JPS54128284A - Electrode structure for semiconductor wafer plasma etching stripping device - Google Patents

Electrode structure for semiconductor wafer plasma etching stripping device

Info

Publication number
JPS54128284A
JPS54128284A JP3639978A JP3639978A JPS54128284A JP S54128284 A JPS54128284 A JP S54128284A JP 3639978 A JP3639978 A JP 3639978A JP 3639978 A JP3639978 A JP 3639978A JP S54128284 A JPS54128284 A JP S54128284A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
electrode structure
plasma etching
stripping device
wafer plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3639978A
Other languages
Japanese (ja)
Other versions
JPS5551340B2 (en
Inventor
Hitoshi Ogi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP3639978A priority Critical patent/JPS54128284A/en
Publication of JPS54128284A publication Critical patent/JPS54128284A/en
Publication of JPS5551340B2 publication Critical patent/JPS5551340B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP3639978A 1978-03-29 1978-03-29 Electrode structure for semiconductor wafer plasma etching stripping device Granted JPS54128284A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3639978A JPS54128284A (en) 1978-03-29 1978-03-29 Electrode structure for semiconductor wafer plasma etching stripping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3639978A JPS54128284A (en) 1978-03-29 1978-03-29 Electrode structure for semiconductor wafer plasma etching stripping device

Publications (2)

Publication Number Publication Date
JPS54128284A true JPS54128284A (en) 1979-10-04
JPS5551340B2 JPS5551340B2 (en) 1980-12-23

Family

ID=12468765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3639978A Granted JPS54128284A (en) 1978-03-29 1978-03-29 Electrode structure for semiconductor wafer plasma etching stripping device

Country Status (1)

Country Link
JP (1) JPS54128284A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754324A (en) * 1980-09-10 1982-03-31 Ibm
JPS58192328A (en) * 1982-05-03 1983-11-09 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Reactive ion etching device
JPS63260034A (en) * 1987-04-16 1988-10-27 Tokyo Electron Ltd Asher
JPS6428920A (en) * 1987-07-24 1989-01-31 Tokyo Electron Ltd Ashing device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754324A (en) * 1980-09-10 1982-03-31 Ibm
JPH0359573B2 (en) * 1980-09-10 1991-09-11 Intaanashonaru Bijinesu Mashiinzu Corp
JPS58192328A (en) * 1982-05-03 1983-11-09 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Reactive ion etching device
JPH0358171B2 (en) * 1982-05-03 1991-09-04 Intaanashonaru Bijinesu Mashiinzu Corp
JPS63260034A (en) * 1987-04-16 1988-10-27 Tokyo Electron Ltd Asher
JPS6428920A (en) * 1987-07-24 1989-01-31 Tokyo Electron Ltd Ashing device

Also Published As

Publication number Publication date
JPS5551340B2 (en) 1980-12-23

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