FR2262328A1 - - Google Patents

Info

Publication number
FR2262328A1
FR2262328A1 FR7505689A FR7505689A FR2262328A1 FR 2262328 A1 FR2262328 A1 FR 2262328A1 FR 7505689 A FR7505689 A FR 7505689A FR 7505689 A FR7505689 A FR 7505689A FR 2262328 A1 FR2262328 A1 FR 2262328A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7505689A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Publication of FR2262328A1 publication Critical patent/FR2262328A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
FR7505689A 1974-02-23 1975-02-24 Withdrawn FR2262328A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2104874A JPS532361B2 (enrdf_load_stackoverflow) 1974-02-23 1974-02-23

Publications (1)

Publication Number Publication Date
FR2262328A1 true FR2262328A1 (enrdf_load_stackoverflow) 1975-09-19

Family

ID=12044027

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7505689A Withdrawn FR2262328A1 (enrdf_load_stackoverflow) 1974-02-23 1975-02-24

Country Status (6)

Country Link
JP (1) JPS532361B2 (enrdf_load_stackoverflow)
BE (1) BE825793A (enrdf_load_stackoverflow)
DE (1) DE2507874C3 (enrdf_load_stackoverflow)
FR (1) FR2262328A1 (enrdf_load_stackoverflow)
GB (1) GB1489467A (enrdf_load_stackoverflow)
NL (1) NL7502120A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0324485A3 (en) * 1988-01-13 1989-08-30 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
EP0388770A3 (de) * 1989-03-18 1991-06-26 BASF Aktiengesellschaft Photopolymerisierbares Schichtübertragungsmaterial
EP0373533A3 (en) * 1988-12-13 1991-09-04 E.I. Du Pont De Nemours And Company Improved electrostatic master for high speed xeroprinting

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5729692B2 (enrdf_load_stackoverflow) * 1974-09-17 1982-06-24
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
JPS61254605A (ja) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd 感光性組成物
US6569602B1 (en) 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
CN112341638B (zh) * 2020-11-05 2022-07-15 云南师范大学 一种多孔结构水凝胶材料及其制备与应用

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0324485A3 (en) * 1988-01-13 1989-08-30 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
EP0373533A3 (en) * 1988-12-13 1991-09-04 E.I. Du Pont De Nemours And Company Improved electrostatic master for high speed xeroprinting
EP0388770A3 (de) * 1989-03-18 1991-06-26 BASF Aktiengesellschaft Photopolymerisierbares Schichtübertragungsmaterial

Also Published As

Publication number Publication date
JPS50117502A (enrdf_load_stackoverflow) 1975-09-13
DE2507874C3 (de) 1982-04-08
JPS532361B2 (enrdf_load_stackoverflow) 1978-01-27
DE2507874A1 (de) 1975-08-28
NL7502120A (nl) 1975-08-26
AU7843075A (en) 1976-08-26
GB1489467A (en) 1977-10-19
DE2507874B2 (de) 1981-04-30
BE825793A (fr) 1975-06-16

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Legal Events

Date Code Title Description
ST Notification of lapse