FR960114A - - Google Patents

Info

Publication number
FR960114A
FR960114A FR960114DA FR960114A FR 960114 A FR960114 A FR 960114A FR 960114D A FR960114D A FR 960114DA FR 960114 A FR960114 A FR 960114A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Application granted granted Critical
Publication of FR960114A publication Critical patent/FR960114A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/08—AC plus DC
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/09—Wave forms
FR960114D 1942-05-04 Expired FR960114A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US441694A US2443599A (en) 1942-05-04 1942-05-04 Electroplating method employing pulsating current of adjustable wave form

Publications (1)

Publication Number Publication Date
FR960114A true FR960114A (fr) 1950-04-13

Family

ID=23753921

Family Applications (1)

Application Number Title Priority Date Filing Date
FR960114D Expired FR960114A (fr) 1942-05-04

Country Status (3)

Country Link
US (1) US2443599A (fr)
FR (1) FR960114A (fr)
GB (1) GB647799A (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2606147A (en) * 1944-09-27 1952-08-05 Poor & Co Electrodeposition of arsenic
US2515192A (en) * 1944-09-27 1950-07-18 Poor & Co Method of electroplating
US2548867A (en) * 1945-04-14 1951-04-17 Poor & Co Electroplating metals
US2619454A (en) * 1945-08-30 1952-11-25 Brush Dev Co Method of manufacturing a magnetic recording medium by electrodeposition
US2651609A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating copper
US2651610A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating zinc
GB715525A (en) * 1951-06-19 1954-09-15 British Dielectric Res Ltd Improvements in or relating to electrolytic capacitors
US2935454A (en) * 1953-05-01 1960-05-03 Tokumoto Shin-Ichi Method of the electrodeposition of titanium metal
NL275905A (fr) * 1961-03-17
NL288862A (fr) * 1962-02-13
US3418222A (en) * 1966-02-28 1968-12-24 Murdock Inc Aluminum anodizing method
DE1902983C3 (de) * 1968-06-21 1978-06-22 Keller, Eberhard, 7121 Freudental Verfahren zum elektrolytischen Färben von anodischen Oxidschichten auf Aluminium oder Aluminiumlegierungen
US3716464A (en) * 1969-12-30 1973-02-13 Ibm Method for electrodepositing of alloy film of a given composition from a given solution
US4092226A (en) * 1974-12-11 1978-05-30 Nikolaus Laing Process for the treatment of metal surfaces by electro-deposition of metal coatings at high current densities
US3959088A (en) * 1975-03-19 1976-05-25 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for generating high amperage pulses from an A-C power source
US4038158A (en) * 1975-10-22 1977-07-26 E. I. Du Pont De Nemours And Company Electrochemical generation of field desorption emitters
US4290868A (en) * 1980-04-07 1981-09-22 Mack Michael H Iron plumbing corrosion minimizing method
US4515671A (en) * 1983-01-24 1985-05-07 Olin Corporation Electrochemical treatment of copper for improving its bond strength
US5039381A (en) * 1989-05-25 1991-08-13 Mullarkey Edward J Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like
WO2000020662A1 (fr) * 1998-10-05 2000-04-13 Semitool, Inc. Metallisation submicronique par depot electrochimique
US7244677B2 (en) 1998-02-04 2007-07-17 Semitool. Inc. Method for filling recessed micro-structures with metallization in the production of a microelectronic device
EP1019954B1 (fr) 1998-02-04 2013-05-15 Applied Materials, Inc. Procédé et appareil de recuit a basse temperature intervenant après dépot électrolytique de microstructures de cuivre destinées à un dispositif micro-electronique
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE464709C (de) * 1928-08-23 Tech Beratungsstelle G M B H Verfahren zur elektrolytischen Vorbehandlung von Gegenstaenden, die einen metallischen UEberzug erhalten sollen
US1388874A (en) * 1920-02-18 1921-08-30 Ralph D Mershon Forming dielectric films
US1755479A (en) * 1924-04-28 1930-04-22 Jones W Bart Ett Method of and means for cyclic current control
US1918605A (en) * 1928-01-09 1933-07-18 Parker Rust Proof Co Chromium plating
US2063760A (en) * 1931-09-10 1936-12-08 Schulein Joseph Bath for and process of electrodeposition of metal
GB414939A (en) * 1933-11-22 1934-08-16 Max Schlotter Improved process for electro-deposition of chromium

Also Published As

Publication number Publication date
GB647799A (en) 1950-12-20
US2443599A (en) 1948-06-22

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