GB360826A - Improved method of coating articles of all kinds with thin layers of metals or metalloids - Google Patents
Improved method of coating articles of all kinds with thin layers of metals or metalloidsInfo
- Publication number
- GB360826A GB360826A GB1755330A GB1755330A GB360826A GB 360826 A GB360826 A GB 360826A GB 1755330 A GB1755330 A GB 1755330A GB 1755330 A GB1755330 A GB 1755330A GB 360826 A GB360826 A GB 360826A
- Authority
- GB
- United Kingdom
- Prior art keywords
- coating
- coated
- vaporized
- tantalum
- metalloids
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 title abstract 6
- 238000000576 coating method Methods 0.000 title abstract 6
- 229910052751 metal Inorganic materials 0.000 title abstract 4
- 239000002184 metal Substances 0.000 title abstract 4
- 229910052752 metalloid Inorganic materials 0.000 title abstract 4
- 150000002738 metalloids Chemical class 0.000 title abstract 4
- 150000002739 metals Chemical class 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 4
- 239000000956 alloy Substances 0.000 abstract 3
- 229910045601 alloy Inorganic materials 0.000 abstract 3
- 229910052793 cadmium Inorganic materials 0.000 abstract 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract 3
- 239000000126 substance Substances 0.000 abstract 3
- 238000010438 heat treatment Methods 0.000 abstract 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910003468 tantalcarbide Inorganic materials 0.000 abstract 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 239000012876 carrier material Substances 0.000 abstract 1
- 229910017052 cobalt Inorganic materials 0.000 abstract 1
- 239000010941 cobalt Substances 0.000 abstract 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000010931 gold Substances 0.000 abstract 1
- RZDQHXVLPYMFLM-UHFFFAOYSA-N gold tantalum Chemical compound [Ta].[Ta].[Ta].[Au] RZDQHXVLPYMFLM-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 229910052990 silicon hydride Inorganic materials 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000009834 vaporization Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/185—Joining of semiconductor bodies for junction formation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
In coating articles in a vacuum with metals or metalloids by thermal vaporization of the coating material the metal or metalloid is deposited as a coating on an electrically conductive carrier material of high melting point which does not alloy or combine with the metal or metalloid. For example, tantalum wire may be coated electrolytically with silver which is then vaporized and deposited on the article to be coated by passing an electric current through the tantalum wire in a vacuum. For coating with cadmium, the cadmium may be applied to a cobalt carrier by drawing a cobalt wire through molten cadmium. The carrier may comprise a protective layer, which will not alloy or combine with the substance to be vaporized, applied to a substance with which the substance to be vaporized would alloy or combine, e.g. for coating with gold tantalum wire is coated with a layer of tantalum carbide and gold is then applied electrolytically. In another example tantalum wire is coated with tantalum carbide and silicon is then deposited thereon by heating in an atmosphere of silicon hydride, the silicon being then vaporized on to the article to be coated by heating the tantalum wire electrically in a vacuum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1755330A GB360826A (en) | 1930-06-06 | 1930-06-06 | Improved method of coating articles of all kinds with thin layers of metals or metalloids |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1755330A GB360826A (en) | 1930-06-06 | 1930-06-06 | Improved method of coating articles of all kinds with thin layers of metals or metalloids |
Publications (1)
Publication Number | Publication Date |
---|---|
GB360826A true GB360826A (en) | 1931-11-06 |
Family
ID=10097193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1755330A Expired GB360826A (en) | 1930-06-06 | 1930-06-06 | Improved method of coating articles of all kinds with thin layers of metals or metalloids |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB360826A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE765487C (en) * | 1940-02-02 | 1953-11-02 | Siemens & Halske A G | Device for the evaporation of substances |
US3167451A (en) * | 1959-08-26 | 1965-01-26 | Sprague Electric Co | Method of resistor production |
DE102004047938A1 (en) * | 2004-10-01 | 2006-04-13 | Leybold Optics Gmbh | Device for coating a band-shaped substrate |
-
1930
- 1930-06-06 GB GB1755330A patent/GB360826A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE765487C (en) * | 1940-02-02 | 1953-11-02 | Siemens & Halske A G | Device for the evaporation of substances |
US3167451A (en) * | 1959-08-26 | 1965-01-26 | Sprague Electric Co | Method of resistor production |
DE102004047938A1 (en) * | 2004-10-01 | 2006-04-13 | Leybold Optics Gmbh | Device for coating a band-shaped substrate |
DE102004047938B4 (en) * | 2004-10-01 | 2008-10-23 | Leybold Optics Gmbh | Apparatus for the evaporator coating of a belt-shaped substrate |
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