GB1586574A - Recording process using diazonium compounds - Google Patents
Recording process using diazonium compounds Download PDFInfo
- Publication number
- GB1586574A GB1586574A GB2390477A GB2390477A GB1586574A GB 1586574 A GB1586574 A GB 1586574A GB 2390477 A GB2390477 A GB 2390477A GB 2390477 A GB2390477 A GB 2390477A GB 1586574 A GB1586574 A GB 1586574A
- Authority
- GB
- United Kingdom
- Prior art keywords
- laser
- diazonium
- plates
- exposure
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001989 diazonium salts Chemical class 0.000 title claims description 32
- 238000000034 method Methods 0.000 title claims description 31
- 238000000576 coating method Methods 0.000 claims description 27
- 239000000975 dye Substances 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 23
- 239000012954 diazonium Substances 0.000 claims description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 15
- 230000005855 radiation Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 14
- 238000007639 printing Methods 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052786 argon Inorganic materials 0.000 claims description 13
- -1 argon ion Chemical class 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 239000007859 condensation product Substances 0.000 claims description 10
- BMWBYLGWPWDACF-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenoxy]benzene Chemical compound C1=CC(COC)=CC=C1OC1=CC=C(COC)C=C1 BMWBYLGWPWDACF-UHFFFAOYSA-N 0.000 claims description 8
- 239000003086 colorant Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 8
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 6
- 239000000047 product Substances 0.000 claims description 6
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 5
- 239000011707 mineral Substances 0.000 claims description 5
- 150000007524 organic acids Chemical class 0.000 claims description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 230000036211 photosensitivity Effects 0.000 claims description 4
- 238000007644 letterpress printing Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 claims description 2
- 239000001018 xanthene dye Substances 0.000 claims description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000011550 stock solution Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 3
- 150000008049 diazo compounds Chemical class 0.000 description 3
- VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 3
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 3
- VXLFYNFOITWQPM-UHFFFAOYSA-N n-phenyl-4-phenyldiazenylaniline Chemical compound C=1C=C(N=NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 VXLFYNFOITWQPM-UHFFFAOYSA-N 0.000 description 3
- IPSIPYMEZZPCPY-UHFFFAOYSA-N new fuchsin Chemical compound [Cl-].C1=CC(=[NH2+])C(C)=CC1=C(C=1C=C(C)C(N)=CC=1)C1=CC=C(N)C(C)=C1 IPSIPYMEZZPCPY-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- LXFQSRIDYRFTJW-UHFFFAOYSA-M 2,4,6-trimethylbenzenesulfonate Chemical class CC1=CC(C)=C(S([O-])(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-M 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- JSEYDVLGSMLKDL-UHFFFAOYSA-N 4-[(4-ethoxyphenyl)diazenyl]naphthalen-1-ol Chemical compound C1=CC(OCC)=CC=C1N=NC1=CC=C(O)C2=CC=CC=C12 JSEYDVLGSMLKDL-UHFFFAOYSA-N 0.000 description 1
- LMVXMJUMQJUKDF-UHFFFAOYSA-N 4-anilino-2-methoxybenzenediazonium Chemical class C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1 LMVXMJUMQJUKDF-UHFFFAOYSA-N 0.000 description 1
- GURASQVBMXLPMC-UHFFFAOYSA-L 4-anilino-2-methoxybenzenediazonium;sulfate Chemical compound [O-]S([O-])(=O)=O.C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1.C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1 GURASQVBMXLPMC-UHFFFAOYSA-L 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- JUQPZRLQQYSMEQ-UHFFFAOYSA-N CI Basic red 9 Chemical compound [Cl-].C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[NH2+])C=C1 JUQPZRLQQYSMEQ-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 241000680714 Rhodine Species 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- ZXGIHDNEIWPDFW-UHFFFAOYSA-M acid red 4 Chemical compound [Na+].COC1=CC=CC=C1N=NC1=CC(S([O-])(=O)=O)=C(C=CC=C2)C2=C1O ZXGIHDNEIWPDFW-UHFFFAOYSA-M 0.000 description 1
- IVHDZUFNZLETBM-IWSIBTJSSA-N acridine red 3B Chemical compound [Cl-].C1=C\C(=[NH+]/C)C=C2OC3=CC(NC)=CC=C3C=C21 IVHDZUFNZLETBM-IWSIBTJSSA-N 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- CIZVQWNPBGYCGK-UHFFFAOYSA-N benzenediazonium Chemical class N#[N+]C1=CC=CC=C1 CIZVQWNPBGYCGK-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- IWWWBRIIGAXLCJ-BGABXYSRSA-N chembl1185241 Chemical compound C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC IWWWBRIIGAXLCJ-BGABXYSRSA-N 0.000 description 1
- MRQIXHXHHPWVIL-UHFFFAOYSA-N chembl1397023 Chemical compound OC1=CC=C2C=CC=CC2=C1N=NC1=CC=CC=C1 MRQIXHXHHPWVIL-UHFFFAOYSA-N 0.000 description 1
- JBTHDAVBDKKSRW-UHFFFAOYSA-N chembl1552233 Chemical compound CC1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 JBTHDAVBDKKSRW-UHFFFAOYSA-N 0.000 description 1
