GB1489467A - Photosensitive resin compositions - Google Patents

Photosensitive resin compositions

Info

Publication number
GB1489467A
GB1489467A GB720375A GB720375A GB1489467A GB 1489467 A GB1489467 A GB 1489467A GB 720375 A GB720375 A GB 720375A GB 720375 A GB720375 A GB 720375A GB 1489467 A GB1489467 A GB 1489467A
Authority
GB
United Kingdom
Prior art keywords
feb
formula
photosensitive resin
resin compositions
monovalent hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB720375A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Publication of GB1489467A publication Critical patent/GB1489467A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
GB720375A 1974-02-23 1975-02-20 Photosensitive resin compositions Expired GB1489467A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2104874A JPS532361B2 (enrdf_load_stackoverflow) 1974-02-23 1974-02-23

Publications (1)

Publication Number Publication Date
GB1489467A true GB1489467A (en) 1977-10-19

Family

ID=12044027

Family Applications (1)

Application Number Title Priority Date Filing Date
GB720375A Expired GB1489467A (en) 1974-02-23 1975-02-20 Photosensitive resin compositions

Country Status (6)

Country Link
JP (1) JPS532361B2 (enrdf_load_stackoverflow)
BE (1) BE825793A (enrdf_load_stackoverflow)
DE (1) DE2507874C3 (enrdf_load_stackoverflow)
FR (1) FR2262328A1 (enrdf_load_stackoverflow)
GB (1) GB1489467A (enrdf_load_stackoverflow)
NL (1) NL7502120A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU610682B2 (en) * 1988-01-13 1991-05-23 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
WO2000020926A1 (en) * 1998-10-05 2000-04-13 E.I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5729692B2 (enrdf_load_stackoverflow) * 1974-09-17 1982-06-24
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
JPS61254605A (ja) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd 感光性組成物
US4911999A (en) * 1988-12-13 1990-03-27 E. I. Du Pont De Nemours And Company Electrostatic master containing thiourea or thioamide electrostatic decay additive for high speed xeroprinting
DE3909003A1 (de) * 1989-03-18 1990-09-27 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
CN112341638B (zh) * 2020-11-05 2022-07-15 云南师范大学 一种多孔结构水凝胶材料及其制备与应用

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU610682B2 (en) * 1988-01-13 1991-05-23 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
WO2000020926A1 (en) * 1998-10-05 2000-04-13 E.I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6569602B1 (en) 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
US6916598B2 (en) 1998-10-05 2005-07-12 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions

Also Published As

Publication number Publication date
JPS50117502A (enrdf_load_stackoverflow) 1975-09-13
DE2507874C3 (de) 1982-04-08
JPS532361B2 (enrdf_load_stackoverflow) 1978-01-27
DE2507874A1 (de) 1975-08-28
FR2262328A1 (enrdf_load_stackoverflow) 1975-09-19
NL7502120A (nl) 1975-08-26
AU7843075A (en) 1976-08-26
DE2507874B2 (de) 1981-04-30
BE825793A (fr) 1975-06-16

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Legal Events

Date Code Title Description
429A Application made for amendment of specification (sect. 29/1949)
429H Application (made) for amendment of specification now open to opposition (sect. 29/1949)
429D Case decided by the comptroller ** specification amended (sect. 29/1949)
PS Patent sealed
SP Amendment (slips) printed
PCNP Patent ceased through non-payment of renewal fee