FR2354576A1 - Procede pour l'enregistrement d'images au moyen d'un rayonnement de laser - Google Patents

Procede pour l'enregistrement d'images au moyen d'un rayonnement de laser

Info

Publication number
FR2354576A1
FR2354576A1 FR7717817A FR7717817A FR2354576A1 FR 2354576 A1 FR2354576 A1 FR 2354576A1 FR 7717817 A FR7717817 A FR 7717817A FR 7717817 A FR7717817 A FR 7717817A FR 2354576 A1 FR2354576 A1 FR 2354576A1
Authority
FR
France
Prior art keywords
laser radiation
recording images
laser
image
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7717817A
Other languages
English (en)
Other versions
FR2354576B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of FR2354576A1 publication Critical patent/FR2354576A1/fr
Application granted granted Critical
Publication of FR2354576B1 publication Critical patent/FR2354576B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives

Abstract

L'invention est relative à un procédé pour l'enregistrement d'un rayonnement de laser dans lequel on expose un matériel photosensible formé d'une couche à copier et d'un support de couche de manière à former une image, à une lumière visible de laser sans constituant ultraviolet que l'on développe ensuite pour Obtenir une image, caractérisé en ce que l'on utilise une couche à copier contenant un composé diazoïque opérant négativement et un colorant qui absorbe la lumière dans le domaine spectral entre 450 et 550 nm qui sensibilise le composé diazoïque à l'exposition à la lumière de laser.
FR7717817A 1976-06-10 1977-06-10 Procede pour l'enregistrement d'images au moyen d'un rayonnement de laser Granted FR2354576A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69464176A 1976-06-10 1976-06-10

Publications (2)

Publication Number Publication Date
FR2354576A1 true FR2354576A1 (fr) 1978-01-06
FR2354576B1 FR2354576B1 (fr) 1980-02-15

Family

ID=24789690

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7717817A Granted FR2354576A1 (fr) 1976-06-10 1977-06-10 Procede pour l'enregistrement d'images au moyen d'un rayonnement de laser

Country Status (9)

Country Link
JP (1) JPS52151025A (fr)
BE (1) BE855508A (fr)
BR (1) BR7703740A (fr)
CA (1) CA1094861A (fr)
DE (1) DE2725307A1 (fr)
FR (1) FR2354576A1 (fr)
GB (1) GB1586574A (fr)
NL (1) NL7706253A (fr)
SE (1) SE7706657L (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0023722A2 (fr) * 1979-08-06 1981-02-11 Howard A. Fromson Plaque d'impression lithographique et procédé

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55137523A (en) * 1979-04-16 1980-10-27 Fuji Yakuhin Kogyo Kk Photosensitive composition
EP0089506A3 (fr) * 1982-03-18 1984-04-11 American Hoechst Corporation Mélange sensible à la lumière à base de produits de polycondensation de sel de diazonium et matériau d'enregistrement sensible à la lumière produit à partir de ce mélange
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
DE3660339D1 (en) * 1985-01-15 1988-07-28 Merck Patent Gmbh Photoresist compositions with enhanced sensitivity using polyamide esters
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
JPH03504109A (ja) * 1988-05-05 1991-09-12 モグラフォ　エー／エス 特にセリグラフ印刷フレーム上の感光乳剤を紫外線露光するための、加工面を連続照射する走査装置
DK294189D0 (da) * 1989-06-15 1989-06-15 Andersen Allan V Fremgangsmaade og scanningapparat til praeparering af store arbejdsflader, navnlig trykmoenstre paa serigrafi rammer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664737A (en) * 1971-03-23 1972-05-23 Ibm Printing plate recording by direct exposure
US3751257A (en) * 1971-04-16 1973-08-07 Minnesota Mining & Mfg Polyamide-diazo resin composition
DE2607207C2 (de) * 1976-02-23 1983-07-14 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0023722A2 (fr) * 1979-08-06 1981-02-11 Howard A. Fromson Plaque d'impression lithographique et procédé
EP0023722A3 (en) * 1979-08-06 1981-10-14 Howard A. Fromson Lithographic printing plate and process

Also Published As

Publication number Publication date
BR7703740A (pt) 1978-04-04
CA1094861A (fr) 1981-02-03
GB1586574A (en) 1981-03-18
NL7706253A (nl) 1977-12-13
JPS52151025A (en) 1977-12-15
DE2725307A1 (de) 1977-12-22
BE855508A (fr) 1977-12-08
DE2725307C2 (fr) 1987-11-12
SE7706657L (sv) 1977-12-11
FR2354576B1 (fr) 1980-02-15

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Legal Events

Date Code Title Description
ST Notification of lapse