JPS52151025A - Method of recording image with laser beam - Google Patents

Method of recording image with laser beam

Info

Publication number
JPS52151025A
JPS52151025A JP6879577A JP6879577A JPS52151025A JP S52151025 A JPS52151025 A JP S52151025A JP 6879577 A JP6879577 A JP 6879577A JP 6879577 A JP6879577 A JP 6879577A JP S52151025 A JPS52151025 A JP S52151025A
Authority
JP
Japan
Prior art keywords
laser beam
recording image
recording
image
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6879577A
Other languages
English (en)
Japanese (ja)
Inventor
Yoozefu Fuausuto Raimunto
Jiefuaazu Uiriamu
Riyuu Shiyuuchien
Aren Shiirii Dagurasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of JPS52151025A publication Critical patent/JPS52151025A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP6879577A 1976-06-10 1977-06-10 Method of recording image with laser beam Pending JPS52151025A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69464176A 1976-06-10 1976-06-10

Publications (1)

Publication Number Publication Date
JPS52151025A true JPS52151025A (en) 1977-12-15

Family

ID=24789690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6879577A Pending JPS52151025A (en) 1976-06-10 1977-06-10 Method of recording image with laser beam

Country Status (9)

Country Link
JP (1) JPS52151025A (fr)
BE (1) BE855508A (fr)
BR (1) BR7703740A (fr)
CA (1) CA1094861A (fr)
DE (1) DE2725307A1 (fr)
FR (1) FR2354576A1 (fr)
GB (1) GB1586574A (fr)
NL (1) NL7706253A (fr)
SE (1) SE7706657L (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55137523A (en) * 1979-04-16 1980-10-27 Fuji Yakuhin Kogyo Kk Photosensitive composition
JPS61167941A (ja) * 1985-01-15 1986-07-29 チバ―ガイギー　アクチエンゲゼルシヤフト 高感度ポリアミドエステルホトレジスト組成物
JPS62210443A (ja) * 1986-02-27 1987-09-16 バスフ　アクチェン　ゲゼルシャフト 感光性記録素子

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1155707A (fr) * 1979-08-06 1983-10-25 Robert F Gracia Cliche de lithographie, et methode de preparation connexe
EP0089506A3 (fr) * 1982-03-18 1984-04-11 American Hoechst Corporation Mélange sensible à la lumière à base de produits de polycondensation de sel de diazonium et matériau d'enregistrement sensible à la lumière produit à partir de ce mélange
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
DE68928844D1 (de) * 1988-05-05 1998-12-10 Mografo A S Scannersystem für die sukzessive bestrahlung einer arbeitsoberfläche, insbesondere für die ultraviolettbestrahlung einer photoemulsion auf einem serigraphischen druckrahmen
DK294189D0 (da) * 1989-06-15 1989-06-15 Andersen Allan V Fremgangsmaade og scanningapparat til praeparering af store arbejdsflader, navnlig trykmoenstre paa serigrafi rammer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664737A (en) * 1971-03-23 1972-05-23 Ibm Printing plate recording by direct exposure
US3751257A (en) * 1971-04-16 1973-08-07 Minnesota Mining & Mfg Polyamide-diazo resin composition
DE2607207C2 (de) * 1976-02-23 1983-07-14 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55137523A (en) * 1979-04-16 1980-10-27 Fuji Yakuhin Kogyo Kk Photosensitive composition
JPS61167941A (ja) * 1985-01-15 1986-07-29 チバ―ガイギー　アクチエンゲゼルシヤフト 高感度ポリアミドエステルホトレジスト組成物
JPS62210443A (ja) * 1986-02-27 1987-09-16 バスフ　アクチェン　ゲゼルシャフト 感光性記録素子

Also Published As

Publication number Publication date
DE2725307C2 (fr) 1987-11-12
FR2354576B1 (fr) 1980-02-15
GB1586574A (en) 1981-03-18
FR2354576A1 (fr) 1978-01-06
CA1094861A (fr) 1981-02-03
NL7706253A (nl) 1977-12-13
SE7706657L (sv) 1977-12-11
BR7703740A (pt) 1978-04-04
DE2725307A1 (de) 1977-12-22
BE855508A (fr) 1977-12-08

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