GB2115012A - Peroxide compositions for selectively stripping hard coatings and nickel brazes from metal surfaces - Google Patents
Peroxide compositions for selectively stripping hard coatings and nickel brazes from metal surfaces Download PDFInfo
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- GB2115012A GB2115012A GB08300183A GB8300183A GB2115012A GB 2115012 A GB2115012 A GB 2115012A GB 08300183 A GB08300183 A GB 08300183A GB 8300183 A GB8300183 A GB 8300183A GB 2115012 A GB2115012 A GB 2115012A
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- 239000000203 mixture Substances 0.000 title claims description 44
- 238000000576 coating method Methods 0.000 title claims description 42
- 229910052751 metal Inorganic materials 0.000 title claims description 40
- 239000002184 metal Substances 0.000 title claims description 40
- 150000002978 peroxides Chemical class 0.000 title claims description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title description 25
- 229910052759 nickel Inorganic materials 0.000 title description 8
- 239000002253 acid Substances 0.000 claims abstract description 17
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 14
- 239000004094 surface-active agent Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 44
- 239000000243 solution Substances 0.000 claims description 43
- 239000003795 chemical substances by application Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical group O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 claims description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 150000001412 amines Chemical class 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 7
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 230000002401 inhibitory effect Effects 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 3
- 229910021476 group 6 element Inorganic materials 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- 229920000768 polyamine Polymers 0.000 claims description 2
- FKZLAQOTFPPENP-UHFFFAOYSA-N n-(2,3-dihydroxypropyl)-n-(2-hydroxypropyl)nitrous amide Chemical compound CC(O)CN(N=O)CC(O)CO FKZLAQOTFPPENP-UHFFFAOYSA-N 0.000 claims 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract description 24
- 239000007800 oxidant agent Substances 0.000 abstract description 5
- 230000001590 oxidative effect Effects 0.000 abstract description 3
- 239000003929 acidic solution Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 18
- 229910000831 Steel Inorganic materials 0.000 description 12
- 239000010959 steel Substances 0.000 description 12
- 239000002585 base Substances 0.000 description 10
- 239000010936 titanium Substances 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 235000011007 phosphoric acid Nutrition 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 6
- -1 methylene phosphoric acid Chemical compound 0.000 description 6
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 5
- 238000013019 agitation Methods 0.000 description 5
- 229910001055 inconels 600 Inorganic materials 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 229910000851 Alloy steel Inorganic materials 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 3
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 150000003009 phosphonic acids Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 229910001350 4130 steel Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- 229910001347 Stellite Inorganic materials 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 229910009043 WC-Co Inorganic materials 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005474 detonation Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910000907 nickel aluminide Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229940065287 selenium compound Drugs 0.000 description 2
- 150000003343 selenium compounds Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- BITAPBDLHJQAID-KTKRTIGZSA-N 2-[2-hydroxyethyl-[(z)-octadec-9-enyl]amino]ethanol Chemical compound CCCCCCCC\C=C/CCCCCCCCN(CCO)CCO BITAPBDLHJQAID-KTKRTIGZSA-N 0.000 description 1
- XYUINKARGUCCQJ-UHFFFAOYSA-N 3-imino-n-propylpropan-1-amine Chemical compound CCCNCCC=N XYUINKARGUCCQJ-UHFFFAOYSA-N 0.000 description 1
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910018828 PO3H2 Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 235000009470 Theobroma cacao Nutrition 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000002648 azanetriyl group Chemical group *N(*)* 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 244000240602 cacao Species 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910001090 inconels X-750 Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001105 martensitic stainless steel Inorganic materials 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- QYHFIVBSNOWOCQ-UHFFFAOYSA-N selenic acid Chemical class O[Se](O)(=O)=O QYHFIVBSNOWOCQ-UHFFFAOYSA-N 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
Abstract
The acidic solutions comprise hydrogen peroxide as oxidant, either at least one phosphorous-oxy acid, or the addition of nitric acid, together with accelerators and surface active agents.
Description
SPECIFICATION
Peroxide selective stripping compositions and method
This invention relates to the stripping of nickel-base brazes and "hard surface" coatings from a variety of metal substrates, and, more particularly, to a novel stripping composition and accompanying method for the selective removal of nickel-base brazes and hard surface coatings, applied by plasma spray, detonation gun, sputtering and vapor deposition techniques, to a variety of metal surfaces, without damaging the underlying substrate.
Description of the Prior Art
Selective metal stripping is one of the most common steps in many industrial manufacturing processes. Usually, the stripping is part of either a general overhaul, involving the refurbishing of a particular coating, or the reclaiming of a defectively plated part. The overhauling process becomes economically feasible when the particular product to be stripped is particularly valuable such as in the case of high performance aircraft engine components.
Also, defective plating will usually occur in a certain percentage of plated parts, resulting from imperfections in the basis metal, improper cleaning, excessive porosity of the substrate which leads to bleeding out of various cleaning and plating solutions, impurities, and human error. The particular method of stripping will usually depend upon the metal (or metals) to be stripped, the substrate material of the basic part, waste disposal requirements, and profitability.
The prior art has employed a variety of both chemical and mechanical methods in an effort to selectively remove protective coatings from the underlying metal substrate, such as the coatings and brazes that are frequently used in the aircraft industry, and particularly in high performance jet engines.
Such methods, however, have proven unsatisfactory for a variety of reasons. Low metal stripping rates, general ineffectiveness at low operating temperatures, the handling and disposal of toxic cyanide containing solutions, and the environmental disposal of the spent fluids are problems arising from known chemical methods. Damage to precision machined parts such as jet engine stator assemblies, particularly the large dimensional changes which can result on the metal substrate, as well as pit formation in the base metal caused by pinholes in the hard coating are frequent results of using pressure blasting abrasive tool methods, and electrolytic stripping.
Hydrogen peroxide, H202, has been used as an oxidizing agent, in both acid and alkaline solutions, for the selective stripping and etching of metals; however, H202 has not been effectively adapted for stripping nickel-base metals and "hard surface" coatings, i.e., surfaces which are comprised of intermetallic or cermet compositions, and are applied to the surface to be protected by several high temperature flame deposition techniques, from metal substrates.
Nitric acid, HNO3, is a well known stripping agent; however, since it is extremely corrosive it has found infrequent use when selectively stripping, since gentle treatment of the underlying substrate is necessary.
Phosphorous-oxy adds, used herein to signify phosphorous and oxygen containing substances which have a tendency to release a proton in aqueous solution, have found iimited usage in the prior art; see, for example, U.S. Patents 3,607,398 and 4,128,463; however, they have not been used in combination with peroxide agents nor for selective stripping required during the removal of nickel brazes and hard surface coatings. Selenium compounds and halogen containing accelerators have been used for the stripping of nickel from stainless steel HNO3 solutions; however, such solutions also oxidize and corrode the steel substrate.
Accordingly, it is an object of this invention to formulate an effective composition and accompanying method for the selective stripping of nickel-base brazes and protective hard surface coatings from metal substrates.
It is another object of this invention to formulate a stripping solution which has a much more rapid coating removal rate at lower operating temperatures than those of the prior art.
It is still another object of this invention to formulate a stripping solution for surface coatings which is noncorrosive to the metal substrate.
It is another object of this invention to strip flame sprayed cemented metal carbides, nickel aluminides, nickel graphite and molybdenum from metal substrates used in aircraft engines.
These and other objects of the invention have been accomplished through the discovery of an aqueous composition useful for the selective stripping of protective hard surface coatings and nickelbase brazes from metals, and particularly high strength alloy substrates, comprising about 75-250 grams/liter (g/l) of a peroxide agent, i.e., usually hydrogen peroxide, about either 50-200 g/l of nitric acid, or in the alternative, about 0--200 g/l of a mixture containing at least one phosphorous-oxy acid, with at least one such acid selected from the group consisting of phosphoric acid, Nitrilotris (methylene phosphonic acid) (NTPA); and hydroxyethane-1, 1-diphosphonic acid (HEDPA).Both the nitric and phosphorous-oxy acid peroxide solutions preferably include about O 210 g/l of an accelerating agent selected from the group consisting of chlorine and bromine containing ions and oxyanions, oxy compounds of Group VI elements such as selenium, and various mixtures thereof; about 0--5 g/l of an inhibiting agent selected from the group consisting of amines, polyamines, amine oxides and mixtures thereof, and about 0--5 g/l of a surfactant, such as fluorocarbon; the acidity of the stripping solution having a pH value ranging from about to about +0.5.The invention further includes a method for the selective stripping of hard surface coatings and nickel-base brazes from metal substrates, comprising contacting the surface deposit with an aqueous solution of the composition disclosed above, and immersing the surface deposit in the solution until the deposit is substantially removed from the metal substrate without damaging the substrate, keeping the solution temperature during operation between 20-550C, and preferably, about 35-400C.
