GB2178064A - Producing a thin film by reactive evaporation - Google Patents
Producing a thin film by reactive evaporation Download PDFInfo
- Publication number
- GB2178064A GB2178064A GB08617904A GB8617904A GB2178064A GB 2178064 A GB2178064 A GB 2178064A GB 08617904 A GB08617904 A GB 08617904A GB 8617904 A GB8617904 A GB 8617904A GB 2178064 A GB2178064 A GB 2178064A
- Authority
- GB
- United Kingdom
- Prior art keywords
- thin film
- reaction gas
- metal
- specific
- partial pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Insulating Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60160216A JPS6222314A (ja) | 1985-07-22 | 1985-07-22 | 薄膜製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB8617904D0 GB8617904D0 (en) | 1986-08-28 |
GB2178064A true GB2178064A (en) | 1987-02-04 |
Family
ID=15710240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08617904A Withdrawn GB2178064A (en) | 1985-07-22 | 1986-07-22 | Producing a thin film by reactive evaporation |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS6222314A (de) |
KR (1) | KR920000590B1 (de) |
DE (1) | DE3624772A1 (de) |
GB (1) | GB2178064A (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2242442A (en) * | 1990-03-09 | 1991-10-02 | Allan Matthews | Modulated composition composites produced by vapour deposition |
GB2243162A (en) * | 1990-04-17 | 1991-10-23 | Riken Kk | A chromium nitride coating having a steadily increasing nitrogen concentration |
EP0657562A2 (de) * | 1993-11-12 | 1995-06-14 | Ppg Industries, Inc. | Dauerhafte zerstäubte Beschichtung aus Metalloxid |
GB2294950A (en) * | 1994-10-27 | 1996-05-15 | Riken Kk | Chromium nitride sliding surfaces |
US5672386A (en) * | 1994-10-27 | 1997-09-30 | Kabushiki Kaisha Riken | Process for forming a coating of chromium and nitrogen having good wear resistance properties |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63303054A (ja) * | 1987-06-04 | 1988-12-09 | Toyota Motor Corp | 多層膜の形成方法 |
DE3726731A1 (de) * | 1987-08-11 | 1989-02-23 | Hartec Ges Fuer Hartstoffe Und | Verfahren zum aufbringen von ueberzuegen auf gegenstaende mittels magnetfeldunterstuetzter kathodenzerstaeubung im vakuum |
DE3737404A1 (de) * | 1987-11-04 | 1989-05-18 | Bartl Josef Franz | Verfahren und einrichtung zur erzeugung haftfester vakuumbeschichtungen |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2123441A (en) * | 1982-06-18 | 1984-02-01 | Citizen Watch Co Ltd | Method and apparatus for coating materials by ion plating |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3791852A (en) * | 1972-06-16 | 1974-02-12 | Univ California | High rate deposition of carbides by activated reactive evaporation |
JPS5941510B2 (ja) * | 1979-07-24 | 1984-10-08 | 双葉電子工業株式会社 | 酸化ベリリウム膜とその形成方法 |
JPS60234965A (ja) * | 1984-05-04 | 1985-11-21 | Diesel Kiki Co Ltd | 薄膜製造方法 |
-
1985
- 1985-07-22 JP JP60160216A patent/JPS6222314A/ja active Granted
-
1986
- 1986-07-22 KR KR1019860005952A patent/KR920000590B1/ko not_active IP Right Cessation
- 1986-07-22 GB GB08617904A patent/GB2178064A/en not_active Withdrawn
- 1986-07-22 DE DE19863624772 patent/DE3624772A1/de active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2123441A (en) * | 1982-06-18 | 1984-02-01 | Citizen Watch Co Ltd | Method and apparatus for coating materials by ion plating |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2242442A (en) * | 1990-03-09 | 1991-10-02 | Allan Matthews | Modulated composition composites produced by vapour deposition |
GB2242442B (en) * | 1990-03-09 | 1994-02-02 | Allan Matthews | Modulated composition composites produced by vapour deposition |
GB2243162A (en) * | 1990-04-17 | 1991-10-23 | Riken Kk | A chromium nitride coating having a steadily increasing nitrogen concentration |
GB2243162B (en) * | 1990-04-17 | 1993-10-06 | Riken Kk | A wear-resistant coating |
EP0657562A2 (de) * | 1993-11-12 | 1995-06-14 | Ppg Industries, Inc. | Dauerhafte zerstäubte Beschichtung aus Metalloxid |
EP0657562A3 (de) * | 1993-11-12 | 1996-01-10 | Ppg Industries Inc | Dauerhafte zerstäubte Beschichtung aus Metalloxid. |
US6346174B1 (en) | 1993-11-12 | 2002-02-12 | Ppg Industries Ohio, Inc. | Durable sputtered metal oxide coating |
GB2294950A (en) * | 1994-10-27 | 1996-05-15 | Riken Kk | Chromium nitride sliding surfaces |
US5587227A (en) * | 1994-10-27 | 1996-12-24 | Kabushiki Kaisha Riken | Coating of chromium and nitrogen having good wear resistance properties |
US5672386A (en) * | 1994-10-27 | 1997-09-30 | Kabushiki Kaisha Riken | Process for forming a coating of chromium and nitrogen having good wear resistance properties |
GB2294950B (en) * | 1994-10-27 | 1997-10-29 | Riken Kk | Coating of chromium and nitrogen having good wear resistance properties |
Also Published As
Publication number | Publication date |
---|---|
KR920000590B1 (ko) | 1992-01-16 |
KR870001326A (ko) | 1987-03-13 |
DE3624772A1 (de) | 1987-01-22 |
JPH0467724B2 (de) | 1992-10-29 |
GB8617904D0 (en) | 1986-08-28 |
JPS6222314A (ja) | 1987-01-30 |
DE3624772C2 (de) | 1988-07-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4254159A (en) | Method of producing gold-color coatings | |
US5626963A (en) | Hard-carbon-film-coated substrate and apparatus for forming the same | |
GB2158104A (en) | Method for producing a thin film | |
US4784178A (en) | Valve unit | |
US4673475A (en) | Dual ion beam deposition of dense films | |
WO1991000377A1 (en) | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films at low temperature | |
EP0636589A1 (de) | Quellen für Siliziumoxidbeschichtung | |
IE41938B1 (en) | A method and apparatus for depositing thin layers of insulating or slightly conductive materials by reactive sputtering in a high-frequency inductive plasma | |
US4815962A (en) | Process for coating synthetic optical substrates | |
GB2178064A (en) | Producing a thin film by reactive evaporation | |
CA1124957A (en) | Metallization process | |
US4698233A (en) | Production of aluminum material having an aluminum nitride layer | |
US5888638A (en) | Sealing element, particularly for shut-off and regulating valves, and process for its production | |
US5927727A (en) | Sealing element, particularly for shut-off and regulating valves, and process for its production | |
US4735699A (en) | Methods of depositing germanium carbide | |
Martin et al. | Control of film properties during filtered arc deposition | |
JPS62188856A (ja) | ピストンリング | |
JP2000144426A (ja) | 高硬度高密着性dlc膜の成膜方法 | |
US4963394A (en) | Method for producing thin metal films by vapor-deposition | |
US4675091A (en) | Co-sputtered thermionic cathodes and fabrication thereof | |
JP2857743B2 (ja) | 薄膜形成装置および薄膜形成方法 | |
JPH03153859A (ja) | 表面改質プラスチック | |
JPH08260126A (ja) | アルミニウム基材の表面溶融硬化方法 | |
JPS62283258A (ja) | ピストンリング | |
JPH06116711A (ja) | アルミナ膜の製膜方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |