GB1461636A - Plasna etching - Google Patents

Plasna etching

Info

Publication number
GB1461636A
GB1461636A GB976974A GB976974A GB1461636A GB 1461636 A GB1461636 A GB 1461636A GB 976974 A GB976974 A GB 976974A GB 976974 A GB976974 A GB 976974A GB 1461636 A GB1461636 A GB 1461636A
Authority
GB
United Kingdom
Prior art keywords
plasma
wafers
etched
etching
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB976974A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB976974A priority Critical patent/GB1461636A/en
Publication of GB1461636A publication Critical patent/GB1461636A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3341—Reactive etching

Abstract

1461636 Plasma etching STANDARD TELEPHONES & CABLES Ltd 5 March 1974 9769/74 Heading B3V [Also in Division B6] An apparatus for chemically etching semiconductor wafers 10 by a gas plasma comprises a vessel 12 having gas inlet and outlet ports 16, 17, an electrically conductive, water cooled, earthed support 11 for supporting the wafers 10 such that their backs are prevented from being etched and an electrode system 31, 15 coupled to a RF generator 14 for generating a gas plasma. The support 11 is made of aluminium, stainless steel or nickel plated copper. Silica films on silicon wafers 10 can be etched if the plasma contains fluorine.
GB976974A 1974-03-05 1974-03-05 Plasna etching Expired GB1461636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB976974A GB1461636A (en) 1974-03-05 1974-03-05 Plasna etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB976974A GB1461636A (en) 1974-03-05 1974-03-05 Plasna etching

Publications (1)

Publication Number Publication Date
GB1461636A true GB1461636A (en) 1977-01-13

Family

ID=9878435

Family Applications (1)

Application Number Title Priority Date Filing Date
GB976974A Expired GB1461636A (en) 1974-03-05 1974-03-05 Plasna etching

Country Status (1)

Country Link
GB (1) GB1461636A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2812728A1 (en) * 1977-04-01 1978-10-12 Int Standard Electric Corp DOUBLE HETEROSTRUCTURE INJECTION LASER AND METHOD OF ITS MANUFACTURING
FR2463975A1 (en) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) METHOD AND APPARATUS FOR DRY CHEMICAL ETCHING OF INTEGRATED CIRCUITS
FR2579058A1 (en) * 1985-02-05 1986-09-19 Psi Star Inc PLASMA REACTOR COMPRISING A VOLTAGE TRANSFORMER
EP0275188A2 (en) * 1987-01-12 1988-07-20 Olin Corporation Improved plasma stripper with multiple contact point cathode
EP0685873A1 (en) * 1994-06-02 1995-12-06 Applied Materials, Inc. Inductively coupled plasma reactor with an electrode for enhancing plasma ignition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2812728A1 (en) * 1977-04-01 1978-10-12 Int Standard Electric Corp DOUBLE HETEROSTRUCTURE INJECTION LASER AND METHOD OF ITS MANUFACTURING
FR2463975A1 (en) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) METHOD AND APPARATUS FOR DRY CHEMICAL ETCHING OF INTEGRATED CIRCUITS
FR2579058A1 (en) * 1985-02-05 1986-09-19 Psi Star Inc PLASMA REACTOR COMPRISING A VOLTAGE TRANSFORMER
EP0275188A2 (en) * 1987-01-12 1988-07-20 Olin Corporation Improved plasma stripper with multiple contact point cathode
EP0275188A3 (en) * 1987-01-12 1990-07-04 Olin Corporation Improved plasma stripper with multiple contact point cathode
EP0685873A1 (en) * 1994-06-02 1995-12-06 Applied Materials, Inc. Inductively coupled plasma reactor with an electrode for enhancing plasma ignition
US5685941A (en) * 1994-06-02 1997-11-11 Applied Materials, Inc. Inductively coupled plasma reactor with top electrode for enhancing plasma ignition

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940304