A troublesome problem for the metal stripping art has been to formulate a composition which can selectively strip even the most difficult to remove coatings from metal substrates without damaging the underlying surface to be stripped. The need for such a stripping composition is particularly acute in the aircraft industry, where it is frequently necessary to disassemble and overhaul high performance aircraft engines which contain many expensive, reusable parts, particularly the gas turbine jet engines used, for example, in jet aircraft. The continual development of different protective coatings enabling higher temperature operation has necessitated new approaches to selective stripping.During such an overhaul, there exists a need for a composition which can chemically refurbish these worn or damaged parts, and the removal of brazes and hard surface coatings is an essential step in this process. The stripping agents used for such an overhaul must be very selective, i.e., they must attack only the braze or hard surface coating, while not attacking the underlying expensive metal substrate. Although applicants do not wish to be bound by theory, many of the coatings and brazes currently in use contain quantities of nickel and/or cobalt, and it is believed the dissolution of these metals promotes the loss of structural integrity of the coating or braze. The stripping must also take place at a practical, commercially viable rate, as opposed to just being a laboratory curiosity.The problem is particularly acute when one realizes that based on their chemical composition alone, these coatings may normally be considered more resistant to a chemical attack than the metal substrates they protect, and, in fact, their purpcse is to impart high temperature corrosion protection and wear resistance to these metal substrates.
Surprisingly, it has been found that peroxide solutions in combination with either nitric acid, or, in the alternative, a class of mildly aggressive phosphorous-oxy acids, will remove such nickel-base brazes and hard surface coatings, and yet be inhibited from attacking the expensive machined metal substrates. When nitric acid is the acid system of choice, which occurs when high stripping rates are desired, HNO3 in amounts ranging from about 50-200 grams/liter (g/l), and most preferably, about 75-150 g/l, in combination with a peroxide agent, most preferably H202, in amounts of about 75-250 g/l, and preferably incorporating an effective amount of accelerators, inhibitors, and surfactants, gives excellent results.Brazes which can be stripped from metal substrates by such an HNO3--H202 based system include AMS 4779 (94% Ni, 3.5% Si, 1.8% B) from high alloy steel, AMS 4778 (Ni 92, Si 4.5, B 2.9 C 0.06) from AMS 1422, AMS 1424 and AMS 1455 nickel-base alloys,
AMS 4777 (Ni 82, Si 4.5 Cr 7.0, B 3.1, Fe 3.0) from 410 Martensitic Stainless Steel (AMS 5504), and
Nicrobraze LM (Ni 82.5, Cr 7.0, Si 4.5, B 3.0, Fe 3.0) from Stellite 31 (Co 57, Cr 26, Ni 1 G, W 7, Carbon 0.5). Hard surface coatings which have been stripped include Metco's 71NS and 71VF alloys (Co 12, C 4, Fe 1, W bal) from 347 and 410 stainless steels, Metco 307 (Ni 75, C 25) from Inconel 600 alloy, and
Metco 450 (Al 4.5, Ni Bal) from 4130 steel, Hastelloy X and Inconel 600 substrates.
Surprisingly, it has also been found that peroxide solutions in combination with certain weakly agressive phosphorous-oxy acids will attack nickel-base brazes and hard surface coatings, and yet be inhibited from attaching the metal substrate. Phosphorous-oxy acids which have been particularly effective are phosphoric acid, nitrilo tris (methylene phosphoric acid) (NTPA), and hydroxyethane-1,1diphosphonic acid (HEDPA), although most phosphonic acids, as well as many mixtures thereof, are believed to be particularly adaptable to the stripping ccmposition of the invention. The precise amount of the phosphorous-oxy acid depends upon the character of the substrate to be stripped, as well as the coating composition.For example, phosphonic acids NTPA or HEDPA, when mixed with phosphonic acid can range from about 0--200 g/l when stripping from a stainless steel type substrate, and preferably about 100 g/l, while the same acids, when stripping from either titanium base or steel based substrate should be present from about 0--100 g/l and preferably, in about 75 g/l. In the same solution phosphonic and phosphoric acids can range from about 0--200 g/l, and preferably, about 100 g/l.
The greatly preferred peroxide agent of choice is hydrogen peroxide, H202, both from the perspective of performance, cost, availability, and environmental effect. But, other peroxide agents, e.g., perborates, peroxydiphosphates, peroxysulfates and the like, can also be used in place thereof.