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- YSVBPNGJESBVRM-UHFFFAOYSA-L disodium;4-[(1-oxido-4-sulfonaphthalen-2-yl)diazenyl]naphthalene-1-sulfonate Chemical compound [Na+].[Na+].C1=CC=C2C(N=NC3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)O)=CC=C(S([O-])(=O)=O)C2=C1 YSVBPNGJESBVRM-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 1
- 229940051142 metanil yellow Drugs 0.000 description 1
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 description 1
- 229940012189 methyl orange Drugs 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- PKALEBFTSZCHGU-UHFFFAOYSA-M n,n-diethyl-4-[2-(1,3,3-trimethylindol-1-ium-2-yl)ethenyl]aniline;chloride Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1\C=C\C1=[N+](C)C2=CC=CC=C2C1(C)C PKALEBFTSZCHGU-UHFFFAOYSA-M 0.000 description 1
- JQZWHMOVSQRYRN-UHFFFAOYSA-M n-(2-chloroethyl)-n-ethyl-3-methyl-4-[2-(1,3,3-trimethylindol-1-ium-2-yl)ethenyl]aniline;chloride Chemical compound [Cl-].CC1=CC(N(CCCl)CC)=CC=C1C=CC1=[N+](C)C2=CC=CC=C2C1(C)C JQZWHMOVSQRYRN-UHFFFAOYSA-M 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- INCIMLINXXICKS-UHFFFAOYSA-M pyronin Y Chemical compound [Cl-].C1=CC(=[N+](C)C)C=C2OC3=CC(N(C)C)=CC=C3C=C21 INCIMLINXXICKS-UHFFFAOYSA-M 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000001022 rhodamine dye Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- STZCRXQWRGQSJD-UHFFFAOYSA-M sodium;4-[[4-(dimethylamino)phenyl]diazenyl]benzenesulfonate Chemical compound [Na+].C1=CC(N(C)C)=CC=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-UHFFFAOYSA-M 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 150000003732 xanthenes Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Dot-Matrix Printers And Others (AREA)
- Laser Beam Printer (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69464176A | 1976-06-10 | 1976-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1586574A true GB1586574A (en) | 1981-03-18 |
Family
ID=24789690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2390477A Expired GB1586574A (en) | 1976-06-10 | 1977-06-08 | Recording process using diazonium compounds |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS52151025A (enrdf_load_stackoverflow) |
| BE (1) | BE855508A (enrdf_load_stackoverflow) |
| BR (1) | BR7703740A (enrdf_load_stackoverflow) |
| CA (1) | CA1094861A (enrdf_load_stackoverflow) |
| DE (1) | DE2725307A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2354576A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1586574A (enrdf_load_stackoverflow) |
| NL (1) | NL7706253A (enrdf_load_stackoverflow) |
| SE (1) | SE7706657L (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0023722A3 (en) * | 1979-08-06 | 1981-10-14 | Howard A. Fromson | Lithographic printing plate and process |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55137523A (en) * | 1979-04-16 | 1980-10-27 | Fuji Yakuhin Kogyo Kk | Photosensitive composition |
| EP0089506A3 (de) * | 1982-03-18 | 1984-04-11 | American Hoechst Corporation | Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial |
| DE3660339D1 (en) * | 1985-01-15 | 1988-07-28 | Merck Patent Gmbh | Photoresist compositions with enhanced sensitivity using polyamide esters |
| DE3606266A1 (de) * | 1986-02-27 | 1987-09-03 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| EP0423150B1 (en) * | 1988-05-05 | 1998-11-04 | Mografo A/S | A scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame |
| DK294189D0 (da) * | 1989-06-15 | 1989-06-15 | Andersen Allan V | Fremgangsmaade og scanningapparat til praeparering af store arbejdsflader, navnlig trykmoenstre paa serigrafi rammer |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3664737A (en) * | 1971-03-23 | 1972-05-23 | Ibm | Printing plate recording by direct exposure |
| US3751257A (en) * | 1971-04-16 | 1973-08-07 | Minnesota Mining & Mfg | Polyamide-diazo resin composition |
| DE2607207C2 (de) * | 1976-02-23 | 1983-07-14 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen |
-
1977
- 1977-06-04 DE DE19772725307 patent/DE2725307A1/de active Granted
- 1977-06-07 NL NL7706253A patent/NL7706253A/xx not_active Application Discontinuation
- 1977-06-08 SE SE7706657A patent/SE7706657L/ not_active Application Discontinuation
- 1977-06-08 GB GB2390477A patent/GB1586574A/en not_active Expired
- 1977-06-08 BR BR7703740A patent/BR7703740A/pt unknown
- 1977-06-08 BE BE178299A patent/BE855508A/xx not_active IP Right Cessation
- 1977-06-09 CA CA280,170A patent/CA1094861A/en not_active Expired
- 1977-06-10 FR FR7717817A patent/FR2354576A1/fr active Granted
- 1977-06-10 JP JP6879577A patent/JPS52151025A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0023722A3 (en) * | 1979-08-06 | 1981-10-14 | Howard A. Fromson | Lithographic printing plate and process |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2354576A1 (fr) | 1978-01-06 |
| DE2725307A1 (de) | 1977-12-22 |
| CA1094861A (en) | 1981-02-03 |
| DE2725307C2 (enrdf_load_stackoverflow) | 1987-11-12 |
| JPS52151025A (en) | 1977-12-15 |
| BR7703740A (pt) | 1978-04-04 |
| NL7706253A (nl) | 1977-12-13 |
| BE855508A (fr) | 1977-12-08 |
| FR2354576B1 (enrdf_load_stackoverflow) | 1980-02-15 |
| SE7706657L (sv) | 1977-12-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930608 |