GB2246793A - Deposition employing fluidised bed - Google Patents

Deposition employing fluidised bed Download PDF

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Publication number
GB2246793A
GB2246793A GB9017123A GB9017123A GB2246793A GB 2246793 A GB2246793 A GB 2246793A GB 9017123 A GB9017123 A GB 9017123A GB 9017123 A GB9017123 A GB 9017123A GB 2246793 A GB2246793 A GB 2246793A
Authority
GB
United Kingdom
Prior art keywords
substrate
deposition
distributor plate
effected
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB9017123A
Other versions
GB9017123D0 (en
GB2246793B (en
Inventor
John David Mekins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TYNE TEES TRANS TECH Ltd
Original Assignee
TYNE TEES TRANS TECH Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TYNE TEES TRANS TECH Ltd filed Critical TYNE TEES TRANS TECH Ltd
Priority to GB9017123A priority Critical patent/GB2246793B/en
Publication of GB9017123D0 publication Critical patent/GB9017123D0/en
Publication of GB2246793A publication Critical patent/GB2246793A/en
Application granted granted Critical
Publication of GB2246793B publication Critical patent/GB2246793B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45589—Movable means, e.g. fans
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45593—Recirculation of reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

A heat treatment process and apparatus is provided, which is particularly applicable for pyrolytic chemical vapour deposition of a thin film onto one surface of a substrate or simultaneously onto two opposite surfaces of a substrate and / or for firing a thick film onto one surface, or simultaneously onto the opposite surfaces, of a substrate is characterised in that the substrate is transported substantially horizontally through a furnace by means of fluidised gas levitation. As illustrated in fig 1 two centrifugal fans recirculate air vertically upwards through electric heating elements and through a matrix of small holes in a ceramic distributor plate. The distributor plate also contains embedded electric heating elements along with the ceramic plate above it. <IMAGE>

Description

Patent application page 1.
DEPOSITION EMPLOYING FLUIDISED BED.
This invention relates to a heat treatment / chemical vapour deposition process for the application of thin film coatings to glass, ceramic and metallic substrates.
The deposition of thin film coatings by Chemical Vapour Deposition pyrolysis has previously been undertaken (in the case of flat glass) on the end of the float process as a final stage of production. This provides thin film coatings on one side of the glass only.
Alternatives are a) spray pyrolising both sides of the substrate immediately after firing in a vertical furnace where the substrate is held by tongs and can suffer deformation.
b) by vertically dipping the substrate in a bath of cold solution prior to firing in a vertical furnace.
c) by cold sputtering in a vacuum chamber.
The horizontal ceramic roller type furnaces are not capable of coating both sides of the glass simultaneously.
According to the present invention a fluidised bed of hot air transports the substrate horizontally in a levitated, noncontact mode across and beneath electric heating elements and through a Chemical Vapour Deposition zone capable of pyrolysing thin film coatings to one or both sides of the substrate simultaneously.
The process is equally suitable, by virtue of it's non-contact transport, for the firing of thick films on both sides of the substrate simultaneously.
Paten.t appl 1 ca tiofl page 2 n specific embodiment of the invention will now be described with reference to the accompanying drawings in which Figure 1 shows a cross section of the equipment showing two centrifugal fans recirculating air vertically upwards through electric heating elements and through a matrix of small holes in a ceramic distributor plate. The distributor plate also contains embedded electric heating elements as does the ceramic plate above it.
The upward flow of air supports the substrate in frictionless levitation above the distributor plate which can be tilted both longitudinally and transversely at small angles to give the substrate motion and guidance as illustrated in figure 2.
The position of the substrate is monitored by detecting small changes in air pressure between the substrate and distributor plate via air sampling pipes and electronic pressure sensors.
Ultrasonic atomisers produce an aerosol of chemical vapour which is forced to flow through a series of pipes by small recirculating fans. n pattern of vapour flow is formed to provide a continuous and controlled rate of chemical vapour deposition at the substrate surface as illustrated in figure 3.
n proportion of the vapour flow is bled off via a damper and filter to atmosphere as illustrated in figure 4. This maintains a slightly negative pressure in the outer exhaust ducts, thereby ensuring that the vapour does not enter the heated zones of the equipment. Alternatively, the ultrasonic atomiser may be gas assisted to change the pressure balance and to introduce inert gas shrouding of the Chemical Vapour Deposition process.