In order to maximize stripping effectiveness on steel surfaces, the peroxide and acid concentrations should be balanced. The preferred formulation approach is to combine a major amount of a weakly aggressive phosphorus-oxy acid towards steel and/or titanium with a lesser amount of a more aggressive acid. The order of decreasing acid aggressiveness towards attacking carbon steel in peroxide solution of some commonly available acids of particular interest is as follows:
N(CH2PO3H2)2(CH2CH20H) H3PO4 CH3C(OH)(PO3H2)2 IT N(CH2PO3H2)3
If the peroxide oxidant concentration becomes exhausted, white or tan salt encrustations begin to form on the attached steel surface, indicating that the steel or titanium has corroded. Hard surface coatings which have been successfully stripped from metal substrates using phosphorous-oxy acidperoxide-based systems without damaging the substrate can be seen from the following Table: TABLE I
HARD SURFACE COATINGS
METCO UNION CARBIDE Supplier's 71 NS Trade Name 63 71 VF 307 450 LM-6A LW-11B LW-IN30 LW-IN40 WT-1 63 NS 71 VF-NS WT-2 Coating Mo Co 12 NI 75 Al 4.5 Mo Wc 88 Wc 87 Wc85 WC Composition C 4 C 25 Ni bal Co 12 Co 13 Co 15 Ti C # 83 Fe 1 W bal Ni 17 Application Plasma Flame Spray Detonation Gun Method # # Metal Stainiess 347 S.Steel inconel 4130 Steel Stainless Titanlum 329 S.Steel Titanium Steel; Substrate(s) Steel 600 Steel 64 alloy 64 alloy Stellite 6 410 S.Steel Hast-X on steel Inconel 600 Amounts ranging from 0--5 g/l of inhibiting agents can significantly aid in preventing chemical attack on the metal substrate particularly in the case of steel and titanium substrates.In particular, those inhibitors selected from the group of alkyl bis (2-hydroxy ethyl)-amines: R-N(CH2CH20H)2, diamines
amine oxides:
where R, represents an alkyl group, and mixtures of each, including different R's for each constituent such as the mixture of aliphatic amines sold under the trade name "Armohib 31", have been found to be effective. However, alky-polyethoxylated amines are ineffective, while mono, di and tri (2-hydroxyethyl) amines have been only marginally effective toward low carbon steels, thus leading to the conclusion that an alkyl group, as well as the 2-hydroxyethyl moiety, is required. It is suspected that the pendant NH2 groups may provide greater inhibiting qualities than the isoelectronic OH unit.A nonexclusive list of inhibitors includes bis (2-hydroxyethyl) oleyl amine, bis (2-hydroxyethyl) octadecyl amine, bis (2hydroxyethyl) cocoa amine, bis (2-hydroxyethyl) tallow amine oxide, N,N',N'-tris (2-hydroxyethyl)-N tallow-1 ,3-diaminepropane, and imino-bis-propylamine. Although applicants do not wish to be bound by theory, it is believed that a stereochemical characteristic exhibited by these structurally similar compounds is involved in preventing oxidant attack on the substrate. The preferred inhibitor, which is commercially available, sold under the name "Armohib 31" by Armak Chemicals of Chicago, Illinois, is an aliphatic amine blend having a proprietary composition.
The addition of Group VI elements, particularly selenium and tellurium containing compounds, and most preferably those selenium compounds such as selenium dioxide, selenous or selenic acids, their metal salts, and mixtures, act to accelerate the removal of the coated deposit. The amounts added should range from about 0--40 g/l, preferably towards the lower end of the range.Halogen containing compounds, particularly such chlorine and bromine ions and oxyanions, such as CI-. OCI-, Cm03, Boo3~, i-, 12, 10-3,10-4 and iO65-, as well as their reaction products with peroxide should be effective accelerating agents, particularly when used in conjunction with selenium based accelerating agents.
The preferred agents are selenium dioxide and certain chlorine containing species. Fluorine based ions, however, are not usually as effective as chlorine.
It is further preferred, although not essential, to add small amounts of a surfactant, such as 0--150 mg/l of "DB-3 1", a silicone based anti-foaming agent sold by Dow Corning Inc., when "Zonyl
FSN", a fluorocarbon surfactant marketed by DuPont, or, instead, an amine based compound of the type that are well known in the art is included. These surfactants are desirable because they are resistant to oxidation by the stripping solution, thereby prolonging their life in the bath.
