacturing semiconductor devices | |
GB1211627A (en) | Methods of manufacture of semiconductor elements and elements manufactured therby | |
GB1226880A (en) | ||
JPS554980A (en) | Semicondutor device manufacturing method | |
GB958247A (en) | Semiconductor devices and methods of fabricating same | |
JPS5346270A (en) | Production of semiconductor device | |
US2702361A (en) | Semiconductor rectifier or amplifier of any desired surface profile | |
GB1297235A (en) | ||
JPS5745256A (en) | Manufacture of semiconductor device |