GB837703A - Improvements in or relating to methods for reducing the surface tension of liquids - Google Patents
Improvements in or relating to methods for reducing the surface tension of liquidsInfo
- Publication number
- GB837703A GB837703A GB20980/56A GB2098056A GB837703A GB 837703 A GB837703 A GB 837703A GB 20980/56 A GB20980/56 A GB 20980/56A GB 2098056 A GB2098056 A GB 2098056A GB 837703 A GB837703 A GB 837703A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cfcl
- acid
- sodium
- copper
- nitric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C53/00—Saturated compounds having only one carboxyl group bound to an acyclic carbon atom or hydrogen
- C07C53/15—Saturated compounds having only one carboxyl group bound to an acyclic carbon atom or hydrogen containing halogen
- C07C53/19—Acids containing three or more carbon atoms
- C07C53/21—Acids containing three or more carbon atoms containing fluorine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03D—FLOTATION; DIFFERENTIAL SEDIMENTATION
- B03D1/00—Flotation
- B03D1/001—Flotation agents
- B03D1/004—Organic compounds
- B03D1/008—Organic compounds containing oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03D—FLOTATION; DIFFERENTIAL SEDIMENTATION
- B03D1/00—Flotation
- B03D1/001—Flotation agents
- B03D1/004—Organic compounds
- B03D1/01—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03D—FLOTATION; DIFFERENTIAL SEDIMENTATION
- B03D2203/00—Specified materials treated by the flotation agents; specified applications
- B03D2203/02—Ores
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Abstract
A process for reducing the surface tension of liquids comprises adding to the liquid a perchlorofluorocarboxylic acid of formula Z(CF2-CFCl)n - 1 CF2COOH wherein Z is chlorine or a perhalomethyl radical having a molecular weight not above 146.5 and n is 2-16, or an ammonium or metal (e.g. sodium, potassium, copper, aluminium or ferric) salt thereof. In Example (12) an emulsion polish is obtained by mixing and heating carnauba wax with a solution of Cl(CF2-CFCl)3CF2COONH4 in water until a homogeneous mixture is obtained. In Example (13), a paste polish comprises a mixture of carnauba wax, beeswax paraffin, mineral spirit and Cl(CF2CFCl)3CF2COONH4 Specifications 784,727 and 827,378 are referred to.ALSO:A process for reducing the surface tension of organic sulphonating, oxidizing, or nitrating liquids comprises adding to the liquid a perchlorofluorocarboxylic acid, which may be of formula Z(CF2-CFCl)n-1CF2COOH wherein Z is chlorine or a perhalomethyl radical having a molecular weight not above 146.5, and n is 2-16, or an ammonium or metal (e.g. sodium, potassium, copper, aluminium or ferric) salt thereof. In Example (9), benzene is nitrated with sulphuric and nitric acids in the presence of Cl(CF2CFCl)3CF2COOH under reflux. The lower acid layer is eventually removed and the nitrobenzene washed with water and dilute sodium hydroxide. In Example (10), tert.-butylbenzene is sulphonated with oleum in the presence of Cl(CF2CFCl)3CF2COOH, the mixture poured into water, neutralized with sodium bicarbonate, salted out and washed with salt solution to obtain sodium p-tert.-butylbenzene sulphonate. In Example (11) benzoin is oxidized under reflux to benzil by means of nitric acid in the presence of Cl(CF2-CFCl)3-CF2COOH. The reaction mixture is poured into water and the yellow solid melted with dilute sodium carbonate solution to purify it. Specifications 784,727 and 827,378 are referred to.ALSO:A process for reducing the surface tension of metal electroplating, pickling and etching baths, ore flotation baths and organic sulphonating, oxidizing, or nitrating liquids comprises adding to the liquid a perchlorofluorocarboxylic acid which may be of the formula Z(CF2-CFCl)n-1CF2COOH wherein Z is chlorine or a perhalomethyl radical having a molecular weight not above 146.5 and n is 2-16, or an ammonium or metal (e.g. sodium, potassium, copper, aluminium or ferric) salt thereof. Specifications 784,727 and 827,378 are referred to.ALSO:A process for reducing the surface tension of pickling and etching baths and ore flotation baths comprises adding to the liquid a perchlorofluorocarboxylic acid, which may be of the formula: Z(CF2-CFCl)m-1CF2COOH where in Z is chlorine or a perhalomethyl radical having a molecular weight not above 146.5 and n is 2-16, or an ammonium or metal (e.g. sodium, potassium, copper, aluminium or ferric) salt thereof. The free acid may be used in sulphuric, hydrochloric or hydrofluoric acid pickling baths for iron or steel, and in scaling dip and bright dip baths for brass containing aqueous mixtures of hydrochloric, sulphuric and nitric acids. In bright dips for cadmium coatings the acid may be added to an aqueous mixture of chromic and sulphuric acids. Before being copper-plated, aluminium may be pretreated in dipping baths containing free acid, sodium hydroxide, zinc oxide, potassium cuprocyanide, and