One significant advantage of the stripping composition is that effective stripping can be undertaken at significantly lower operating temperatures than currently required by conventional stripping agents. Stripping can be carried out between 20-550C, and preferably, about 35--400C, whereas the prior art alkaline solutions operated at a bath temperature of about 600C. The acidity of the stripping bath is an important parameter for effective stripping; the pH of the acidic stripping solution must remain below about + 1, and preferably, below 0, for most effective operation. Thus, most carboxylic acids cannot be used as the acid system since they are not sufficiently acidic, as only strong or moderately strong acids may be employed.
The invention will now be illustrated by the following Examples.
EXAMPLE 1
The following composition: g/l
Nitrilo tris (methylene phosphonic acid) (NTPA) 82
Phosphoric Acid 62
Hydrogen Peroxide 120
Armohib 31 (Inhibitor) 2.1 DB-31 (non ionic silicone defoamer) 75 mg/l
Water balance was warmed to between 22-57 C (aver. 350C) in order to strip a titanium coupon (AMS 4911) of 7 cm x 4 cm dimension, having a plasma spray coating of .3 mm Metco VF-NS, (87 WC, 12 CO, 1 Fe) on one side. The coupon was immersed in the bath for 5 hours, at which time the coating had been stripped from the titanium surface. The coupon was subjected to a load of 300 Ib/in2 in order to determine whether embrittlement had taken place. No crack formation was observed.
EXAMPLE II Three titanium shafts coated with a 7-7 1/2 mil coating of LW-1 18 (WC 88, Co 12) were immersed in the solution of Example I, kept at a bath temperature of 38-43 C., without any solution agitation, and after three hours the coating had been completely removed without damage to the
underlying substrate.
EXAMPLE III
The following solution:
g/1
Nitrilo tris (methylene phosphonic acid)
(NTPA) 82
Phosphoric Acid 3G Hydrogen Peroxide 120
Selenium Dioxide 1
Armohib 31 1
Water balance was mixed, and a 2 mil coating of LW-1 1B (WC 88, Co 12) on a titanium tube was immersed into the solution. The bath was maintained at 25-350C, while the tube was frequently agitated during the
stripping process. After 1-1 1/2 hours the coating had been stripped, whereupon the machined areas
of the part were observed to have retained their original surface finish throughout the entire process.
EXAMPLES IV-V
The following solution: 9/1 NTPA 82 Hydrnxyethane 1, 1 -diphosphonic acid
(HEDPA) 62
Hydrogen Peroxide 120
Armohib 31 (Inhibitor) 2.3 DB-31 75 mg/l
Water balance was used to strip WC-Co coatings from both a high alloy steel and a Ti-64 substrate. Both metal coupons were separately immersed in the stripper bath for about five hours, after which time both specimens were removed from the solution. The WC-Co coating had been substantially stripped without damage to either of the underlying substrates.
EXAMPLE VI
The following solution: g/l Nitric Acid 150
Hydrogen Peroxide 150
Selenium Dioxide 0.6
Zonyl FSN 0.29
Water balance was mixed, after which a second stage nozzle guide vane, fabricated from Mar-M-200 (1 Cb, 9Cr, 1 OCo, 2 Ti, 5A1, .1 4C. 12.5W, 2Hf, bal Ni) + HF (PWA 1422 Directionally Solidified), and having two covers brazed with AMS 4778 (Ni 92, Si 4.5, B 2.9, C .06), was immersed for five hours in the solution, which was kept at an average temperature of 400C. Upon removal from solution, the braze had been completely stripped so the covers could be removed from the vane by gentle prying. No substrate metal attack occurred, but the pack aluminide coating had been partially removed.
EXAMPLE VII
The solution of Example VI was again mixed and used to strip a jet engine part comprising a honeycomb lattice brazed to a high alloy steel with AMS 4779A in a bath kept at an average temperature of 43 OC. After 1 1/2 hours the honeycomb structure separated cleanly from the steel backing.
EXAMPLE VIII
The following solution:
Volume %
Nitric Acid (70 wt%) 20
Hydrogen Peroxide (50 wt%) 20
Water balance was mixed, and an Inconel 600 coupon coated with 25 mils of Metco 307 nickel-graphite was immersed in solution and stripped within 3/4 hour at an average bath temperature of 430C.
EXAMPLE IX
The solution of Example VIII was mixed and an Inconel 600 coupon coated with a 25 mij layer of
Metco 450 nickel aluminide was next immersed into the solution, which was kept between 45-500C.
Complete coating removal required 80 minutes.
EXAMPLE X
The solution of Example VIII was mixed, and a 347 stainless steel shaft coated with a protective covering of 5 1/2 mils of Metco 71 VF (Co 12, Fe 1, WC bal.) was then immersed and stripped in the solution maintained at a temperature between 40--500C. After a quarter hour the coating had been completely removed.
EXAMPLE Xl
The following solution: s/l Nitric Acid 75
Hydrogen Peroxide 150
Selenium Dioxide 1
Zonyl FSN 0.5
Water balance was warmed to between 30-380C, whereupon an Inconel X-750 stator segment which had been stripped of its nickel electroplate was immersed in the solution, which was given intermittent agitation during stripping. After 22 hours the AMS 4777 braze has been stripped (1.22 grams), whereupon the outer shroud and foot could be separated from the vane.
EXAMPLE XII
The following solution:
Nitric acid 150 g/l
Hydrogen Peroxide 120 gIl Selenium Dioxide 5g/l Zinc Chloride (50 wt%) 8 ml/l
Water balance was warmed to 470C (over), whereupon a 410 stainless steel "T" section brazed with PWA 996 was immersed for three hours, the solution being subjected to mild mechanical agitation during this time.
Upon removal, the braze was sufficiently dissolved to permit separation of the joined parts. The cut edges of the 410 steel remained shiny and unetched.
EXAMPLE XIII
The following solution:
Nitric acid (50 wt%) 20 vol%
Hydrogen Peroxide (50 wt%) 25 vol9/o Aluminum Chloride (AlCl3-6H20) 23 g/l
Zonyl FSN 0.1 vol%
Water balance was warmed to 430C, whereupon a cobalt base stator assembly fabricated with Nicrobraze LM (Ni 82,
Cr 7, Si 4.5, B 3.0, Fe 3.0) was immersed therein. After 19 hours the braze had been completely selectively stripped allowing separation of the two segments.
Several significant improvements have been realized by these novel compositions. The formulations can strip coatings and brazes from a plurality of metal substrates at stripping rates measured in hours, as compared with days for prior art alkaline solutions. Also, the lower operating temperatures of the solutions of the invention permit the usage of low melting point wax maskings. The peroxide reaction products decompose after use to harmless reaction products, H20 and 02, as contrasted with many oxidants in current use which often cannot be easily disposed of, and may pose environmental hazards.
In accordance with the invention, a novel method for stripping hard surface coatings and nickel
base brazes from metal, particularly high strength alloys, has been devised which comprises contacting
the surface coating at a temperature of about 30-450C, and preferably about 350C, with an aqueous
solution of the composition described earlier, in an amount sufficient to maintain the acidity, i.e., the pH
of the contacting solution at a value between about to 0.5, and continuing the contacting of the
surface coating with the solution until the surface coating has been selectively removed from the metal
substrate.
During operation, it is preferred that the solution be regularly agitated in order to produce the most
efficient stripping conditions. Either workpiece agitation or strong mechanical solution agitation is
satisfactory. Spray applications may also be used.
It willbe apparent to those skilled in the art that many variations and modifications can be made
to the specific embodiments discussed above. All such departures from the foregoing specification are
considered to be within the scope of the invention as defined by this specification and the appended
Claims (14)
1. A compositidn for the selective stripping of hard surface coatings from metal substrates comprising:
about 75-250 g/l of a peroxide agent;
about 50-200 g/l of HNO3;
the remainder being water.
2. A composition for the selective stripping of hard surface coatings from metal substrates comprising:
about 75-250 g/l of a peroxide agent;
up to about 200 g/l of a mixture containing at least one phosphorous-oxy acid;
the remainder being water.
3. The composition as claimed in claim 2 wherein the phosphorous-oxy acid is selected from a group consisting of phosphoric acid, NTPA; HEDPA, and mixtures thereof.
4. The composition of any one of claims 1 to 3 which further includes up to about 40 gIl of an accelerating agent selected from the group consisting of chlorine and bromine containing ions and oxyanions, oxy compounds of Group VI elements, and mixtures thereof.
5. The composition of claim 4 wherein the accelerating agent is selenium dioxide.
6. The composition of any one of claims 1 to 5 which further includes up to about 5 g/l of an inhibiting agent selected from the group consisting of amines, polyamines, amine oxides, and mixtures thereof.
7. The composition of claim 6 wherein the inhibiting agent is Armohib 31.
8. A composition as claimed in any one of claims 1 to 7 which further includes a fluorocarbon surfactant.
9. The composition of any one of claims 1 to 8 wherein the peroxide agent is H202.
10. A composition as claimed in claim 1, substantially as hereinbefore described with particular reference to the Examples.
