GB516137A - Improvements in and relating to the manufacture of electrode systems of unsymmetrical conductivity - Google Patents

Improvements in and relating to the manufacture of electrode systems of unsymmetrical conductivity

Info

Publication number
GB516137A
GB516137A GB18434/38A GB1843438A GB516137A GB 516137 A GB516137 A GB 516137A GB 18434/38 A GB18434/38 A GB 18434/38A GB 1843438 A GB1843438 A GB 1843438A GB 516137 A GB516137 A GB 516137A
Authority
GB
United Kingdom
Prior art keywords
layer
metal
carbon
selenium
molybdenum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB18434/38A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB516137A publication Critical patent/GB516137A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/08Preparation of the foundation plate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/08Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/10Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02656Special treatments
    • H01L21/02664Aftertreatments
    • H01L21/02667Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Photovoltaic Devices (AREA)

Abstract

516,137. Coating metals ; asymmetricallyconducting resistances ; light-sensitive cells. NAAMLOOZE VENNOOTSCHAP PHILIPS' GLOEILAMPENFABRIEKEN. June 21, 1938, No. 18434. Convention date, June 24, 1937. [Class 82 (ii)] [Also in Groups XVI, XXXVI and XL] In the manufacture of an electrode system having unsymmetrical conductivity, a continuous pulverulent layer is applied to a metal carrier by first applying to the carrier a thin layer of a metal, having a lower melting point than the carrier metal and the pulverulent material, then applying the pulverulent material, and heating the aggregate until only the metal intermediate layer is caused to melt. The semi-conductive layer of the electrode system may be formed by, or applied as a coating to, the pulverulent layer, which may comprise a metal powder or carbon. For rectifiers, high frequency detectors or photoelectric cells with selenium electrodes, an aluminium carrier may be roughened, as by hydrochloric acid, a cadmium film applied thereto, dry carbon or a carbon suspension applied to the cadmium and the whole heated to about 500‹C., the selenium layer being then applied to the carbon in a liquid state and spread to a thickness of about .01 mm. ; after annealing of the selenium, a blocking layer, such as polystyrene, is applied, to which an electrode of good conductivity, such as Woods' metal, is then applied. Substances may be added to the selenium to reduce its specific resistance. The Specification as open to inspection under Sect. 91 describes also the application of the process to the construction of (1) transmitting valves with anodes of tungsten, molybdenum &c., coated with nickel on which zirconium oxide is applied by spraying, (2) cathode ray tubes in which a fluorescent powder formed of zinc sulphide or silicate &c., is applied to a silver layer on a base of tungsten or molybdenum, (3) thermionic valves and other electrodes in which an iron anode is coated with copper to which black molybdenum or tungsten powder is applied, and (4) anodes for gas discharge tubes in which carbon is applied to a nickel layer on a core of molybdenum &c. This subject-matter does not appear in the Specification as accepted.
GB18434/38A 1937-06-25 1938-06-21 Improvements in and relating to the manufacture of electrode systems of unsymmetrical conductivity Expired GB516137A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEN40875A DE763103C (en) 1937-06-25 1937-06-25 Process for applying a coherent, powder-like layer to a metal support in a barrier electrode system and barrier electrode system (rectifier, photocell) produced according to this process

Publications (1)

Publication Number Publication Date
GB516137A true GB516137A (en) 1939-12-22

Family

ID=25760433

Family Applications (1)

Application Number Title Priority Date Filing Date
GB18434/38A Expired GB516137A (en) 1937-06-25 1938-06-21 Improvements in and relating to the manufacture of electrode systems of unsymmetrical conductivity

Country Status (4)

Country Link
CH (1) CH208834A (en)
DE (1) DE763103C (en)
GB (1) GB516137A (en)
NL (1) NL53994C (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2462917A (en) * 1945-05-12 1949-03-01 Standard Telephones Cables Ltd Method of manufacturing rectifier elements
US2462906A (en) * 1943-05-01 1949-03-01 Standard Telephones Cables Ltd Manufacture of metal contact rectifiers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE295103C (en) *
DE534137C (en) * 1929-02-27 1931-09-25 Siemens Schuckertwerke Akt Ges Process for the production of a good electrically conductive and mechanically strong connection between a metal oxide rectifier provided with a metal coating on the oxide layer and a conductor which supplies power to the metal oxide layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2462906A (en) * 1943-05-01 1949-03-01 Standard Telephones Cables Ltd Manufacture of metal contact rectifiers
US2462917A (en) * 1945-05-12 1949-03-01 Standard Telephones Cables Ltd Method of manufacturing rectifier elements

Also Published As

Publication number Publication date
NL53994C (en) 1900-01-01
CH208834A (en) 1940-02-29
DE763103C (en) 1944-12-28

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