GB672163A - Improvements in or relating to methods for the production of finely divided silicon dioxide - Google Patents

Improvements in or relating to methods for the production of finely divided silicon dioxide

Info

Publication number
GB672163A
GB672163A GB17937/50A GB1793750A GB672163A GB 672163 A GB672163 A GB 672163A GB 17937/50 A GB17937/50 A GB 17937/50A GB 1793750 A GB1793750 A GB 1793750A GB 672163 A GB672163 A GB 672163A
Authority
GB
United Kingdom
Prior art keywords
silicon
hydrochloric acid
finely divided
added
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB17937/50A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Helsingborgs Gummifabriks AB
Original Assignee
Helsingborgs Gummifabriks AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helsingborgs Gummifabriks AB filed Critical Helsingborgs Gummifabriks AB
Publication of GB672163A publication Critical patent/GB672163A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

Finely divided, e.g., 5-400 mm , silicon dioxide is produced by treating silicon or a silicon alloy, e.g. silicon iron at an elevated temperature, say 650 DEG C., with dry hydrochloric acid to form chlorine-containing silicon compounds, such as silicon tetrachloride, or silicon chloroform, and free hydrogen, and hydrolyzing the silicon compounds in gaseous form to produce silica, and hydrochloric acid. The silicon compounds may be hydrolyzed by direct introduction of water vapour or by water vapor formed by combustion of the free hydrogen with added oxygen. The very pure hydrochloric acid may be reused in the treatment of silicon or alloy, or in part added to the gaseous reaction products before hydrolysis, or absorbed and recovered as concentrated acid. Chlorine may be added in the first stage to control the temperature and permit the use of higher temperatures say 1050 DEG C. Any iron chloride may be condensed from the gases before hydrolysis and the silica is recovered in a dust separator.
GB17937/50A 1949-07-20 1950-07-18 Improvements in or relating to methods for the production of finely divided silicon dioxide Expired GB672163A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE672163X 1949-07-20

Publications (1)

Publication Number Publication Date
GB672163A true GB672163A (en) 1952-05-14

Family

ID=20314664

Family Applications (1)

Application Number Title Priority Date Filing Date
GB17937/50A Expired GB672163A (en) 1949-07-20 1950-07-18 Improvements in or relating to methods for the production of finely divided silicon dioxide

Country Status (1)

Country Link
GB (1) GB672163A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE973859C (en) * 1951-10-31 1960-06-30 Dow Corning Process for the production of finely divided hydrophobic silica
US3114663A (en) * 1960-03-29 1963-12-17 Rca Corp Method of providing semiconductor wafers with protective and masking coatings
US4490343A (en) * 1982-12-24 1984-12-25 Dynamit Nobel Ag Method for the separation of chlorosilanes from a gaseous mixture containing hydrogen chloride and hydrogen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE973859C (en) * 1951-10-31 1960-06-30 Dow Corning Process for the production of finely divided hydrophobic silica
US3114663A (en) * 1960-03-29 1963-12-17 Rca Corp Method of providing semiconductor wafers with protective and masking coatings
US4490343A (en) * 1982-12-24 1984-12-25 Dynamit Nobel Ag Method for the separation of chlorosilanes from a gaseous mixture containing hydrogen chloride and hydrogen

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