11. A composition as claimed in claim 1, substantially as illustrated in any one of the Examples.
1 2. A composition as claimed in claim 2, substantially as hereinbefore described with particular reference to the Examples.
1 3. A composition as claimed in claim 2, substantially as illustrated in any one of the Examples.
14. A method for the selective stripping of hard surface coatings and nickel-base brazes from metal substrates, comprising:
contacting the surface deposit with an aqueous solution of a composition as claimed in any one of claims 1 to 13; immsrsing the surface deposit in the solution, which is kept at a temperature during operation of about 20-550C, until the deposit is substantially removed from the substrate; and
removing the substrate from the aqueous solution.
1 5. A method as claimed in claim 14, substantially as hereinbefore described with particular reference to the Examples.
1 6. A method as claimed in claim 14, substantially as illustrated in any one of the Examples.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33880582A | 1982-01-11 | 1982-01-11 |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8300183D0 GB8300183D0 (en) | 1983-02-09 |
GB2115012A true GB2115012A (en) | 1983-09-01 |
GB2115012B GB2115012B (en) | 1986-02-26 |
Family
ID=23326242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08300183A Expired GB2115012B (en) | 1982-01-11 | 1983-01-05 | Peroxide compositions for selectively stripping hard coatings and nickel brazes from metal surfaces |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS58123878A (en) |
AU (1) | AU543333B2 (en) |
BE (1) | BE895242A (en) |
CA (1) | CA1209886A (en) |
CH (1) | CH655512B (en) |
DE (1) | DE3248041C2 (en) |
ES (1) | ES518365A0 (en) |
FR (2) | FR2519645B1 (en) |
GB (1) | GB2115012B (en) |
IT (1) | IT1164859B (en) |
SE (2) | SE8207489L (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275043A1 (en) * | 1987-01-12 | 1988-07-20 | Nihon Parkerizing Co., Ltd. | Acid cleaner for aluminium |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4556449A (en) * | 1984-10-15 | 1985-12-03 | Psi Star | Nickel etching process and solution |
FR2621052A1 (en) * | 1987-09-25 | 1989-03-31 | Solvay | BATHS AND METHOD FOR CHEMICAL POLISHING OF COPPER SURFACES OR COPPER ALLOYS |
JP4326144B2 (en) * | 1997-11-10 | 2009-09-02 | エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ | Method for separating a layer from an object |
DE10151180B4 (en) * | 2001-10-17 | 2010-05-12 | Nowack, Norbert, Prof. Dr.-Ing. | Process and solution for delamination of metallic objects with nickel corrosion protection coating |
JP6458913B1 (en) * | 2018-03-26 | 2019-01-30 | 三菱瓦斯化学株式会社 | Etching solution |
US10985059B2 (en) | 2018-11-01 | 2021-04-20 | Northrop Grumman Systems Corporation | Preclean and dielectric deposition methodology for superconductor interconnect fabrication |
JP6485587B1 (en) * | 2018-12-25 | 2019-03-20 | 三菱瓦斯化学株式会社 | Etching solution |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB837703A (en) * | 1955-08-04 | 1960-06-15 | Minnesota Mining & Mfg | Improvements in or relating to methods for reducing the surface tension of liquids |
US3399143A (en) * | 1967-08-02 | 1968-08-27 | Macdermid Inc | Method of stripping nickel from articles and the composition used therein |
US3607398A (en) * | 1969-06-18 | 1971-09-21 | Avco Corp | Chemical stripping process |
US3756957A (en) * | 1971-03-15 | 1973-09-04 | Furukawa Electric Co Ltd | Solutions for chemical dissolution treatment of metallic materials |
US4059678A (en) * | 1973-02-02 | 1977-11-22 | Fmc Corporation | Stabilization of iron-containing acidic hydrogen peroxide solutions |
ES427394A1 (en) * | 1973-06-18 | 1977-02-01 | Oxy Metal Industries Corp | Process for stripping nickel from articles and composition utilized therein |
