GB647799A - Electroplating method employing pulsating current - Google Patents
Electroplating method employing pulsating currentInfo
- Publication number
- GB647799A GB647799A GB35113/47A GB3511347A GB647799A GB 647799 A GB647799 A GB 647799A GB 35113/47 A GB35113/47 A GB 35113/47A GB 3511347 A GB3511347 A GB 3511347A GB 647799 A GB647799 A GB 647799A
- Authority
- GB
- United Kingdom
- Prior art keywords
- transformer
- generator
- direct current
- plating
- current component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009713 electroplating Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 238000004804 winding Methods 0.000 abstract 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 abstract 1
- 229910001245 Sb alloy Inorganic materials 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 239000002140 antimony alloy Substances 0.000 abstract 1
- DLISVFCFLGSHAB-UHFFFAOYSA-N antimony arsenic Chemical compound [As].[Sb] DLISVFCFLGSHAB-UHFFFAOYSA-N 0.000 abstract 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052793 cadmium Inorganic materials 0.000 abstract 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract 1
- 229960004494 calcium gluconate Drugs 0.000 abstract 1
- 235000013927 calcium gluconate Nutrition 0.000 abstract 1
- 239000004227 calcium gluconate Substances 0.000 abstract 1
- NEEHYRZPVYRGPP-UHFFFAOYSA-L calcium;2,3,4,5,6-pentahydroxyhexanoate Chemical compound [Ca+2].OCC(O)C(O)C(O)C(O)C([O-])=O.OCC(O)C(O)C(O)C(O)C([O-])=O NEEHYRZPVYRGPP-UHFFFAOYSA-L 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- 229940050410 gluconate Drugs 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/08—AC plus DC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US441694A US2443599A (en) | 1942-05-04 | 1942-05-04 | Electroplating method employing pulsating current of adjustable wave form |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB647799A true GB647799A (en) | 1950-12-20 |
Family
ID=23753921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB35113/47A Expired GB647799A (en) | 1942-05-04 | 1947-12-31 | Electroplating method employing pulsating current |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US2443599A (enrdf_load_stackoverflow) |
| FR (1) | FR960114A (enrdf_load_stackoverflow) |
| GB (1) | GB647799A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1151604B (de) * | 1951-06-19 | 1963-07-18 | British Dielectric Res Ltd | Anodisch-elektrolytisches AEtzverfahren zum Vergroessern der Oberflaeche von Elektrodenausgangsmaterial fuer Elektrolytkondensatoren |
| DE2555834A1 (de) * | 1974-12-11 | 1976-06-16 | Physikalisch Tech Entwicklungs | Verfahren zum vergueten von metalloberflaechen durch galvanische abscheidung der verguetungsmetalle mit hohen stromdichten |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2606147A (en) * | 1944-09-27 | 1952-08-05 | Poor & Co | Electrodeposition of arsenic |
| US2515192A (en) * | 1944-09-27 | 1950-07-18 | Poor & Co | Method of electroplating |
| US2548867A (en) * | 1945-04-14 | 1951-04-17 | Poor & Co | Electroplating metals |
| US2619454A (en) * | 1945-08-30 | 1952-11-25 | Brush Dev Co | Method of manufacturing a magnetic recording medium by electrodeposition |
| US2651609A (en) * | 1950-07-17 | 1953-09-08 | Poor & Co | Method of electroplating copper |
| US2651610A (en) * | 1950-07-17 | 1953-09-08 | Poor & Co | Method of electroplating zinc |
| US2935454A (en) * | 1953-05-01 | 1960-05-03 | Tokumoto Shin-Ichi | Method of the electrodeposition of titanium metal |
| NL275905A (enrdf_load_stackoverflow) * | 1961-03-17 | |||
| NL288862A (enrdf_load_stackoverflow) * | 1962-02-13 | |||
| US3418222A (en) * | 1966-02-28 | 1968-12-24 | Murdock Inc | Aluminum anodizing method |
| DE1902983C3 (de) * | 1968-06-21 | 1978-06-22 | Keller, Eberhard, 7121 Freudental | Verfahren zum elektrolytischen Färben von anodischen Oxidschichten auf Aluminium oder Aluminiumlegierungen |
| US3716464A (en) * | 1969-12-30 | 1973-02-13 | Ibm | Method for electrodepositing of alloy film of a given composition from a given solution |
| US3959088A (en) * | 1975-03-19 | 1976-05-25 | The United States Of America As Represented By The Secretary Of The Army | Method and apparatus for generating high amperage pulses from an A-C power source |
| US4038158A (en) * | 1975-10-22 | 1977-07-26 | E. I. Du Pont De Nemours And Company | Electrochemical generation of field desorption emitters |
| US4290868A (en) * | 1980-04-07 | 1981-09-22 | Mack Michael H | Iron plumbing corrosion minimizing method |
| US4515671A (en) * | 1983-01-24 | 1985-05-07 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
| US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
| EP1019954B1 (en) * | 1998-02-04 | 2013-05-15 | Applied Materials, Inc. | Method and apparatus for low-temperature annealing of electroplated copper micro-structures in the production of a microelectronic device |
| WO2000020662A1 (en) * | 1998-10-05 | 2000-04-13 | Semitool, Inc. | Submicron metallization using electrochemical deposition |
| US7244677B2 (en) * | 1998-02-04 | 2007-07-17 | Semitool. Inc. | Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
| US6632292B1 (en) * | 1998-03-13 | 2003-10-14 | Semitool, Inc. | Selective treatment of microelectronic workpiece surfaces |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE464709C (de) * | 1928-08-23 | Tech Beratungsstelle G M B H | Verfahren zur elektrolytischen Vorbehandlung von Gegenstaenden, die einen metallischen UEberzug erhalten sollen | |
| US1388874A (en) * | 1920-02-18 | 1921-08-30 | Ralph D Mershon | Forming dielectric films |
| US1755479A (en) * | 1924-04-28 | 1930-04-22 | Jones W Bart Ett | Method of and means for cyclic current control |
| US1918605A (en) * | 1928-01-09 | 1933-07-18 | Parker Rust Proof Co | Chromium plating |
| US2063760A (en) * | 1931-09-10 | 1936-12-08 | Schulein Joseph | Bath for and process of electrodeposition of metal |
| GB414939A (en) * | 1933-11-22 | 1934-08-16 | Max Schlotter | Improved process for electro-deposition of chromium |
-
0
- FR FR960114D patent/FR960114A/fr not_active Expired
-
1942
- 1942-05-04 US US441694A patent/US2443599A/en not_active Expired - Lifetime
-
1947
- 1947-12-31 GB GB35113/47A patent/GB647799A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1151604B (de) * | 1951-06-19 | 1963-07-18 | British Dielectric Res Ltd | Anodisch-elektrolytisches AEtzverfahren zum Vergroessern der Oberflaeche von Elektrodenausgangsmaterial fuer Elektrolytkondensatoren |
| DE2555834A1 (de) * | 1974-12-11 | 1976-06-16 | Physikalisch Tech Entwicklungs | Verfahren zum vergueten von metalloberflaechen durch galvanische abscheidung der verguetungsmetalle mit hohen stromdichten |
Also Published As
| Publication number | Publication date |
|---|---|
| FR960114A (enrdf_load_stackoverflow) | 1950-04-13 |
| US2443599A (en) | 1948-06-22 |
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