JPS53138485A - Improved photo polymerizable substance for manufacturing printing block and relief block - Google Patents

Improved photo polymerizable substance for manufacturing printing block and relief block

Info

Publication number
JPS53138485A
JPS53138485A JP5242978A JP5242978A JPS53138485A JP S53138485 A JPS53138485 A JP S53138485A JP 5242978 A JP5242978 A JP 5242978A JP 5242978 A JP5242978 A JP 5242978A JP S53138485 A JPS53138485 A JP S53138485A
Authority
JP
Japan
Prior art keywords
block
polymerizable substance
relief
manufacturing printing
photo polymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5242978A
Other languages
Japanese (ja)
Inventor
Hofuman Geeruharuto
Kiyusuterusu Ueruneru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS53138485A publication Critical patent/JPS53138485A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP5242978A 1977-05-07 1978-05-02 Improved photo polymerizable substance for manufacturing printing block and relief block Pending JPS53138485A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772720559 DE2720559A1 (en) 1977-05-07 1977-05-07 IMPROVED PHOTOPOLYMERIZABLE COMPOSITIONS FOR THE MANUFACTURE OF PRINT PLATES AND RELIEF SHAPES

Publications (1)

Publication Number Publication Date
JPS53138485A true JPS53138485A (en) 1978-12-02

Family

ID=6008285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5242978A Pending JPS53138485A (en) 1977-05-07 1978-05-02 Improved photo polymerizable substance for manufacturing printing block and relief block

Country Status (3)

Country Link
JP (1) JPS53138485A (en)
DE (1) DE2720559A1 (en)
GB (1) GB1601288A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974103A (en) * 1982-10-19 1984-04-26 Mitsubishi Electric Corp Ultraviolet ray-curable resin composition

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (en) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド Spin-on glass anti-reflective coating for photolithography
KR20040066124A (en) 2001-11-15 2004-07-23 허니웰 인터내셔널 인코포레이티드 Spin-On Anti-Reflective Coatings For Photolithography
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974103A (en) * 1982-10-19 1984-04-26 Mitsubishi Electric Corp Ultraviolet ray-curable resin composition
JPS6336333B2 (en) * 1982-10-19 1988-07-20 Mitsubishi Electric Corp

Also Published As

Publication number Publication date
GB1601288A (en) 1981-10-28
DE2720559A1 (en) 1978-11-09

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