GB1473535A - Vacuum evaporation plating method and apparatus - Google Patents

Vacuum evaporation plating method and apparatus

Info

Publication number
GB1473535A
GB1473535A GB2660374A GB2660374A GB1473535A GB 1473535 A GB1473535 A GB 1473535A GB 2660374 A GB2660374 A GB 2660374A GB 2660374 A GB2660374 A GB 2660374A GB 1473535 A GB1473535 A GB 1473535A
Authority
GB
United Kingdom
Prior art keywords
photo
sensitive material
june
evaporating
electrical resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2660374A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Publication of GB1473535A publication Critical patent/GB1473535A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08207—Selenium-based

Abstract

1473535 Evaporating multi-element materials FUJI XEROX CO Ltd 14 June 1974 [28 June 1973] 26603/74 Heading C7F Apparatus for evaporating a multi-element photo-sensitive material having at least first and second elements where said first element evaporates less readily than said second element comprises means 13 for containing the photo-sensitive material, first heating means including an electrical resistance heating element 22 arranged to be adjacent the upper surface of material 14 for radiating continuous wave electromagnetic radiations on to said upper surface to evaporate the material and a protective cover for said heating element for preventing evaporation of material thereof into the vapour of the photo-sensitive material, and means 24 acting as a substrate. The first heating means may comprise a W filament in a quartz tube; a heat shield 21 may protect the substrate from direct radiation from heater 22 and source 14, and a second auxiliary electrical resistance heater may heat crucible 13 as shown. The material 14 may be Se-Te, e.g. 92 wt. per cent Se, 8% Te; alternative source configurations are shown in detail in Figs. 4-6 (not shown); the said radiation from 22 may be infrared.
GB2660374A 1973-06-28 1974-06-14 Vacuum evaporation plating method and apparatus Expired GB1473535A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48072263A JPS5022639A (en) 1973-06-28 1973-06-28

Publications (1)

Publication Number Publication Date
GB1473535A true GB1473535A (en) 1977-05-11

Family

ID=13484214

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2660374A Expired GB1473535A (en) 1973-06-28 1974-06-14 Vacuum evaporation plating method and apparatus

Country Status (5)

Country Link
JP (1) JPS5022639A (en)
DE (1) DE2430653C3 (en)
FR (1) FR2235401B1 (en)
GB (1) GB1473535A (en)
NL (1) NL7407524A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6337105B1 (en) * 1997-07-14 2002-01-08 Matsushita Electric Industrial Co., Ltd. Method and apparatus for forming thin functional film
WO2006073965A2 (en) * 2005-01-07 2006-07-13 Universal Display Corporation Evaporation method and apparatus using infrared guiding heater

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4593008B2 (en) * 2001-05-23 2010-12-08 キヤノンアネルバ株式会社 Vapor deposition source and thin film forming method and apparatus using the same
DE102021006249A1 (en) 2021-12-17 2023-06-22 Singulus Technologies Aktiengesellschaft Coating source, coating equipment and method for coating substrates
DE102021006288A1 (en) 2021-12-21 2023-06-22 Singulus Technologies Aktiengesellschaft Coating source with refill device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6337105B1 (en) * 1997-07-14 2002-01-08 Matsushita Electric Industrial Co., Ltd. Method and apparatus for forming thin functional film
WO2006073965A2 (en) * 2005-01-07 2006-07-13 Universal Display Corporation Evaporation method and apparatus using infrared guiding heater
WO2006073965A3 (en) * 2005-01-07 2006-11-23 Universal Display Corp Evaporation method and apparatus using infrared guiding heater
US7431807B2 (en) 2005-01-07 2008-10-07 Universal Display Corporation Evaporation method using infrared guiding heater

Also Published As

Publication number Publication date
DE2430653C3 (en) 1980-03-20
DE2430653B2 (en) 1979-07-12
DE2430653A1 (en) 1975-01-23
FR2235401B1 (en) 1981-09-25
NL7407524A (en) 1974-12-31
JPS5022639A (en) 1975-03-11
FR2235401A1 (en) 1975-01-24

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee