FR1037526A - Process for the preparation of photomechanical covers - Google Patents
Process for the preparation of photomechanical coversInfo
- Publication number
- FR1037526A FR1037526A FR1037526DA FR1037526A FR 1037526 A FR1037526 A FR 1037526A FR 1037526D A FR1037526D A FR 1037526DA FR 1037526 A FR1037526 A FR 1037526A
- Authority
- FR
- France
- Prior art keywords
- photomechanical
- covers
- preparation
- photomechanical covers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Decoration By Transfer Pictures (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1338250A GB684265A (en) | 1950-05-26 | 1950-05-26 | Improvements in or relating to photo-mechanical resists |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1037526A true FR1037526A (en) | 1953-09-17 |
Family
ID=10021936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1037526D Expired FR1037526A (en) | 1950-05-26 | 1951-05-25 | Process for the preparation of photomechanical covers |
Country Status (3)
Country | Link |
---|---|
BE (1) | BE503515A (en) |
FR (1) | FR1037526A (en) |
GB (1) | GB684265A (en) |
-
0
- BE BE503515D patent/BE503515A/xx unknown
-
1950
- 1950-05-26 GB GB1338250A patent/GB684265A/en not_active Expired
-
1951
- 1951-05-25 FR FR1037526D patent/FR1037526A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB684265A (en) | 1952-12-17 |
BE503515A (en) |
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