GB684265A - Improvements in or relating to photo-mechanical resists - Google Patents
Improvements in or relating to photo-mechanical resistsInfo
- Publication number
- GB684265A GB684265A GB1338250A GB1338250A GB684265A GB 684265 A GB684265 A GB 684265A GB 1338250 A GB1338250 A GB 1338250A GB 1338250 A GB1338250 A GB 1338250A GB 684265 A GB684265 A GB 684265A
- Authority
- GB
- United Kingdom
- Prior art keywords
- colloid
- colloid layer
- base
- metal surface
- hot water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Decoration By Transfer Pictures (AREA)
Abstract
684,265. Photo-mechanical resists. SHARP, F. W., and AUTOTYPE CO., Ltd. May 18, 1951 [May 26, 1950], No. 13382/50. Class 98 (ii). A transfer sheet comprising a base such as paper, triacetate or vinyl-acetate-chloride copolymers coated with a colloid layer as of gelatin or gum arabic rendered light sensitive by ferric ammonium oxalate, citrate or tartrate is exposed to produce a latent image of the pattern of the desired resist, the colloid layer is transferred to a metal surface or cylinder as of copper, zinc or aluminium, the base is removed and the image is developed as by washing out the soluble unhardened colloid with hot water. The colloid layer may include a plasticizer such as glycerol lactate. Transfer of the colloid layer to the metal surface may be aided by wetting the latter with a solution of oxidizing agent such as alkali bichromate or hydrogen peroxide and this solution may contain an anti-scumming agent such as sulphosalicylic acid, potassium cyanide, ammonium thiocyanate or oxalic acid; and when the colloid has softened sufficiently and adhered to the metal surface, the base, if of non-waterpermeable material, is stripped away without further wetting. After washing out unhardened colloid with hot water the resist is chilled, dried as by use of alcohol or warm air, and may be used to control etch or other standard treatment of the metal to lead to a printing surface. Specification 665,649 is referred to.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE503515D BE503515A (en) | 1950-05-26 | ||
GB1338250A GB684265A (en) | 1950-05-26 | 1950-05-26 | Improvements in or relating to photo-mechanical resists |
FR1037526D FR1037526A (en) | 1950-05-26 | 1951-05-25 | Process for the preparation of photomechanical covers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1338250A GB684265A (en) | 1950-05-26 | 1950-05-26 | Improvements in or relating to photo-mechanical resists |
Publications (1)
Publication Number | Publication Date |
---|---|
GB684265A true GB684265A (en) | 1952-12-17 |
Family
ID=10021936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1338250A Expired GB684265A (en) | 1950-05-26 | 1950-05-26 | Improvements in or relating to photo-mechanical resists |
Country Status (3)
Country | Link |
---|---|
BE (1) | BE503515A (en) |
FR (1) | FR1037526A (en) |
GB (1) | GB684265A (en) |
-
0
- BE BE503515D patent/BE503515A/xx unknown
-
1950
- 1950-05-26 GB GB1338250A patent/GB684265A/en not_active Expired
-
1951
- 1951-05-25 FR FR1037526D patent/FR1037526A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
BE503515A (en) | |
FR1037526A (en) | 1953-09-17 |
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