sodium sulphite. In Example (7), etching solutions for various metals are as follows: (a) for zinc, Cl(CF2CFCl)nCF2COONa and either copper sulphate and sodium bisulphate, or ferric chloride, acetic acid, nitric acid, and chromium trioxide; (b) for iron and steel, nitric and acetic acids and Cl(CF2-CFCl)nCF2COONa; (c) for copper and brasses, ammonia, hydrogen peroxide, and Cl(CF2-CFCl)nCF2COONH4; (d) for aluminium and aluminium alloys, hydrochloric, nitric and hydrofluoric acids and Cl(CF2-CFCl)nCF2COONa; (e) for nickel and nickle alloys, nitric and acetic acids and Cl(CF2-CFCl)nCF2COONH4; and (f) for gold, silver, platinum and other noble metals, nitric and hydrochloric acids and Cl(CF2-CFCl)CF2COONH4. In all cases n=2.5. Salts of the perchlorofluorocarboxylic acids are selective ore flotation agents and may be used in conjunction with collectors such as xanthates, mercaptans, organic sulphides, thiophosphates, thiocarbonates, thiourea, thiocarbanilide, azo- and diazo-compounds, with activating and conditioning agents such as copper sulphate and other salts of copper, lead and zinc, alkali metal sulphides and silicates, lime and sodium hydroxide, carbonate, and cyanide, inhibitors such as glue, starch, gelatin and tannin, and frothers such as pine oil, cresylic acid, and alcohols. In Example (8), copper sulphide ore is ground with lime and water, and conditioned with sodium sulphide. Water is added together with Cl(CF2-CFCl)3CF2COONa, cresylic acid and sodium dithiophosphate and air is drawn through the pulp, the concentrate being scraped off. Specifications 784,727 and 827,378 are referred to.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US837703XA | 1955-08-04 | 1955-08-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB837703A true GB837703A (en) | 1960-06-15 |
Family
ID=22180583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB20980/56A Expired GB837703A (en) | 1955-08-04 | 1956-07-06 | Improvements in or relating to methods for reducing the surface tension of liquids |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE1127170B (en) |
GB (1) | GB837703A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2394327A1 (en) * | 1977-06-13 | 1979-01-12 | United States Borax Chem | PRODUCTION OF SPATHFLUOR CONCENTRATE AND HIGH PURITY BARITE FROM A COMPLEX SPATHFLUOR ORE |
EP0182306A2 (en) * | 1984-11-17 | 1986-05-28 | Daikin Industries, Limited | Etchant composition |
CN105344491A (en) * | 2015-09-30 | 2016-02-24 | 广西大学 | Method for preparing antimony gold ore collecting agent |
CN105597943A (en) * | 2016-01-25 | 2016-05-25 | 江西理工大学 | Flotation depressing agent as well as preparation method and application thereof |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2556429C3 (en) * | 1975-12-15 | 1982-01-14 | Bayer Ag, 5090 Leverkusen | Process for matt etching of glass objects with the addition of acid-resistant wetting agents |
DE2535333C3 (en) * | 1975-08-07 | 1981-04-09 | Bayer Ag, 5090 Leverkusen | Process for acid etching, in particular for acid polishing of ground glass objects with the addition of acid-resistant wetting agents |
DE3143440A1 (en) * | 1981-11-02 | 1983-05-19 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | METHOD FOR DECONTAMINATING RADIOACTIVELY CONTAMINATED SURFACES OF METAL MATERIALS |
CA1209886A (en) * | 1982-01-11 | 1986-08-19 | Thomas W. Bleeks | Peroxide selective stripping compositions and method |
EP0139958B1 (en) * | 1983-08-23 | 1986-11-05 | BBC Aktiengesellschaft Brown, Boveri & Cie. | Process for electrolytically polishing a work piece made of a nickel, cobalt or iron based alloy |
CN112371349A (en) * | 2020-10-16 | 2021-02-19 | 中南大学 | Copper-ammonium combined vulcanization activator and copper oxide ore vulcanization flotation method |
CN112517223B (en) * | 2020-10-27 | 2022-11-08 | 西北矿冶研究院 | Enrichment method of low-quality copper-zinc bulk concentrate |
-
1956
- 1956-07-06 GB GB20980/56A patent/GB837703A/en not_active Expired
- 1956-08-04 DE DEK29534A patent/DE1127170B/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2394327A1 (en) * | 1977-06-13 | 1979-01-12 | United States Borax Chem | PRODUCTION OF SPATHFLUOR CONCENTRATE AND HIGH PURITY BARITE FROM A COMPLEX SPATHFLUOR ORE |
EP0182306A2 (en) * | 1984-11-17 | 1986-05-28 | Daikin Industries, Limited | Etchant composition |
EP0182306A3 (en) * | 1984-11-17 | 1988-04-27 | Daikin Industries, Limited | Etchant composition |
CN105344491A (en) * | 2015-09-30 | 2016-02-24 | 广西大学 | Method for preparing antimony gold ore collecting agent |
CN105597943A (en) * | 2016-01-25 | 2016-05-25 | 江西理工大学 | Flotation depressing agent as well as preparation method and application thereof |
CN105597943B (en) * | 2016-01-25 | 2017-12-29 | 江西理工大学 | A kind of depressing agent and preparation method and applications |
Also Published As
Publication number | Publication date |
---|---|
DE1127170B (en) | 1962-04-05 |
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