JPS532361B2 - - Google Patents

Info

Publication number
JPS532361B2
JPS532361B2 JP2104874A JP2104874A JPS532361B2 JP S532361 B2 JPS532361 B2 JP S532361B2 JP 2104874 A JP2104874 A JP 2104874A JP 2104874 A JP2104874 A JP 2104874A JP S532361 B2 JPS532361 B2 JP S532361B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2104874A
Other languages
Japanese (ja)
Other versions
JPS50117502A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2104874A priority Critical patent/JPS532361B2/ja
Priority to AU78430/75A priority patent/AU487244B2/en
Priority to GB720375A priority patent/GB1489467A/en
Priority to BE153569A priority patent/BE825793A/xx
Priority to NL7502120A priority patent/NL7502120A/xx
Priority to DE19752507874 priority patent/DE2507874C3/de
Priority to FR7505689A priority patent/FR2262328A1/fr
Publication of JPS50117502A publication Critical patent/JPS50117502A/ja
Publication of JPS532361B2 publication Critical patent/JPS532361B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2104874A 1974-02-23 1974-02-23 Expired JPS532361B2 (enrdf_load_stackoverflow)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2104874A JPS532361B2 (enrdf_load_stackoverflow) 1974-02-23 1974-02-23
AU78430/75A AU487244B2 (en) 1974-02-23 1975-02-02 Photosensitive resin compositions
GB720375A GB1489467A (en) 1974-02-23 1975-02-20 Photosensitive resin compositions
BE153569A BE825793A (fr) 1974-02-23 1975-02-21 Compositions resineuses photosensibles
NL7502120A NL7502120A (nl) 1974-02-23 1975-02-21 Werkwijze ter bereiding van fotogevoelige hars- samenstellingen alsmede gevormde voortbrengse- len geheel of gedeeltelijk bestaande uit deze harssamenstellingen.
DE19752507874 DE2507874C3 (de) 1974-02-23 1975-02-24 Lichtempfindliche Harzmasse
FR7505689A FR2262328A1 (enrdf_load_stackoverflow) 1974-02-23 1975-02-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2104874A JPS532361B2 (enrdf_load_stackoverflow) 1974-02-23 1974-02-23

Publications (2)

Publication Number Publication Date
JPS50117502A JPS50117502A (enrdf_load_stackoverflow) 1975-09-13
JPS532361B2 true JPS532361B2 (enrdf_load_stackoverflow) 1978-01-27

Family

ID=12044027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2104874A Expired JPS532361B2 (enrdf_load_stackoverflow) 1974-02-23 1974-02-23

Country Status (6)

Country Link
JP (1) JPS532361B2 (enrdf_load_stackoverflow)
BE (1) BE825793A (enrdf_load_stackoverflow)
DE (1) DE2507874C3 (enrdf_load_stackoverflow)
FR (1) FR2262328A1 (enrdf_load_stackoverflow)
GB (1) GB1489467A (enrdf_load_stackoverflow)
NL (1) NL7502120A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5729692B2 (enrdf_load_stackoverflow) * 1974-09-17 1982-06-24
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
JPS61254605A (ja) * 1985-05-07 1986-11-12 Asahi Chem Ind Co Ltd 感光性組成物
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
US4911999A (en) * 1988-12-13 1990-03-27 E. I. Du Pont De Nemours And Company Electrostatic master containing thiourea or thioamide electrostatic decay additive for high speed xeroprinting
DE3909003A1 (de) * 1989-03-18 1990-09-27 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US6569602B1 (en) 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
CN112341638B (zh) * 2020-11-05 2022-07-15 云南师范大学 一种多孔结构水凝胶材料及其制备与应用

Also Published As

Publication number Publication date
JPS50117502A (enrdf_load_stackoverflow) 1975-09-13
DE2507874C3 (de) 1982-04-08
DE2507874A1 (de) 1975-08-28
FR2262328A1 (enrdf_load_stackoverflow) 1975-09-19
NL7502120A (nl) 1975-08-26
AU7843075A (en) 1976-08-26
GB1489467A (en) 1977-10-19
DE2507874B2 (de) 1981-04-30
BE825793A (fr) 1975-06-16

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