Claims (25)

    Patent application page 3.
  1. Claim 1.
    A heat treatment process and apparatus in which a substrate for treatment is transported substantially horizontally through a furnace by fluidised gas (e.g. air) levitation means.
  2. Claim 2.
    A process and apparatus according to Claim 1 in which means are provided to circulate gas vertically upwards through heating elements and through a matrix of holes in a distributor plate.
  3. Claim 3.
    A process and apparatus according to Claim 1 or 2, in which the distributor plate contains heating elements.
  4. Claim 4.
    P process and apparatus according to C3aitr 3 in which a plate containing further heating elements is provided above the distributor plate Claim
  5. 5.
    A process and apparatus according to Claim 2 to 4 in which the distributor plate and the plate when provided above it comprise a ceramic material Claim
  6. 6 A process and apparatus according to any of Claims 2 to 5 in which motion and guidance of the substrate is aided by means of tilting the distributor plate.
  7. Claim 7.
    P process and apparatus according to Cli.r- 6 : in which tilting of the distributor plate is effected longitudinally and/or transversaly Patent application page 4 Claim
  8. 8.
    P process and apparatus according to any preceding Claim in which a thick film is fired onto at least one surface of the substrate.
    qTha im
  9. 9.
    A process and apparatus according to Claim 8 in which a thick film is fired simultaneously onto two opposite surfaces of the substrate.
  10. Claim 10.
    P process and apparatus according to Claim 8 or 9 in which the thick film is provided by screen printing.
    Ql?im
  11. 11.
    A process and apparatus according to any of Claims 3 to 7 in which deposition of a thin film is effected onto at least one surface of the substrate.
  12. Claim 12 A process according to Claim 11 in which deposition of a thin film is effected simultaneously onto two opposite faces of the substrate.
  13. Claim 13.
    A process and apparatus according to Claim 11 or 12 in which deposition of the thin film(s) is effected by pyrolytic chemical vapour deposition means.
  14. Claim 14.
    A process and apparatus according to any of Claims 11 to 13 in which the thin film or films is or are deposited onto the substrate within a recirculating flow of a vaoour which optionally includes oxygen.
    Patent application page 5.
  15. Claim 15.
    P process and apparatus according to any of Claims 11 to 14 in which the deposition of the thin films is or are effected in multiple layers within a controlled temperature environment.
  16. Claim 16 P process and apparatus according to any of Claims 2 to 15 in which the position of a substrate in levitation is sensed by means detecting changes in gas pressure between the substrate and the air distributor plate.
  17. Claim 17.
    P process and apparatus according to any of claims 13 to 16 in which ultrasonic atomiser means is provided to produce an aerosol of chemical vapour which is forcs,d through a series of pipes to provide a pattern of vapcur flow whereby a controlled rate of chemical vapour deposition is effected on the substrate.
  18. Claim 18.
    P process and apparatus according to Claim 17 in which the aerosol of chemical vapour is forced by fan means through the series of pipes.
  19. Claim 19.
    P process and apparatus according to Claim 17 or 18 in which a proportion of the vapour flow is bled off via damper and filtt-r means to the atmosphere, to minimise the risk of vapour entering heated zones of the apparatus.
  20. Claim 20 A process an apparatus according to Cl aim 17 or 18 in which the ultrasonic atomiser means is gas assisted whereby pressure balance maybe adjusted.
    Patent application page 6.
  21. Claim 21.
    A process and apparatus according to Claim 20 in which the gas assistance is by means of an inert gas which serves to shroud the chemical deposition process.
  22. Claim 22.
    A process and apparatus according to any of Claims 11 to 21 when combined with any of Claims 8 to 10@ in which deposition of a thin film is effected simultaneously with firing of a thick film.
  23. Claim 23.
    A process and apparatus according to any preceding Claim in which the substrate is flat or curved.
  24. Claim 24.
    A heat treatment process and apparatus substantially as hereinbefore described with reference to the accompanying drawings.
  25. Claim 25.
    A substrate whenever treated by the process and apparatus according to any preceding Claim
GB9017123A 1990-08-04 1990-08-04 Deposition employing fluidised bed Expired - Fee Related GB2246793B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9017123A GB2246793B (en) 1990-08-04 1990-08-04 Deposition employing fluidised bed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9017123A GB2246793B (en) 1990-08-04 1990-08-04 Deposition employing fluidised bed

Publications (3)

Publication Number Publication Date
GB9017123D0 GB9017123D0 (en) 1990-09-19
GB2246793A true GB2246793A (en) 1992-02-12
GB2246793B GB2246793B (en) 1994-09-21

Family

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Family Applications (1)

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GB9017123A Expired - Fee Related GB2246793B (en) 1990-08-04 1990-08-04 Deposition employing fluidised bed

Country Status (1)

Country Link
GB (1) GB2246793B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036234C (en) * 2007-11-30 2010-04-16 Ardenne Anlagentech Gmbh DIFFUSION OVEN AND METHOD FOR PRODUCING A GAS FLOW.
DE102012209244B4 (en) * 2011-06-08 2015-04-30 Asm Technology Singapore Pte Ltd. A device for thin film deposition

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB984366A (en) * 1960-09-07 1965-02-24 Pfaudler Permutit Inc Chemical vapour plating process
GB1005056A (en) * 1963-07-10 1965-09-22 Ass Elect Ind Improvements relating to apparatus for the thermal treatment of continuous material or discrete articles
GB1013334A (en) * 1963-08-03 1965-12-15 Schmidt Gmbh Karl A method of and apparatus for continuously coating one side of a metal band in a fluidised powder bath
GB1065341A (en) * 1963-02-14 1967-04-12 Davy & United Eng Co Ltd Heat treatment of elongate metallic material
GB1065821A (en) * 1963-01-23 1967-04-19 Ass Elect Ind Processing strip material
GB1067126A (en) * 1963-07-24 1967-05-03 Bethlehem Steel Corp Forming of chromium containing coatings on strip
GB1177202A (en) * 1967-02-10 1970-01-07 Huettenwerk Oberhausen A G Improvements in or relating to the Heat Treatment of Metallic Products, particularly Rolled Products
GB1176698A (en) * 1966-11-03 1970-01-07 Huettenwerk Oberhausen Ag Improvements in or relating to Fluidised Bed Equipment for the Heat Treatment of Wire and Other Products.
GB1319801A (en) * 1969-06-13 1973-06-13 Albright & Wilson Chromizing ferrous metal substrates
GB1499452A (en) * 1975-02-22 1978-02-01 Lubuskie Zaklady Termotech Elt Method for the heat treatment of cast iron and an equipment for the application of this method
EP0195473A1 (en) * 1985-03-04 1986-09-24 N.V. Bekaert S.A. Heat treatment of steel elements in fluidized beds

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB984366A (en) * 1960-09-07 1965-02-24 Pfaudler Permutit Inc Chemical vapour plating process
GB1065821A (en) * 1963-01-23 1967-04-19 Ass Elect Ind Processing strip material
GB1065341A (en) * 1963-02-14 1967-04-12 Davy & United Eng Co Ltd Heat treatment of elongate metallic material
GB1005056A (en) * 1963-07-10 1965-09-22 Ass Elect Ind Improvements relating to apparatus for the thermal treatment of continuous material or discrete articles
GB1067126A (en) * 1963-07-24 1967-05-03 Bethlehem Steel Corp Forming of chromium containing coatings on strip
GB1163947A (en) * 1963-07-24 1969-09-10 Bethlehem Steel Corp Formation of Chromium Containing Coatings on Steel Strip
GB1013334A (en) * 1963-08-03 1965-12-15 Schmidt Gmbh Karl A method of and apparatus for continuously coating one side of a metal band in a fluidised powder bath
GB1176698A (en) * 1966-11-03 1970-01-07 Huettenwerk Oberhausen Ag Improvements in or relating to Fluidised Bed Equipment for the Heat Treatment of Wire and Other Products.
GB1177202A (en) * 1967-02-10 1970-01-07 Huettenwerk Oberhausen A G Improvements in or relating to the Heat Treatment of Metallic Products, particularly Rolled Products
GB1319801A (en) * 1969-06-13 1973-06-13 Albright & Wilson Chromizing ferrous metal substrates
GB1499452A (en) * 1975-02-22 1978-02-01 Lubuskie Zaklady Termotech Elt Method for the heat treatment of cast iron and an equipment for the application of this method
EP0195473A1 (en) * 1985-03-04 1986-09-24 N.V. Bekaert S.A. Heat treatment of steel elements in fluidized beds

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036234C (en) * 2007-11-30 2010-04-16 Ardenne Anlagentech Gmbh DIFFUSION OVEN AND METHOD FOR PRODUCING A GAS FLOW.
DE102012209244B4 (en) * 2011-06-08 2015-04-30 Asm Technology Singapore Pte Ltd. A device for thin film deposition

Also Published As

Publication number Publication date
GB9017123D0 (en) 1990-09-19
GB2246793B (en) 1994-09-21

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000804