US3953263A (en) * | 1973-11-26 | 1976-04-27 | Hitachi, Ltd. | Process for preventing the formation of nitrogen monoxide in treatment of metals with nitric acid or mixed acid |
SE425007B (en) * | 1976-01-05 | 1982-08-23 | Shipley Co | STABLE EOS DISPOSAL CONTAINING SULFURIC ACID AND WHEAT PEROXIDE AND USE OF ITS SAME |
US4158593A (en) * | 1977-11-08 | 1979-06-19 | Dart Industries Inc. | Dissolution of metals utilizing a H2 O2 -sulfuric acid solution catalyzed with selenium compounds |
JPS5518502A (en) * | 1978-07-12 | 1980-02-08 | Sumitomo Metal Mining Co Ltd | Plating exfoliation solution |
US4302246A (en) * | 1980-01-03 | 1981-11-24 | Enthone, Incorporated | Solution and method for selectively stripping alloys containing nickel with gold, phosphorous or chromium from stainless steel and related nickel base alloys |
JPS6056433B2 (en) * | 1980-09-18 | 1985-12-10 | 株式会社村田製作所 | How to remove zinc oxide sputtering film |
JPS5798676A (en) * | 1980-11-18 | 1982-06-18 | Nippon Peroxide Co Ltd | Etching agent for electroless nickel thin film |
JPS57134563A (en) * | 1981-02-12 | 1982-08-19 | Nippon Peroxide Co Ltd | Etching agent for electroless plated thin nickel film |
JPS57155379A (en) * | 1981-03-20 | 1982-09-25 | Nippon Peroxide Co Ltd | Etching agent for non-electrolytic nickel thin film |
JPS57164984A (en) * | 1981-04-06 | 1982-10-09 | Metsuku Kk | Exfoliating solution for tin or tin alloy |
SE426178B (en) * | 1981-05-21 | 1982-12-13 | Ericsson Telefon Ab L M | SET FOR CHEMICAL Peel-off layers containing PALLADIUM AND ATMINSTONE ONE OF THE METALS COPPER AND NICKEL |
SU990872A1 (en) * | 1981-09-23 | 1983-01-23 | Предприятие П/Я М-5537 | Solution for dimensional etching |
US4378270A (en) * | 1981-10-29 | 1983-03-29 | Learonal, Inc. | Method of etching circuit boards and recovering copper from the spent etch solutions |
-
1982
- 1982-11-10 CA CA000415330A patent/CA1209886A/en not_active Expired
- 1982-11-15 AU AU90470/82A patent/AU543333B2/en not_active Ceased
- 1982-12-03 BE BE0/209646A patent/BE895242A/en not_active IP Right Cessation
- 1982-12-20 CH CH741782A patent/CH655512B/de unknown
- 1982-12-20 ES ES518365A patent/ES518365A0/en active Granted
- 1982-12-24 DE DE3248041A patent/DE3248041C2/en not_active Expired
- 1982-12-29 SE SE8207489A patent/SE8207489L/en not_active Application Discontinuation
-
1983
- 1983-01-05 GB GB08300183A patent/GB2115012B/en not_active Expired
- 1983-01-10 IT IT47531/83A patent/IT1164859B/en active
- 1983-01-11 FR FR8300351A patent/FR2519645B1/en not_active Expired
- 1983-01-11 JP JP58001826A patent/JPS58123878A/en active Granted
-
1986
- 1986-03-10 FR FR8603375A patent/FR2578261A1/en not_active Withdrawn
-
1988
- 1988-05-10 SE SE8801770A patent/SE8801770L/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275043A1 (en) * | 1987-01-12 | 1988-07-20 | Nihon Parkerizing Co., Ltd. | Acid cleaner for aluminium |
Also Published As
Publication number | Publication date |
---|---|
ES8403166A1 (en) | 1984-03-01 |
FR2519645A1 (en) | 1983-07-18 |
GB8300183D0 (en) | 1983-02-09 |
SE8801770D0 (en) | 1988-05-10 |
SE8207489D0 (en) | 1982-12-29 |
GB2115012B (en) | 1986-02-26 |
AU9047082A (en) | 1983-07-21 |
AU543333B2 (en) | 1985-04-18 |
CA1209886A (en) | 1986-08-19 |
DE3248041C2 (en) | 1986-09-11 |
FR2578261A1 (en) | 1986-09-05 |
CH655512B (en) | 1986-04-30 |
BE895242A (en) | 1983-03-31 |
IT8347531A0 (en) | 1983-01-10 |
IT1164859B (en) | 1987-04-15 |
JPS6334231B2 (en) | 1988-07-08 |
JPS58123878A (en) | 1983-07-23 |
ES518365A0 (en) | 1984-03-01 |
SE8207489L (en) | 1983-07-12 |
FR2519645B1 (en) | 1987-06-26 |
DE3248041A1 (en) | 1983-07-21 |
SE8801770L (en) | 1988-05-10 |
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