GB1601288A - Photopolymerizable compositions for the production of printing plates and relief plates - Google Patents

Photopolymerizable compositions for the production of printing plates and relief plates Download PDF

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Publication number
GB1601288A
GB1601288A GB1796378A GB1796378A GB1601288A GB 1601288 A GB1601288 A GB 1601288A GB 1796378 A GB1796378 A GB 1796378A GB 1796378 A GB1796378 A GB 1796378A GB 1601288 A GB1601288 A GB 1601288A
Authority
GB
United Kingdom
Prior art keywords
composition
weight
relief
nitroanthracene
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1796378A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of GB1601288A publication Critical patent/GB1601288A/en
Expired legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
GB1796378A 1977-05-07 1978-05-05 Photopolymerizable compositions for the production of printing plates and relief plates Expired GB1601288A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772720559 DE2720559A1 (de) 1977-05-07 1977-05-07 Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen

Publications (1)

Publication Number Publication Date
GB1601288A true GB1601288A (en) 1981-10-28

Family

ID=6008285

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1796378A Expired GB1601288A (en) 1977-05-07 1978-05-05 Photopolymerizable compositions for the production of printing plates and relief plates

Country Status (3)

Country Link
JP (1) JPS53138485A (de)
DE (1) DE2720559A1 (de)
GB (1) GB1601288A (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678462B2 (en) 1999-06-10 2010-03-16 Honeywell International, Inc. Spin-on-glass anti-reflective coatings for photolithography
US8344088B2 (en) 2001-11-15 2013-01-01 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9069133B2 (en) 1999-06-10 2015-06-30 Honeywell International Inc. Anti-reflective coating for photolithography and methods of preparation thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974103A (ja) * 1982-10-19 1984-04-26 Mitsubishi Electric Corp 紫外線硬化型樹脂組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678462B2 (en) 1999-06-10 2010-03-16 Honeywell International, Inc. Spin-on-glass anti-reflective coatings for photolithography
US9069133B2 (en) 1999-06-10 2015-06-30 Honeywell International Inc. Anti-reflective coating for photolithography and methods of preparation thereof
US8344088B2 (en) 2001-11-15 2013-01-01 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8784985B2 (en) 2009-06-10 2014-07-22 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Also Published As

Publication number Publication date
DE2720559A1 (de) 1978-11-09
JPS53138485A (en) 1978-12-02

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Legal Events

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PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee